| |
 |
|
Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5948168 |
Distributed microwave plasma reactor for semiconductor processing |
Sep. 7, 1999 |
| 5948283 |
Method and apparatus for enhancing outcome uniformity of direct-plasma processes |
Sep. 7, 1999 |
| 5945163 |
Apparatus and method for depositing a material on a substrate |
Aug. 31, 1999 |
| 5942038 |
Cooling element for a semiconductor fabrication chamber |
Aug. 24, 1999 |
| 5938850 |
Single wafer heat treatment apparatus |
Aug. 17, 1999 |
| 5938852 |
Cap for vertical furnace |
Aug. 17, 1999 |
| 5935337 |
Thin-film vapor deposition apparatus |
Aug. 10, 1999 |
| 5935395 |
Substrate processing apparatus with non-evaporable getter pump |
Aug. 10, 1999 |
| 5935396 |
Method for depositing metal |
Aug. 10, 1999 |
| 5928426 |
Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors |
Jul. 27, 1999 |
| 5928428 |
Apparatus and method for manufacturing a semiconductor device |
Jul. 27, 1999 |
| 5926615 |
Temperature compensation method for semiconductor wafers in rapid thermal processor using separated heat conducting rings as susceptors |
Jul. 20, 1999 |
| 5922100 |
Precision burners for oxidizing halide-free silicon-containing compounds |
Jul. 13, 1999 |
| 5914000 |
Apparatus for manufacturing semiconductor device and method of removing silicon oxidation film |
Jun. 22, 1999 |
| 5914001 |
In-situ etch of CVD chamber |
Jun. 22, 1999 |
| 5906683 |
Lid assembly for semiconductor processing chamber |
May. 25, 1999 |
| 5906684 |
Method of holding substrate and substrate holding system |
May. 25, 1999 |
| 5904958 |
Adjustable nozzle for evaporation or organic monomers |
May. 18, 1999 |
| 5902102 |
Diffusion furnace used for semiconductor device manufacturing process |
May. 11, 1999 |
| 5902406 |
Low pressure CVD system |
May. 11, 1999 |
| 5903711 |
Heat treatment apparatus and heat treatment method |
May. 11, 1999 |
| 5894887 |
Ceramic dome temperature control using heat pipe structure and method |
Apr. 20, 1999 |
| 5895594 |
Method and device for heating carrier bodies |
Apr. 20, 1999 |
| 5893952 |
Apparatus for rapid thermal processing of a wafer |
Apr. 13, 1999 |
| 5892207 |
Heating and cooling apparatus for reaction chamber |
Apr. 6, 1999 |
| 5893050 |
Method for correcting thin-film formation program of semiconductor device and thickness measuring apparatus therefor |
Apr. 6, 1999 |
| 5882412 |
Vertical two chamber reaction furnace |
Mar. 16, 1999 |
| 5882413 |
Substrate processing apparatus having a substrate transport with a front end extension and an internal substrate buffer |
Mar. 16, 1999 |
| 5882416 |
Liquid delivery system, heater apparatus for liquid delivery system, and vaporizer |
Mar. 16, 1999 |
| 5879450 |
Method of heteroepitaxial growth of beta silicon carbide on silicon |
Mar. 9, 1999 |
| 5879461 |
Metered gas control in a substrate processing apparatus |
Mar. 9, 1999 |
| 5871586 |
Chemical vapor deposition |
Feb. 16, 1999 |
| 5871806 |
Heat-treating process |
Feb. 16, 1999 |
| 5863338 |
Apparatus and method for forming thin film |
Jan. 26, 1999 |
| 5863843 |
Wafer holder for thermal processing apparatus |
Jan. 26, 1999 |
| 5859408 |
Apparatus for uniformly heating a substrate |
Jan. 12, 1999 |
| 5855677 |
Method and apparatus for controlling the temperature of reaction chamber walls |
Jan. 5, 1999 |
| 5855678 |
Fluidized bed reactor to deposit a material on a surface by chemical vapor deposition, and methods of forming a coated substrate therewith |
Jan. 5, 1999 |
| 5855684 |
Method for the plasma assisted high vacuum physical vapor coating of parts with wear resistant coatings and equipment for carrying out the method |
Jan. 5, 1999 |
| 5849076 |
Cooling system and method for epitaxial barrel reactor |
Dec. 15, 1998 |
| 5846375 |
Area specific temperature control for electrode plates and chucks used in semiconductor processing equipment |
Dec. 8, 1998 |
| 5837555 |
Apparatus and method for rapid thermal processing |
Nov. 17, 1998 |
| 5833753 |
Reactor having an array of heating filaments and a filament force regulator |
Nov. 10, 1998 |
| 5833754 |
Deposition apparatus for growing a material with reduced hazard |
Nov. 10, 1998 |
| 5830277 |
Thermal processing system with supplemental resistive heater and shielded optical pyrometry |
Nov. 3, 1998 |
| 5823681 |
Multipoint temperature monitoring apparatus for semiconductor wafers during processing |
Oct. 20, 1998 |
| 5819683 |
Trap apparatus |
Oct. 13, 1998 |
| 5817178 |
Apparatus for baking photoresist applied on substrate |
Oct. 6, 1998 |
| 5814153 |
Semiconductor device manufacturing apparatus |
Sep. 29, 1998 |
| 5810929 |
Pyrogenic wet thermal oxidation of semiconductor wafers |
Sep. 22, 1998 |
|
|
|
