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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6051276 |
Internally heated pyrolysis zone |
Apr. 18, 2000 |
| 6048434 |
Substrate holding system including an electrostatic chuck |
Apr. 11, 2000 |
| 6045619 |
Horizontal-type silicon-nitride furnace |
Apr. 4, 2000 |
| 6046435 |
Method of heating a substrate with multiple selectively deactuated heaters |
Apr. 4, 2000 |
| 6047107 |
Furnace for rapid thermal processing with optical switching film disposed between heater and reflector |
Apr. 4, 2000 |
| 6043460 |
System and method for thermal processing of a semiconductor substrate |
Mar. 28, 2000 |
| 6039810 |
High temperature vapor coating container |
Mar. 21, 2000 |
| 6039811 |
Apparatus for fabricating polysilicon film for semiconductor device |
Mar. 21, 2000 |
| 6036781 |
Apparatus for guiding air current in a wafer loading chamber for chemical vapor deposition equipment |
Mar. 14, 2000 |
| 6036783 |
Liquid material vaporizer apparatus and gas ejection device |
Mar. 14, 2000 |
| 6037241 |
Apparatus and method for depositing a semiconductor material |
Mar. 14, 2000 |
| 6032724 |
Temperature control apparatus for sample susceptor |
Mar. 7, 2000 |
| 6033474 |
Apparatus for baking photoresist applied on substrate |
Mar. 7, 2000 |
| 6030461 |
Portable cooling system for use with a semiconductor fabrication system |
Feb. 29, 2000 |
| 6027604 |
Dry etching apparatus having upper and lower electrodes with grooved insulating rings or grooved chamber sidewalls |
Feb. 22, 2000 |
| 6022412 |
Epitaxial reactor, susceptor and gas-flow system |
Feb. 8, 2000 |
| 6022415 |
Spherical article conveying atmosphere replacing device |
Feb. 8, 2000 |
| 6023555 |
Radiant heating apparatus and method |
Feb. 8, 2000 |
| 6021152 |
Reflective surface for CVD reactor walls |
Feb. 1, 2000 |
| 6019166 |
Pickup chuck with an integral heatsink |
Feb. 1, 2000 |
| 6018616 |
Thermal cycling module and process using radiant heat |
Jan. 25, 2000 |
| 6015594 |
Method and apparatus for forming a film by sputtering process |
Jan. 18, 2000 |
| 6013134 |
Advance integrated chemical vapor deposition (AICVD) for semiconductor devices |
Jan. 11, 2000 |
| 6007633 |
Single-substrate-processing apparatus in semiconductor processing system |
Dec. 28, 1999 |
| 5997650 |
Reactor having an array of heating filaments and a filament force regulator |
Dec. 7, 1999 |
| 5998768 |
Active thermal control of surfaces by steering heating beam in response to sensed thermal radiation |
Dec. 7, 1999 |
| 5992346 |
Apparatus for the surface treatment of workpieces |
Nov. 30, 1999 |
| 5994675 |
Semiconductor processing furnace heating control system |
Nov. 30, 1999 |
| 5994678 |
Apparatus for ceramic pedestal and metal shaft assembly |
Nov. 30, 1999 |
| 5991508 |
Thermal processing apparatus with a shield between heater and substrate |
Nov. 23, 1999 |
| 5985034 |
Opening filling apparatus for manufacturing a semiconductor device |
Nov. 16, 1999 |
| 5985035 |
Method of holding substrate and substrate holding system |
Nov. 16, 1999 |
| 5981913 |
Static electricity chuck and wafer stage |
Nov. 9, 1999 |
| 5974682 |
Cooling process system |
Nov. 2, 1999 |
| 5975011 |
Apparatus for fabricating spherical shaped semiconductor integrated circuits |
Nov. 2, 1999 |
| 5976258 |
High temperature substrate transfer module |
Nov. 2, 1999 |
| 5972114 |
Film deposition apparatus with anti-adhesion film and chamber cooling means |
Oct. 26, 1999 |
| 5972183 |
Getter pump module and system |
Oct. 26, 1999 |
| 5968276 |
Heat exchange passage connection |
Oct. 19, 1999 |
| 5961774 |
Method of holding substrate and substrate holding system |
Oct. 5, 1999 |
| 5961798 |
System and method for vacuum coating of articles having precise and reproducible positioning of articles |
Oct. 5, 1999 |
| 5961850 |
Plasma processing method and apparatus |
Oct. 5, 1999 |
| 5962085 |
Misted precursor deposition apparatus and method with improved mist and mist flow |
Oct. 5, 1999 |
| RE36328 |
Semiconductor manufacturing apparatus including temperature control mechanism |
Oct. 5, 1999 |
| 5958510 |
Method and apparatus for forming a thin polymer layer on an integrated circuit structure |
Sep. 28, 1999 |
| 5960159 |
Heat treatment of semiconductor wafers where upper heater directly heats upper wafer in its entirety and lower heater directly heats lower wafer in its entirety |
Sep. 28, 1999 |
| 5951767 |
Molecular beam epitaxy isolation tube system |
Sep. 14, 1999 |
| 5951770 |
Carousel wafer transfer system |
Sep. 14, 1999 |
| 5951772 |
Vacuum processing apparatus |
Sep. 14, 1999 |
| RE36295 |
Apparatus for growing metal oxides using organometallic vapor phase epitaxy |
Sep. 14, 1999 |
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