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Class Information
Number: 118/723R
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.)

Sub-classes under this class:

Class Number Class Name Patents
118/723FE Focused electron beam gas energizing means 65
118/723FI Focusing means for ion beam coating material or focused ion beam gas energizing means (i.e., excluding ion plating or ion implanting) 126
118/723E Having glow discharge electrodes (e.g., dc, ac, rf, etc.) 1,564
118/723HC Hot cathode means for thermionic emission of electrons (e.g., tungsten filament, etc.) 84
118/723MW Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) 534
118/723MP Multiple gas energizing means associated with one deposition site (i.e., excluding substrate heater as an energizing means) 278
118/723I Radio frequency antenna or radio frequency inductive coil discharge means 816
118/723VE Vacuum evaporation means within deposition chamber (e.g., activated reactive evaporation, etc.) 358

Patents under this class:

Patent Number Title Of Patent Date Issued
8702866 Showerhead electrode assembly with gas flow modification for extended electrode life Apr. 22, 2014
8691063 Methods and apparatus for forming diamond-like coatings Apr. 8, 2014
8679252 Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof Mar. 25, 2014
8677590 Plasma confinement structures in plasma processing systems and methods thereof Mar. 25, 2014
8673166 Plasma processing apparatus and plasma processing method Mar. 18, 2014
8673078 Take-up vacuum processing apparatus Mar. 18, 2014
8671882 Plasma processing apparatus Mar. 18, 2014
8671879 Systems and methods for plasma processing of microfeature workpieces Mar. 18, 2014
8664098 Plasma processing apparatus Mar. 4, 2014
8662011 Apparatus for carrying out plasma chemical vapour deposition and method of manufacturing an optical preform Mar. 4, 2014
8658521 Method and device for layer deposition Feb. 25, 2014
8652586 Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition Feb. 18, 2014
8652342 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same Feb. 18, 2014
8651048 Controlled deposition of metal and metal cluster ions by surface field patterning in soft-landing devices Feb. 18, 2014
8648315 Accelerator having a multi-channel micro-collimator Feb. 11, 2014
8646407 Film formation apparatus for semiconductor process and method for using the same Feb. 11, 2014
8642124 Gas dispersion shield method Feb. 4, 2014
8641862 High dose implantation strip (HDIS) in H2 base chemistry Feb. 4, 2014
8635971 Tunable uniformity in a plasma processing system Jan. 28, 2014
8633452 Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source Jan. 21, 2014
8628618 Precursor vapor generation and delivery system with filters and filter monitoring system Jan. 14, 2014
8627783 Combined wafer area pressure control and plasma confinement assembly Jan. 14, 2014
8623171 Plasma processing apparatus Jan. 7, 2014
8622021 High lifetime consumable silicon nitride-silicon dioxide plasma processing components Jan. 7, 2014
8618514 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions Dec. 31, 2013
8617349 Showerhead assembly for plasma processing chamber Dec. 31, 2013
8613827 Plasma treatment system Dec. 24, 2013
8610355 Reactor structure and plasma treatment apparatus Dec. 17, 2013
8610353 Plasma generating apparatus, plasma processing apparatus and plasma processing method Dec. 17, 2013
8609203 Method and apparatus for plasma surface treatment of moving substrate Dec. 17, 2013
8608852 Temperature controlled plasma processing chamber component with zone dependent thermal efficiencies Dec. 17, 2013
8607733 Atomic layer deposition apparatus and atomic layer deposition method Dec. 17, 2013
8607732 In-liquid plasma film-forming apparatus, electrode for in-liquid plasma, and film-forming method using in-liquid plasma Dec. 17, 2013
8607731 Cathode with inner and outer electrodes at different heights Dec. 17, 2013
8603591 Enhanced etch and deposition profile control using plasma sheath engineering Dec. 10, 2013
8603244 Vapor deposition device Dec. 10, 2013
8601978 Substrate processing apparatus, and magnetic recording medium manufacturing method Dec. 10, 2013
8592712 Mounting table structure and plasma film forming apparatus Nov. 26, 2013
8591709 Sputter deposition shield assembly to reduce cathode shorting Nov. 26, 2013
8585844 Extending lifetime of yttrium oxide as a plasma chamber material Nov. 19, 2013
8580075 Method and system for introduction of an active material to a chemical process Nov. 12, 2013
8574397 Bevel edge plasma chamber with top and bottom edge electrodes Nov. 5, 2013
8573154 Plasma film forming apparatus Nov. 5, 2013
8573152 Showerhead electrode Nov. 5, 2013
8573149 Film deposition apparatus for magnetic recording medium Nov. 5, 2013
8568556 Plasma processing apparatus and method for using plasma processing apparatus Oct. 29, 2013
8551890 Showerhead for CVD depositions Oct. 8, 2013
8551248 Showerhead for CVD depositions Oct. 8, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8547021 Plasma processing apparatus Oct. 1, 2013

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