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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6265696 |
Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface |
Jul. 24, 2001 |
| 6262393 |
Epitaxial growth furnace |
Jul. 17, 2001 |
| 6262397 |
Heat treatment apparatus and heat treatment method |
Jul. 17, 2001 |
| 6258170 |
Vaporization and deposition apparatus |
Jul. 10, 2001 |
| 6258172 |
Method and apparatus for boronizing a metal workpiece |
Jul. 10, 2001 |
| 6258174 |
Gas supplying apparatus |
Jul. 10, 2001 |
| 6259061 |
Vertical-heat-treatment apparatus with movable lid and compensation heater movable therewith |
Jul. 10, 2001 |
| 6259062 |
Process chamber cooling |
Jul. 10, 2001 |
| 6259066 |
Process and device for processing a material by electromagnetic radiation in a controlled atmosphere |
Jul. 10, 2001 |
| 6253464 |
Method for protection of lithographic components from particle contamination |
Jul. 3, 2001 |
| 6254683 |
Substrate temperature control method and device |
Jul. 3, 2001 |
| 6254686 |
Vented lower liner for heating exhaust gas from a single substrate reactor |
Jul. 3, 2001 |
| 6254933 |
Method of chemical vapor deposition |
Jul. 3, 2001 |
| 6250374 |
Apparatus and method for treating substrates |
Jun. 26, 2001 |
| 6251189 |
Substrate processing apparatus and substrate processing method |
Jun. 26, 2001 |
| 6252203 |
Lamp system for uniform semiconductor wafer heating |
Jun. 26, 2001 |
| 6245147 |
Thermal processing jig for use in manufacturing semiconductor devices and method of manufacturing the same |
Jun. 12, 2001 |
| 6245150 |
Vapor coating apparatus |
Jun. 12, 2001 |
| 6246030 |
Heat processing method and apparatus |
Jun. 12, 2001 |
| 6246031 |
Mini batch furnace |
Jun. 12, 2001 |
| 6241822 |
Vertical heat treatment apparatus |
Jun. 5, 2001 |
| 6242718 |
Wafer holder |
Jun. 5, 2001 |
| 6238485 |
Optical transmission systems and apparatuses including bragg gratings and methods of making |
May. 29, 2001 |
| 6238488 |
Method of cleaning film forming apparatus, cleaning system for carrying out the same and film forming system |
May. 29, 2001 |
| 6238532 |
Radio-frequency coil for use in an ionized physical vapor deposition apparatus |
May. 29, 2001 |
| 6238739 |
Non-plasma CVD method and apparatus of forming Ti1-xA1xN coatings |
May. 29, 2001 |
| 6239413 |
Light irradiation annealing apparatus having infrared radiation cut filter |
May. 29, 2001 |
| 6235121 |
Vertical thermal treatment apparatus |
May. 22, 2001 |
| 6236023 |
Cleaning process for rapid thermal processing system |
May. 22, 2001 |
| 6232580 |
Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes |
May. 15, 2001 |
| 6227786 |
Substrate treating apparatus |
May. 8, 2001 |
| 6228171 |
Heat processing apparatus |
May. 8, 2001 |
| 6228174 |
Heat treatment system using ring-shaped radiation heater elements |
May. 8, 2001 |
| 6229118 |
Wafer handling apparatus for transferring a wafer to and from a process chamber |
May. 8, 2001 |
| 6224677 |
Gas recovery unit utilizing dual use of gas |
May. 1, 2001 |
| 6224678 |
Modified thermocouple mounting bushing and system including the same |
May. 1, 2001 |
| 6225601 |
Heating a substrate support in a substrate handling chamber |
May. 1, 2001 |
| 6221155 |
Chemical vapor deposition system for polycrystalline silicon rod production |
Apr. 24, 2001 |
| 6221201 |
Method of holding substrate and substrate holding system |
Apr. 24, 2001 |
| 6221203 |
Apparatus and method for controlling temperature of a chamber |
Apr. 24, 2001 |
| 6221205 |
Apparatus for improving the performance of a temperature-sensitive etch |
Apr. 24, 2001 |
| 6222990 |
Heating element for heating the edges of wafers in thermal processing chambers |
Apr. 24, 2001 |
| 6222991 |
Method for rotationally aligning and degassing semiconductor substrate within single vacuum chamber |
Apr. 24, 2001 |
| 6214121 |
Pedestal with a thermally controlled platen |
Apr. 10, 2001 |
| 6214123 |
Chemical vapor deposition systems and methods for depositing films on semiconductor wafers |
Apr. 10, 2001 |
| 6215106 |
Thermally processing a substrate |
Apr. 10, 2001 |
| 6210484 |
Heating device containing a multi-lamp cone for heating semiconductor wafers |
Apr. 3, 2001 |
| 6210485 |
Chemical vapor deposition vaporizer |
Apr. 3, 2001 |
| 6206969 |
Method and apparatus for fabricating semiconductor |
Mar. 27, 2001 |
| 6207026 |
Magnetron with cooling system for substrate processing system |
Mar. 27, 2001 |
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