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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6200389 |
Single body injector and deposition chamber |
Mar. 13, 2001 |
| 6200634 |
Thermal processing system with supplemental resistive heater and shielded optical pyrometry |
Mar. 13, 2001 |
| 6201219 |
Chamber and cleaning process therefor |
Mar. 13, 2001 |
| 6197121 |
Chemical vapor deposition apparatus |
Mar. 6, 2001 |
| 6198075 |
Rapid heating and cooling vacuum oven |
Mar. 6, 2001 |
| 6192829 |
Antenna coil assemblies for substrate processing chambers |
Feb. 27, 2001 |
| 6193507 |
Multi-function chamber for a substrate processing system |
Feb. 27, 2001 |
| 6194322 |
Electrode for plasma processes and method for a manufacture and use thereof |
Feb. 27, 2001 |
| 6189482 |
High temperature, high flow rate chemical vapor deposition apparatus and related methods |
Feb. 20, 2001 |
| 6190458 |
Apparatus for eliminating impurities by ozone generated in space above substrate surface and film forming method and system therewith |
Feb. 20, 2001 |
| 6191388 |
Thermal processor and components thereof |
Feb. 20, 2001 |
| 6191394 |
Heat treating apparatus |
Feb. 20, 2001 |
| 6191416 |
Apparatus for producing a beam of atoms or radicals |
Feb. 20, 2001 |
| 6188838 |
Apparatus for heat treating a semiconductor wafer to reduce stress |
Feb. 13, 2001 |
| 6183565 |
Method and apparatus for supporting a semiconductor wafer during processing |
Feb. 6, 2001 |
| 6184498 |
Apparatus for thermally processing semiconductor wafer |
Feb. 6, 2001 |
| 6185370 |
Heating apparatus for heating an object to be processed |
Feb. 6, 2001 |
| 6176931 |
Wafer clamp ring for use in an ionized physical vapor deposition apparatus |
Jan. 23, 2001 |
| 6174408 |
Method and apparatus for dry etching |
Jan. 16, 2001 |
| 6171402 |
Thermal conditioning apparatus |
Jan. 9, 2001 |
| 6173116 |
Furnace for rapid thermal processing |
Jan. 9, 2001 |
| 6167834 |
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process |
Jan. 2, 2001 |
| 6167837 |
Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactor |
Jan. 2, 2001 |
| 6168667 |
Resist-processing apparatus |
Jan. 2, 2001 |
| 6169274 |
Heat treatment apparatus and method, detecting temperatures at plural positions each different in depth in holding plate, and estimating temperature of surface of plate corresponding to detect |
Jan. 2, 2001 |
| 6165271 |
Temperature controlled process and chamber lid |
Dec. 26, 2000 |
| 6165273 |
Equipment for UV wafer heating and photochemistry |
Dec. 26, 2000 |
| 6165274 |
Plasma processing apparatus and method |
Dec. 26, 2000 |
| 6167195 |
Multizone illuminator for rapid thermal processing with improved spatial resolution |
Dec. 26, 2000 |
| 6161500 |
Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions |
Dec. 19, 2000 |
| 6159300 |
Apparatus for forming non-single-crystal semiconductor thin film, method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device |
Dec. 12, 2000 |
| 6159301 |
Substrate holding apparatus for processing semiconductor |
Dec. 12, 2000 |
| 6160242 |
Apparatus and process for measuring the temperature of semiconductor wafers in the presence of radiation absorbing gases |
Dec. 12, 2000 |
| 6152072 |
Chemical vapor deposition coating of fibers using microwave application |
Nov. 28, 2000 |
| 6152074 |
Deposition of a thin film on a substrate using a multi-beam source |
Nov. 28, 2000 |
| 6153012 |
Device for treating a substrate |
Nov. 28, 2000 |
| 6153044 |
Protection of lithographic components from particle contamination |
Nov. 28, 2000 |
| 6148765 |
Electrode for plasma processes and method for manufacture and use thereof |
Nov. 21, 2000 |
| RE36957 |
Method and apparatus for cold wall chemical vapor deposition |
Nov. 21, 2000 |
| 6143077 |
Chemical vapor deposition apparatus |
Nov. 7, 2000 |
| 6143083 |
Substrate transferring mechanism |
Nov. 7, 2000 |
| 6143085 |
Laser desorption of CVD precursor species |
Nov. 7, 2000 |
| 6143659 |
Method for manufacturing aluminum metal interconnection layer by atomic layer deposition method |
Nov. 7, 2000 |
| 6139641 |
Substrate processing apparatus having a gas heating tube |
Oct. 31, 2000 |
| 6139642 |
Substrate processing apparatus and method |
Oct. 31, 2000 |
| 6140616 |
Wafer level burn-in and test thermal chuck and method |
Oct. 31, 2000 |
| 6137088 |
Baking of photoresist on wafers |
Oct. 24, 2000 |
| 6132514 |
Catalytic breakdown of reactant gases in chemical vapor deposition |
Oct. 17, 2000 |
| 6132553 |
Substrate processing apparatus |
Oct. 17, 2000 |
| 6134385 |
Water free furnace tube with self-heating quartz plug |
Oct. 17, 2000 |
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