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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618687 |
Method for coating substrates |
Nov. 17, 2009 |
| 7618494 |
Substrate holding structure and substrate processing device |
Nov. 17, 2009 |
| 7616872 |
Temperature measurement and heat-treating methods and systems |
Nov. 10, 2009 |
| 7611586 |
Reactor for extended duration growth of gallium containing single crystals |
Nov. 3, 2009 |
| 7608802 |
Heating device for heating semiconductor wafers in thermal processing chambers |
Oct. 27, 2009 |
| 7601935 |
Two-wire hot runner nozzle heater system |
Oct. 13, 2009 |
| 7601934 |
Integrated thermal unit having a shuttle with a temperature controlled surface |
Oct. 13, 2009 |
| 7601933 |
Heat processing apparatus and heat processing method |
Oct. 13, 2009 |
| 7601224 |
Method of supporting a substrate in a gas cushion susceptor system |
Oct. 13, 2009 |
| 7585386 |
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
Sep. 8, 2009 |
| 7582166 |
Holder for supporting wafers during semiconductor manufacture |
Sep. 1, 2009 |
| 7576303 |
Wafer holder, and wafer prober provided therewith |
Aug. 18, 2009 |
| 7570876 |
Method and system for loading substrate supports into a substrate holder |
Aug. 4, 2009 |
| 7564008 |
Alumina member and manufacturing method thereof |
Jul. 21, 2009 |
| 7554059 |
Heater unit and semiconductor manufacturing apparatus including the same |
Jun. 30, 2009 |
| 7544916 |
Heating device |
Jun. 9, 2009 |
| 7544251 |
Method and apparatus for controlling temperature of a substrate |
Jun. 9, 2009 |
| 7528349 |
Temperature stabilization for substrate processing |
May. 5, 2009 |
| 7528347 |
Cooling device and heat treating device using the same |
May. 5, 2009 |
| 7527755 |
Method for increasing bulk conductivity of a ferroelectric material such as lithium tantalate |
May. 5, 2009 |
| 7525071 |
Power-supplying member and heating apparatus using the same |
Apr. 28, 2009 |
| 7525068 |
Heating system of batch type reaction chamber and method thereof |
Apr. 28, 2009 |
| 7524481 |
Reactors for producing inorganic fullerene-like tungsten disulfide hollow nanoparticles and nanotubes |
Apr. 28, 2009 |
| 7509035 |
Lamp array for thermal processing exhibiting improved radial uniformity |
Mar. 24, 2009 |
| 7503980 |
Substrate supporting apparatus |
Mar. 17, 2009 |
| 7497912 |
Substrate processing apparatus |
Mar. 3, 2009 |
| 7491913 |
Bake apparatus for use in spin-coating equipment |
Feb. 17, 2009 |
| 7488922 |
Susceptor system |
Feb. 10, 2009 |
| 7481312 |
Direct cooling pallet assembly for temperature stability for deep ion mill etch process |
Jan. 27, 2009 |
| 7466907 |
Annealing process and device of semiconductor wafer |
Dec. 16, 2008 |
| 7465475 |
Method for controlling the deposition of vaporized organic material |
Dec. 16, 2008 |
| 7462245 |
Single-wafer-processing type CVD apparatus |
Dec. 9, 2008 |
| 7461794 |
Substrate temperature regulating support pins |
Dec. 9, 2008 |
| 7453051 |
System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy |
Nov. 18, 2008 |
| 7452420 |
Apparatus and method for diamond production |
Nov. 18, 2008 |
| 7446284 |
Etch resistant wafer processing apparatus and method for producing the same |
Nov. 4, 2008 |
| 7442900 |
Chamber for uniform heating of large area substrates |
Oct. 28, 2008 |
| 7442413 |
Methods and apparatus for treating a work piece with a vaporous element |
Oct. 28, 2008 |
| 7442275 |
Lateral temperature equalizing system for large area surfaces during processing |
Oct. 28, 2008 |
| 7438872 |
Steam oxidation apparatus |
Oct. 21, 2008 |
| 7432475 |
Vertical heat treatment device and method controlling the same |
Oct. 7, 2008 |
| 7429717 |
Multizone heater for furnace |
Sep. 30, 2008 |
| 7427329 |
Temperature control for single substrate semiconductor processing reactor |
Sep. 23, 2008 |
| 7422655 |
Apparatus for performing semiconductor processing on target substrate |
Sep. 9, 2008 |
| 7422635 |
Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces |
Sep. 9, 2008 |
| 7419566 |
Plasma reactor |
Sep. 2, 2008 |
| 7419550 |
Oxidizing method and oxidizing unit of object for object to be processed |
Sep. 2, 2008 |
| 7416633 |
Plasma processing apparatus |
Aug. 26, 2008 |
| 7413610 |
Method and apparatus for coating or heat treatment of blisks for aircraft gas turbines |
Aug. 19, 2008 |
| 7411161 |
Susceptor for deposition process equipment and method of fabricating a heater therein |
Aug. 12, 2008 |
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