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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6559424 |
Windows used in thermal processing chambers |
May. 6, 2003 |
| 6554905 |
Rotating semiconductor processing apparatus |
Apr. 29, 2003 |
| 6551406 |
Apparatus for growing thin films |
Apr. 22, 2003 |
| 6551448 |
Heat processing apparatus of substrate |
Apr. 22, 2003 |
| 6552308 |
Substrate temperature adjustment apparatus for estimating a time taken until a substrate temperature falls within a target temperature range |
Apr. 22, 2003 |
| 6547922 |
Vacuum-processing apparatus using a movable cooling plate during processing |
Apr. 15, 2003 |
| 6544338 |
Inverted hot plate cure module |
Apr. 8, 2003 |
| 6544379 |
Method of holding substrate and substrate holding system |
Apr. 8, 2003 |
| 6540839 |
Apparatus and method to passivate magnets and magnetic materials |
Apr. 1, 2003 |
| 6537422 |
Single-substrate-heat-processing apparatus for semiconductor process |
Mar. 25, 2003 |
| 6538237 |
Apparatus for holding a quartz furnace |
Mar. 25, 2003 |
| 6532796 |
Method of substrate temperature control and method of assessing substrate temperature controllability |
Mar. 18, 2003 |
| 6534748 |
Semiconductor purification apparatus and method |
Mar. 18, 2003 |
| 6530732 |
Single substrate load lock with offset cool module and buffer chamber |
Mar. 11, 2003 |
| 6527865 |
Temperature controlled gas feedthrough |
Mar. 4, 2003 |
| 6528767 |
Pre-heating and load lock pedestal material for high temperature CVD liquid crystal and flat panel display applications |
Mar. 4, 2003 |
| 6529686 |
Heating member for combination heating and chilling apparatus, and methods |
Mar. 4, 2003 |
| 6524428 |
Method of holding substrate and substrate holding system |
Feb. 25, 2003 |
| 6518547 |
Heat treatment apparatus |
Feb. 11, 2003 |
| 6519417 |
Semiconductor wafer baking apparatus |
Feb. 11, 2003 |
| 6514073 |
Resist processing method and resist processing apparatus |
Feb. 4, 2003 |
| 6514376 |
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
Feb. 4, 2003 |
| 6514879 |
Method and apparatus for dry/catalytic-wet steam oxidation of silicon |
Feb. 4, 2003 |
| 6515261 |
Enhanced lift pin |
Feb. 4, 2003 |
| 6515264 |
Heater |
Feb. 4, 2003 |
| 6512206 |
Continuous process furnace |
Jan. 28, 2003 |
| 6512207 |
Apparatus and method for the treatment of substrates |
Jan. 28, 2003 |
| 6512885 |
Liquid raw material vaporizer, semiconductor device and method of manufacturing semiconductor device |
Jan. 28, 2003 |
| 6508884 |
Wafer holder for semiconductor manufacturing apparatus, method of manufacturing wafer holder, and semiconductor manufacturing apparatus |
Jan. 21, 2003 |
| 6506256 |
Method and apparatus for diffusion of an impurity into a semiconductor wafer with high in-plane diffusion uniformity |
Jan. 14, 2003 |
| 6506291 |
Substrate support with multilevel heat transfer mechanism |
Jan. 14, 2003 |
| 6507007 |
System of controlling the temperature of a processing chamber |
Jan. 14, 2003 |
| 6502529 |
Chamber having improved gas energizer and method |
Jan. 7, 2003 |
| 6501191 |
Heat treatment apparatus and method |
Dec. 31, 2002 |
| 6497767 |
Thermal processing unit for single substrate |
Dec. 24, 2002 |
| 6494955 |
Ceramic substrate support |
Dec. 17, 2002 |
| 6495233 |
Apparatus for distributing gases in a chemical vapor deposition system |
Dec. 17, 2002 |
| 6495473 |
Substrate processing apparatus and method of manufacturing semiconductor device |
Dec. 17, 2002 |
| 6495802 |
Temperature-controlled chuck and method for controlling the temperature of a substantially flat object |
Dec. 17, 2002 |
| 6495805 |
Method of determining set temperature trajectory for heat treatment system |
Dec. 17, 2002 |
| 6496648 |
Apparatus and method for rapid thermal processing |
Dec. 17, 2002 |
| 6492621 |
Hot wall rapid thermal processor |
Dec. 10, 2002 |
| 6488407 |
Radiation temperature measuring method and radiation temperature measuring system |
Dec. 3, 2002 |
| 6488776 |
Method and apparatus for forming insitu boron doped polycrystalline and amorphous silicon films |
Dec. 3, 2002 |
| 6488778 |
Apparatus and method for controlling wafer environment between thermal clean and thermal processing |
Dec. 3, 2002 |
| 6485605 |
High temperature process chamber having improved heat endurance |
Nov. 26, 2002 |
| 6486444 |
Load-lock with external staging area |
Nov. 26, 2002 |
| 6482753 |
Substrate processing apparatus and method for manufacturing semiconductor device |
Nov. 19, 2002 |
| 6483068 |
Apparatus for hard baking photoresist pattern |
Nov. 19, 2002 |
| 6483081 |
In-line cure furnace and method for using the same |
Nov. 19, 2002 |
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