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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6483083 |
Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface |
Nov. 19, 2002 |
| 6483989 |
Substrate processing apparatus and semiconductor device producing method |
Nov. 19, 2002 |
| 6474986 |
Hot plate cooling method and heat processing apparatus |
Nov. 5, 2002 |
| 6476362 |
Lamp array for thermal processing chamber |
Nov. 5, 2002 |
| 6471779 |
Gas feed ceramic structure for semiconductor-producing apparatus |
Oct. 29, 2002 |
| 6472639 |
Heat treatment method and heat treatment apparatus |
Oct. 29, 2002 |
| 6468353 |
Method and apparatus for improved substrate handling |
Oct. 22, 2002 |
| 6470144 |
Vaporizer for chemical vapor deposition apparatus, chemical vapor deposition apparatus, and semiconductor device manufactured thereby |
Oct. 22, 2002 |
| 6464789 |
Substrate processing apparatus |
Oct. 15, 2002 |
| 6464792 |
Process chamber with downstream getter plate |
Oct. 15, 2002 |
| 6464793 |
Semiconductor crystal growth apparatus |
Oct. 15, 2002 |
| 6464794 |
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates |
Oct. 15, 2002 |
| 6464825 |
Substrate processing apparatus including a magnetically levitated and rotated substrate holder |
Oct. 15, 2002 |
| 6465369 |
Method for stabilizing semiconductor degas temperature |
Oct. 15, 2002 |
| 6461435 |
Showerhead with reduced contact area |
Oct. 8, 2002 |
| 6461436 |
Apparatus and process of improving atomic layer deposition chamber performance |
Oct. 8, 2002 |
| 6461438 |
Heat treatment unit, cooling unit and cooling treatment method |
Oct. 8, 2002 |
| 6461439 |
Apparatus for supporting a semiconductor wafer during processing |
Oct. 8, 2002 |
| 6461667 |
Apparatus and method for vapor depositing lubricant coating on a web |
Oct. 8, 2002 |
| 6462310 |
Hot wall rapid thermal processor |
Oct. 8, 2002 |
| 6453992 |
Temperature controllable gas distributor |
Sep. 24, 2002 |
| 6455172 |
Laminated ribbon and method and apparatus for producing same |
Sep. 24, 2002 |
| 6455814 |
Backside heating chamber for emissivity independent thermal processes |
Sep. 24, 2002 |
| 6450805 |
Hot plate cooling method and heat processing apparatus |
Sep. 17, 2002 |
| 6446355 |
Disk drying apparatus and method |
Sep. 10, 2002 |
| 6447734 |
Vaporization and cracker cell apparatus |
Sep. 10, 2002 |
| 6448536 |
Single-substrate-heat-processing apparatus for semiconductor process |
Sep. 10, 2002 |
| 6448537 |
Single-wafer process chamber thermal convection processes |
Sep. 10, 2002 |
| 6444940 |
Heat treating device and heat treating method |
Sep. 3, 2002 |
| 6442950 |
Cooling system of chamber with removable liner |
Sep. 3, 2002 |
| 6444042 |
Gas injection system for chemical vapor deposition device |
Sep. 3, 2002 |
| 6440221 |
Process chamber having improved temperature control |
Aug. 27, 2002 |
| 6437290 |
Heat treatment apparatus having a thin light-transmitting window |
Aug. 20, 2002 |
| 6435868 |
Multi-function chamber for a substrate processing system |
Aug. 20, 2002 |
| 6436837 |
Domed wafer reactor vessel window with reduced stress at atmospheric and above atmospheric pressures |
Aug. 20, 2002 |
| 6431115 |
Plasma treatment method and apparatus |
Aug. 13, 2002 |
| 6432206 |
Heating element for use in a hot filament chemical vapor deposition chamber |
Aug. 13, 2002 |
| 6432207 |
Method and structure for baking a wafer |
Aug. 13, 2002 |
| 6432208 |
Plasma processing apparatus |
Aug. 13, 2002 |
| 6432259 |
Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates |
Aug. 13, 2002 |
| 6427622 |
Hot wire chemical vapor deposition method and apparatus using graphite hot rods |
Aug. 6, 2002 |
| 6423178 |
Apparatus for plasma process |
Jul. 23, 2002 |
| 6423947 |
Thermal processing chamber for heating and cooling wafer-like objects |
Jul. 23, 2002 |
| 6424800 |
Bubbler |
Jul. 23, 2002 |
| 6416579 |
Apparatus for treating silicon wafers |
Jul. 9, 2002 |
| 6414277 |
Ultra-high-temperature heat treatment apparatus |
Jul. 2, 2002 |
| 6414279 |
Heat treatment device of the light irradiation type |
Jul. 2, 2002 |
| 6414280 |
Heat treatment method and heat treatment apparatus |
Jul. 2, 2002 |
| 6414648 |
Plasma reactor having a symmetric parallel conductor coil antenna |
Jul. 2, 2002 |
| 6408786 |
Semiconductor processing equipment having tiled ceramic liner |
Jun. 25, 2002 |
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