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Class Information
Number: 118/723MR
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > Producing energized gas remotely located from substrate > With magnet (e.g., electron cyclotron resonance, etc.)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5674321 |
Method and apparatus for producing plasma uniformity in a magnetic field-enhanced plasma reactor |
Oct. 7, 1997 |
| 5645645 |
Method and apparatus for plasma treatment of a surface |
Jul. 8, 1997 |
| 5646489 |
Plasma generator with mode restricting means |
Jul. 8, 1997 |
| 5626679 |
Method and apparatus for preparing a silicon oxide film |
May. 6, 1997 |
| 5620522 |
Microwave plasma generator |
Apr. 15, 1997 |
| 5611864 |
Microwave plasma processing apparatus and processing method using the same |
Mar. 18, 1997 |
| 5611863 |
Semiconductor processing apparatus and cleaning method thereof |
Mar. 18, 1997 |
| 5587039 |
Plasma etch equipment |
Dec. 24, 1996 |
| 5580387 |
Corrugated waveguide for a microwave plasma applicator |
Dec. 3, 1996 |
| 5567243 |
Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor |
Oct. 22, 1996 |
| 5565248 |
Method and apparatus for coating hollow containers through plasma-assisted deposition of an inorganic substance |
Oct. 15, 1996 |
| 5558736 |
Electron cyclotron resonance apparatus |
Sep. 24, 1996 |
| 5554249 |
Magnetron plasma processing system |
Sep. 10, 1996 |
| 5545257 |
Magnetic filter apparatus and method for generating cold plasma in semicoductor processing |
Aug. 13, 1996 |
| 5522934 |
Plasma processing apparatus using vertical gas inlets one on top of another |
Jun. 4, 1996 |
| 5520741 |
Apparatus for producing a plasma polymer protective layer on workpieces, in particular headlamp reflectors |
May. 28, 1996 |
| 5503676 |
Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber |
Apr. 2, 1996 |
| 5501740 |
Microwave plasma reactor |
Mar. 26, 1996 |
| 5496410 |
Plasma processing apparatus and method of processing substrates by using same apparatus |
Mar. 5, 1996 |
| 5489362 |
Method for generating excited neutral particles for etching and deposition processes in semiconductor technology with a plasma discharge fed by microwave energy |
Feb. 6, 1996 |
| 5487785 |
Plasma treatment apparatus |
Jan. 30, 1996 |
| 5466295 |
ECR plasma generation apparatus and methods |
Nov. 14, 1995 |
| 5453305 |
Plasma reactor for processing substrates |
Sep. 26, 1995 |
| 5453125 |
ECR plasma source for gas abatement |
Sep. 26, 1995 |
| 5451259 |
ECR plasma source for remote processing |
Sep. 19, 1995 |
| 5449411 |
Microwave plasma processing apparatus |
Sep. 12, 1995 |
| 5433788 |
Apparatus for plasma treatment using electron cyclotron resonance |
Jul. 18, 1995 |
| 5433789 |
Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves |
Jul. 18, 1995 |
| 5433813 |
Semiconductor device manufacturing apparatus |
Jul. 18, 1995 |
| 5399253 |
Plasma generating device |
Mar. 21, 1995 |
| 5389154 |
Plasma processing apparatus |
Feb. 14, 1995 |
| 5389197 |
Method of and apparatus for plasma processing of wafer |
Feb. 14, 1995 |
| 5378284 |
Apparatus for coating substrates using a microwave ECR plasma source |
Jan. 3, 1995 |
| 5366555 |
Chemical vapor deposition under a single reactor vessel divided into separate reaction regions with its own depositing and exhausting means |
Nov. 22, 1994 |
| 5366586 |
Plasma formation using electron cyclotron resonance and method for processing substrate by using the same |
Nov. 22, 1994 |
| 5354382 |
Electron cyclotron resonance apparatus comprising wafer cooling pedestal |
Oct. 11, 1994 |
| 5326404 |
Plasma processing apparatus |
Jul. 5, 1994 |
| 5318654 |
Apparatus for cleaning a substrate with metastable helium |
Jun. 7, 1994 |
| 5312509 |
Manufacturing system for low temperature chemical vapor deposition of high purity metals |
May. 17, 1994 |
| 5306985 |
ECR apparatus with magnetic coil for plasma refractive index control |
Apr. 26, 1994 |
| 5302266 |
Method and apparatus for filing high aspect patterns with metal |
Apr. 12, 1994 |
| 5292395 |
ECR plasma reaction apparatus having uniform magnetic field gradient |
Mar. 8, 1994 |
| 5292370 |
Coupled microwave ECR and radio-frequency plasma source for plasma processing |
Mar. 8, 1994 |
| 5279669 |
Plasma reactor for processing substrates comprising means for inducing electron cyclotron resonance (ECR) and ion cyclotron resonance (ICR) conditions |
Jan. 18, 1994 |
| 5254171 |
Bias ECR plasma CVD apparatus comprising susceptor, clamp, and chamber wall heating and cooling means |
Oct. 19, 1993 |
| 5181986 |
Plasma processing apparatus |
Jan. 26, 1993 |
| 5180436 |
Microwave plasma film deposition system |
Jan. 19, 1993 |
| 5160397 |
Plasma process apparatus and plasma processing method |
Nov. 3, 1992 |
| 5133826 |
Electron cyclotron resonance plasma source |
Jul. 28, 1992 |
| 5133825 |
Plasma generating apparatus |
Jul. 28, 1992 |
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