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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6129044 |
Apparatus for substrate processing with improved throughput and yield |
Oct. 10, 2000 |
| 6129951 |
Apparatus and method for matrix coating fibres with metal vapour |
Oct. 10, 2000 |
| 6123775 |
Reaction chamber component having improved temperature uniformity |
Sep. 26, 2000 |
| 6120608 |
Workpiece support platen for semiconductor process chamber |
Sep. 19, 2000 |
| 6121580 |
Lamp annealer and method for annealing semiconductor wafer |
Sep. 19, 2000 |
| 6121581 |
Semiconductor processing system |
Sep. 19, 2000 |
| 6117245 |
Method and apparatus for controlling cooling and heating fluids for a gas distribution plate |
Sep. 12, 2000 |
| 6113703 |
Method and apparatus for processing the upper and lower faces of a wafer |
Sep. 5, 2000 |
| 6113704 |
Substrate-supporting device for semiconductor processing |
Sep. 5, 2000 |
| 6113732 |
Deposited film forming apparatus |
Sep. 5, 2000 |
| 6109209 |
Apparatus for use with CVI/CVD processes |
Aug. 29, 2000 |
| 6109915 |
Drafting apparatus |
Aug. 29, 2000 |
| 6110288 |
Temperature probe and measurement method for low pressure process |
Aug. 29, 2000 |
| 6110289 |
Rapid thermal processing barrel reactor for processing substrates |
Aug. 29, 2000 |
| 6110556 |
Lid assembly for a process chamber employing asymmetric flow geometries |
Aug. 29, 2000 |
| 6111225 |
Wafer processing apparatus with a processing vessel, upper and lower separately sealed heating vessels, and means for maintaining the vessels at predetermined pressures |
Aug. 29, 2000 |
| 6106625 |
Reactor useful for chemical vapor deposition of titanium nitride |
Aug. 22, 2000 |
| 6106627 |
Apparatus for producing metal coated polymers |
Aug. 22, 2000 |
| 6107198 |
Ammonium chloride vaporizer cold trap |
Aug. 22, 2000 |
| 6107608 |
Temperature controlled spin chuck |
Aug. 22, 2000 |
| 6108490 |
Multizone illuminator for rapid thermal processing with improved spatial resolution |
Aug. 22, 2000 |
| 6098637 |
In situ cleaning of the surface inside a vacuum processing chamber |
Aug. 8, 2000 |
| 6099648 |
Domed wafer reactor vessel window with reduced stress at atmospheric and above atmospheric pressures |
Aug. 8, 2000 |
| 6099652 |
Apparatus and method for depositing a substance with temperature control |
Aug. 8, 2000 |
| 6097005 |
Substrate processing apparatus and substrate processing method |
Aug. 1, 2000 |
| 6095083 |
Vacuum processing chamber having multi-mode access |
Aug. 1, 2000 |
| 6096133 |
Chemical vapor deposition apparatus |
Aug. 1, 2000 |
| D428858 |
Quartz fin heat retaining tube |
Aug. 1, 2000 |
| 6092486 |
Plasma processing apparatus and plasma processing method |
Jul. 25, 2000 |
| 6093911 |
Vacuum heating furnace with tapered portion |
Jul. 25, 2000 |
| 6090210 |
Multi-zone gas flow control in a process chamber |
Jul. 18, 2000 |
| 6090458 |
Method and apparatus for film formation by chemical vapor deposition |
Jul. 18, 2000 |
| 6091056 |
Hot plate oven for processing flat panel displays and large wafers |
Jul. 18, 2000 |
| 6086362 |
Multi-function chamber for a substrate processing system |
Jul. 11, 2000 |
| 6086677 |
Dual gas faceplate for a showerhead in a semiconductor wafer processing system |
Jul. 11, 2000 |
| 6086679 |
Deposition systems and processes for transport polymerization and chemical vapor deposition |
Jul. 11, 2000 |
| 6087003 |
Method of coating particles and coated spherical particles |
Jul. 11, 2000 |
| 6080969 |
Apparatus for and method of thermally processing substrate |
Jun. 27, 2000 |
| 6074479 |
Silicon single crystal wafer annealing method and equipment, and silicon single crystal wafer and manufacturing method related thereto |
Jun. 13, 2000 |
| 6073577 |
Electrode for plasma processes and method for manufacture and use thereof |
Jun. 13, 2000 |
| 6071350 |
Semiconductor device manufacturing apparatus employing vacuum system |
Jun. 6, 2000 |
| 6072163 |
Combination bake/chill apparatus incorporating low thermal mass, thermally conductive bakeplate |
Jun. 6, 2000 |
| 6067931 |
Thermal processor for semiconductor wafers |
May. 30, 2000 |
| 6065615 |
Vertical wafer boat |
May. 23, 2000 |
| 6066209 |
Cold trap |
May. 23, 2000 |
| 6063233 |
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
May. 16, 2000 |
| 6064800 |
Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes |
May. 16, 2000 |
| 6055927 |
Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology |
May. 2, 2000 |
| 6056850 |
Apparatus for improving the performance of a temperature-sensitive etch process |
May. 2, 2000 |
| 6051099 |
Apparatus for achieving etch rate uniformity |
Apr. 18, 2000 |
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