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Class Information
Number: 118/723R
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.)
Description:
Sub-classes under this class:
| Class Number |
Class Name |
Patents |
| 118/723FE |
Focused electron beam gas energizing means |
55 |
| 118/723FI |
Focusing means for ion beam coating material or focused ion beam gas energizing means (i.e., excluding ion plating or ion implanting) |
101 |
| 118/723E |
Having glow discharge electrodes (e.g., dc, ac, rf, etc.) |
1,227 |
| 118/723HC |
Hot cathode means for thermionic emission of electrons (e.g., tungsten filament, etc.) |
74 |
| 118/723MW |
Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) |
431 |
| 118/723MP |
Multiple gas energizing means associated with one deposition site (i.e., excluding substrate heater as an energizing means) |
252 |
| 118/723I |
Radio frequency antenna or radio frequency inductive coil discharge means |
666 |
| 118/723VE |
Vacuum evaporation means within deposition chamber (e.g., activated reactive evaporation, etc.) |
282 |
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618687 |
Method for coating substrates |
Nov. 17, 2009 |
| 7611585 |
Plasma reaction chamber with a built-in magnetic core |
Nov. 3, 2009 |
| 7608151 |
Method and system for coating sections of internal surfaces |
Oct. 27, 2009 |
| 7603962 |
Rotary type CVD film forming apparatus for mass production |
Oct. 20, 2009 |
| 7604716 |
Methods and apparatus for generating high-density plasma |
Oct. 20, 2009 |
| 7582367 |
Ceramic member and manufacturing method for the same |
Sep. 1, 2009 |
| 7578258 |
Methods and apparatus for selective pre-coating of a plasma processing chamber |
Aug. 25, 2009 |
| 7579067 |
Process chamber component with layered coating and method |
Aug. 25, 2009 |
| 7575638 |
Apparatus for defining regions of process exclusion and process performance in a process chamber |
Aug. 18, 2009 |
| 7571698 |
Low-frequency bias power in HDP-CVD processes |
Aug. 11, 2009 |
| 7569995 |
Apparatus for magnetic and electrostatic confinement of plasma |
Aug. 4, 2009 |
| 7566368 |
Method and apparatus for an improved upper electrode plate in a plasma processing system |
Jul. 28, 2009 |
| 7566379 |
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
Jul. 28, 2009 |
| 7554103 |
Increased tool utilization/reduction in MWBC for UV curing chamber |
Jun. 30, 2009 |
| 7543547 |
Electrode assembly for plasma processing apparatus |
Jun. 9, 2009 |
| 7544270 |
Apparatus for processing a substrate |
Jun. 9, 2009 |
| 7544959 |
In situ surface contamination removal for ion implanting |
Jun. 9, 2009 |
| 7537671 |
Self-calibrating optical emission spectroscopy for plasma monitoring |
May. 26, 2009 |
| 7534628 |
Method for forming semiconductor device and method for forming photovoltaic device |
May. 19, 2009 |
| 7534301 |
RF grounding of cathode in process chamber |
May. 19, 2009 |
| 7531816 |
Vacuum conveying apparatus and charged particle beam equipment with the same |
May. 12, 2009 |
| 7527658 |
Method of manufacturing displays and apparatus for manufacturing displays |
May. 5, 2009 |
| 7520957 |
Lid assembly for front end of line fabrication |
Apr. 21, 2009 |
| 7517437 |
RF powered target for increasing deposition uniformity in sputtering systems |
Apr. 14, 2009 |
| 7513953 |
Continuous system for depositing films onto plastic bottles and method |
Apr. 7, 2009 |
| 7514377 |
Plasma generator, ozone generator, substrate processing apparatus and manufacturing method of semiconductor device |
Apr. 7, 2009 |
| 7494941 |
Manufacturing method of semiconductor device, and substrate processing apparatus |
Feb. 24, 2009 |
| 7484473 |
Suspended gas distribution manifold for plasma chamber |
Feb. 3, 2009 |
| 7470627 |
Wafer area pressure control for plasma confinement |
Dec. 30, 2008 |
| 7468494 |
Reaction enhancing gas feed for injecting gas into a plasma chamber |
Dec. 23, 2008 |
| 7464663 |
Roll-vortex plasma chemical vapor deposition system |
Dec. 16, 2008 |
| 7458335 |
Uniform magnetically enhanced reactive ion etching using nested electromagnetic coils |
Dec. 2, 2008 |
| 7459187 |
Surface-treatment method and equipment |
Dec. 2, 2008 |
| 7444955 |
Apparatus for directing plasma flow to coat internal passageways |
Nov. 4, 2008 |
| 7438765 |
Adjustable shielding plate for adjusting an etching area of a semiconductor wafer and related apparatus and methods |
Oct. 21, 2008 |
| 7438018 |
Confinement ring assembly of plasma processing apparatus |
Oct. 21, 2008 |
| 7439678 |
Magnetic and electrostatic confinement of plasma with tuning of electrostatic field |
Oct. 21, 2008 |
| 7431797 |
Plasma reactor with a dynamically adjustable plasma source power applicator |
Oct. 7, 2008 |
| 7431767 |
Apparatus and method for growth of a thin film |
Oct. 7, 2008 |
| 7429306 |
Plasma processing system |
Sep. 30, 2008 |
| 7421974 |
Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus |
Sep. 9, 2008 |
| 7422656 |
Dry etching method and apparatus for use in the LCD device |
Sep. 9, 2008 |
| 7419551 |
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another |
Sep. 2, 2008 |
| 7419566 |
Plasma reactor |
Sep. 2, 2008 |
| 7416633 |
Plasma processing apparatus |
Aug. 26, 2008 |
| 7405521 |
Multiple frequency plasma processor method and apparatus |
Jul. 29, 2008 |
| 7392759 |
Remote plasma apparatus for processing substrate with two types of gases |
Jul. 1, 2008 |
| 7387081 |
Plasma reactor including helical electrodes |
Jun. 17, 2008 |
| 7382098 |
Plasma producing apparatus and doping apparatus |
Jun. 3, 2008 |
| 7374620 |
Substrate processing apparatus |
May. 20, 2008 |
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