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Class Information
Number: 118/723MR
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > Producing energized gas remotely located from substrate > With magnet (e.g., electron cyclotron resonance, etc.)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5132105 |
Materials with diamond-like properties and method and means for manufacturing them |
Jul. 21, 1992 |
| 5125358 |
Microwave plasma film deposition system |
Jun. 30, 1992 |
| 5111111 |
Method and apparatus for coupling a microwave source in an electron cyclotron resonance system |
May. 5, 1992 |
| 5099790 |
Microwave plasma chemical vapor deposition apparatus |
Mar. 31, 1992 |
| 5087857 |
Plasma generating apparatus and method using modulation system |
Feb. 11, 1992 |
| 5082542 |
Distributed-array magnetron-plasma processing module and method |
Jan. 21, 1992 |
| 5079481 |
Plasma-assisted processing magneton with magnetic field adjustment |
Jan. 7, 1992 |
| 5069928 |
Microwave chemical vapor deposition apparatus and feedback control method |
Dec. 3, 1991 |
| 5045166 |
Magnetron method and apparatus for producing high density ionic gas discharge |
Sep. 3, 1991 |
| 5038713 |
Microwave plasma treating apparatus |
Aug. 13, 1991 |
| 5019117 |
Plasma apparatus |
May. 28, 1991 |
| 5016564 |
Plasma apparatus |
May. 21, 1991 |
| 4993361 |
Chemical vapor deposition |
Feb. 19, 1991 |
| 4986214 |
Thin film forming apparatus |
Jan. 22, 1991 |
| 4982138 |
Semiconductor wafer treating device utilizing a plasma |
Jan. 1, 1991 |
| 4970435 |
Plasma processing apparatus |
Nov. 13, 1990 |
| 4960073 |
Microwave plasma treatment apparatus |
Oct. 2, 1990 |
| 4960071 |
Thin film forming apparatus |
Oct. 2, 1990 |
| 4957061 |
Plurality of beam producing means disposed in different longitudinal and lateral directions from each other with respect to a substrate |
Sep. 18, 1990 |
| 4947085 |
Plasma processor |
Aug. 7, 1990 |
| 4925542 |
Plasma plating apparatus and method |
May. 15, 1990 |
| 4919783 |
Apparatus for processing an object by gas plasma with a reduced damage |
Apr. 24, 1990 |
| 4915979 |
Semiconductor wafer treating device utilizing ECR plasma |
Apr. 10, 1990 |
| 4911812 |
Plasma treating method and apparatus therefor |
Mar. 27, 1990 |
| 4908492 |
Microwave plasma production apparatus |
Mar. 13, 1990 |
| 4902934 |
Plasma apparatus |
Feb. 20, 1990 |
| 4897284 |
Process for forming a deposited film on each of a plurality of substrates by way of microwave plasma chemical vapor deposition method |
Jan. 30, 1990 |
| 4891118 |
Plasma processing apparatus |
Jan. 2, 1990 |
| 4883686 |
Method for the high rate plasma deposition of high quality material |
Nov. 28, 1989 |
| 4876983 |
Plasma operation apparatus |
Oct. 31, 1989 |
| 4842707 |
Dry process apparatus |
Jun. 27, 1989 |
| 4831963 |
Plasma processing apparatus |
May. 23, 1989 |
| 4825808 |
Substrate processing apparatus |
May. 2, 1989 |
| 4727293 |
Plasma generating apparatus using magnets and method |
Feb. 23, 1988 |
| 4691662 |
Dual plasma microwave apparatus and method for treating a surface |
Sep. 8, 1987 |
| 4624214 |
Dry-processing apparatus |
Nov. 25, 1986 |
| 4611121 |
Magnet apparatus |
Sep. 9, 1986 |
| 4585541 |
Plasma anodization system |
Apr. 29, 1986 |
| 4543465 |
Microwave plasma source having improved switching operation from plasma ignition phase to normal ion extraction phase |
Sep. 24, 1985 |
| 4532199 |
Method of forming amorphous silicon film |
Jul. 30, 1985 |
| 4438368 |
Plasma treating apparatus |
Mar. 20, 1984 |
| 4430138 |
Microwave plasma etching apparatus having fan-shaped discharge |
Feb. 7, 1984 |
| 4401054 |
Plasma deposition apparatus |
Aug. 30, 1983 |
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