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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7453051 |
System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy |
Nov. 18, 2008 |
| 7452420 |
Apparatus and method for diamond production |
Nov. 18, 2008 |
| 7446284 |
Etch resistant wafer processing apparatus and method for producing the same |
Nov. 4, 2008 |
| 7442900 |
Chamber for uniform heating of large area substrates |
Oct. 28, 2008 |
| 7442413 |
Methods and apparatus for treating a work piece with a vaporous element |
Oct. 28, 2008 |
| 7442275 |
Lateral temperature equalizing system for large area surfaces during processing |
Oct. 28, 2008 |
| 7438872 |
Steam oxidation apparatus |
Oct. 21, 2008 |
| 7432475 |
Vertical heat treatment device and method controlling the same |
Oct. 7, 2008 |
| 7429717 |
Multizone heater for furnace |
Sep. 30, 2008 |
| 7427329 |
Temperature control for single substrate semiconductor processing reactor |
Sep. 23, 2008 |
| 7422655 |
Apparatus for performing semiconductor processing on target substrate |
Sep. 9, 2008 |
| 7422635 |
Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces |
Sep. 9, 2008 |
| 7419566 |
Plasma reactor |
Sep. 2, 2008 |
| 7419550 |
Oxidizing method and oxidizing unit of object for object to be processed |
Sep. 2, 2008 |
| 7416633 |
Plasma processing apparatus |
Aug. 26, 2008 |
| 7413610 |
Method and apparatus for coating or heat treatment of blisks for aircraft gas turbines |
Aug. 19, 2008 |
| 7411161 |
Susceptor for deposition process equipment and method of fabricating a heater therein |
Aug. 12, 2008 |
| 7408131 |
Wafer holder and semiconductor manufacturing apparatus |
Aug. 5, 2008 |
| 7402778 |
Oven for controlled heating of compounds at varying temperatures |
Jul. 22, 2008 |
| 7396432 |
Composite shadow ring assembled with dowel pins and method of using |
Jul. 8, 2008 |
| 7396411 |
Apparatus for manufacturing single crystal |
Jul. 8, 2008 |
| 7393418 |
Susceptor |
Jul. 1, 2008 |
| 7387686 |
Film formation apparatus |
Jun. 17, 2008 |
| 7381928 |
Thermal processing apparatus and thermal processing method |
Jun. 3, 2008 |
| 7381293 |
Convex insert ring for etch chamber |
Jun. 3, 2008 |
| 7381276 |
Susceptor pocket with beveled projection sidewall |
Jun. 3, 2008 |
| 7381275 |
Apparatus and method for manufacturing semiconductor |
Jun. 3, 2008 |
| 7381052 |
Apparatus and method for heating substrates |
Jun. 3, 2008 |
| 7378618 |
Rapid conductive cooling using a secondary process plane |
May. 27, 2008 |
| 7371998 |
Thermal wafer processor |
May. 13, 2008 |
| 7371997 |
Thermal processing apparatus and thermal processing method |
May. 13, 2008 |
| 7361230 |
Substrate processing apparatus |
Apr. 22, 2008 |
| 7361229 |
Device for deposition with chamber cleaner and method for cleaning chamber |
Apr. 22, 2008 |
| 7358462 |
Apparatus and method for reducing stray light in substrate processing chambers |
Apr. 15, 2008 |
| 7354622 |
Method for forming thin film and apparatus for forming thin film |
Apr. 8, 2008 |
| 7351936 |
Method and apparatus for preventing baking chamber exhaust line clog |
Apr. 1, 2008 |
| 7347901 |
Thermally zoned substrate holder assembly |
Mar. 25, 2008 |
| 7338578 |
Step edge insert ring for etch chamber |
Mar. 4, 2008 |
| 7337745 |
Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor |
Mar. 4, 2008 |
| 7335278 |
Plasma processing apparatus and plasma processing method |
Feb. 26, 2008 |
| 7335267 |
Heat treating apparatus having rotatable heating unit |
Feb. 26, 2008 |
| 7332691 |
Cooling plate, bake unit, and substrate treating apparatus |
Feb. 19, 2008 |
| 7332039 |
Plasma processing apparatus and method thereof |
Feb. 19, 2008 |
| 7332038 |
Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates |
Feb. 19, 2008 |
| 7327948 |
Cast pedestal with heating element and coaxial heat exchanger |
Feb. 5, 2008 |
| 7326303 |
Single-pass growth of multilayer patterned electronic and photonic devices using a scanning localized evaporation methodology (SLEM) |
Feb. 5, 2008 |
| 7321722 |
Method for thermal processing a semiconductor wafer |
Jan. 22, 2008 |
| 7313931 |
Method and device for heat treatment |
Jan. 1, 2008 |
| 7312422 |
Semiconductor batch heating assembly |
Dec. 25, 2007 |
| 7311797 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
Dec. 25, 2007 |
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