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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6331212 |
Methods and apparatus for thermally processing wafers |
Dec. 18, 2001 |
| 6328807 |
Chuck heater for improved planar deposition process |
Dec. 11, 2001 |
| 6329304 |
Floating wafer reactor and method for the regulation of the temperature thereof |
Dec. 11, 2001 |
| 6325857 |
CVD apparatus |
Dec. 4, 2001 |
| 6325858 |
Long life high temperature process chamber |
Dec. 4, 2001 |
| 6322631 |
Heat treatment method and its apparatus |
Nov. 27, 2001 |
| 6323463 |
Method and apparatus for reducing contamination in a wafer loadlock of a semiconductor wafer processing system |
Nov. 27, 2001 |
| 6324341 |
Lot-to-lot rapid thermal processing (RTP) chamber preheat optimization |
Nov. 27, 2001 |
| 6319327 |
MOCVD system |
Nov. 20, 2001 |
| 6319569 |
Method of controlling vapor deposition substrate temperature |
Nov. 20, 2001 |
| 6321134 |
Clustertool system software using plasma immersion ion implantation |
Nov. 20, 2001 |
| 6316747 |
Apparatus for the thermal treatment of substrates |
Nov. 13, 2001 |
| 6316748 |
Apparatus for manufacturing a semiconductor device |
Nov. 13, 2001 |
| 6315859 |
Apparatus and method for improving uniformity in batch processing of semiconductor wafers |
Nov. 13, 2001 |
| 6313441 |
Control system and method for providing variable ramp rate operation of a thermal cycling system |
Nov. 6, 2001 |
| 6313443 |
Apparatus for processing material at controlled temperatures |
Nov. 6, 2001 |
| 6310323 |
Water cooled support for lamps and rapid thermal processing chamber |
Oct. 30, 2001 |
| 6310327 |
Rapid thermal processing apparatus for processing semiconductor wafers |
Oct. 30, 2001 |
| 6311016 |
Substrate temperature measuring apparatus, substrate temperature measuring method, substrate heating method and heat treatment apparatus |
Oct. 30, 2001 |
| 6307184 |
Thermal processing chamber for heating and cooling wafer-like objects |
Oct. 23, 2001 |
| 6302962 |
Diffusion system having air curtain formation function for manufacturing semiconductor devices and method of controlling the same |
Oct. 16, 2001 |
| 6302963 |
Bell jar having integral gas distribution channeling |
Oct. 16, 2001 |
| 6302966 |
Temperature control system for plasma processing apparatus |
Oct. 16, 2001 |
| 6303517 |
Fast deposition on spherical-shaped integrated circuits in non-contact CVD process |
Oct. 16, 2001 |
| 6303906 |
Resistively heated single wafer furnace |
Oct. 16, 2001 |
| 6303908 |
Heat treatment apparatus |
Oct. 16, 2001 |
| 6301434 |
Apparatus and method for CVD and thermal processing of semiconductor substrates |
Oct. 9, 2001 |
| 6301435 |
Heating method |
Oct. 9, 2001 |
| 6299691 |
Method of and apparatus for processing a substrate under a reduced pressure |
Oct. 9, 2001 |
| 6300600 |
Hot wall rapid thermal processor |
Oct. 9, 2001 |
| 6300601 |
Lamp unit and light radiating type heating device |
Oct. 9, 2001 |
| 6296709 |
Temperature ramp for vertical diffusion furnace |
Oct. 2, 2001 |
| 6297480 |
Method and apparatus for preventing contamination in a hot plate oven |
Oct. 2, 2001 |
| 6290491 |
Method for heating a semiconductor wafer in a process chamber by a shower head, and process chamber |
Sep. 18, 2001 |
| 6291799 |
Process and arrangement for heat treatment of two-dimensional objects |
Sep. 18, 2001 |
| 6291800 |
Heat treatment apparatus and substrate processing system |
Sep. 18, 2001 |
| 6291801 |
Continual flow rapid thermal processing apparatus and method |
Sep. 18, 2001 |
| 6286451 |
Dome: shape and temperature controlled surfaces |
Sep. 11, 2001 |
| 6287386 |
Carousel wafer transfer system |
Sep. 11, 2001 |
| 6287413 |
Apparatus for processing both sides of a microelectronic device precursor |
Sep. 11, 2001 |
| 6287984 |
Apparatus and method for manufacturing semiconductor device |
Sep. 11, 2001 |
| 6288368 |
Vacuum heating furnace with tapered portion |
Sep. 11, 2001 |
| 6284051 |
Cooled window |
Sep. 4, 2001 |
| 6285010 |
Method and device for high-temperature, high-pressure treatment of semiconductor wafer |
Sep. 4, 2001 |
| 6279503 |
Chemical vapor deposition apparatus for manufacturing semiconductor devices |
Aug. 28, 2001 |
| 6281479 |
Continual flow rapid thermal processing apparatus and method |
Aug. 28, 2001 |
| 6273957 |
Vaporizing device for CVD source materials and CVD apparatus employing the same |
Aug. 14, 2001 |
| 6271503 |
Dimensional compensating vacuum fixture |
Aug. 7, 2001 |
| 6268045 |
Hard material coating of a cemented carbide or carbide containing cermet substrate |
Jul. 31, 2001 |
| 6264750 |
Method and system for forming SbSI thin films |
Jul. 24, 2001 |
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