| |
 |
|
Class Information
Number: 118/723MR
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > Producing energized gas remotely located from substrate > With magnet (e.g., electron cyclotron resonance, etc.)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6332425 |
Surface treatment method and system |
Dec. 25, 2001 |
| 6333601 |
Planar gas introducing unit of a CCP reactor |
Dec. 25, 2001 |
| 6290806 |
Plasma reactor |
Sep. 18, 2001 |
| 6273022 |
Distributed inductively-coupled plasma source |
Aug. 14, 2001 |
| 6263830 |
Microwave choke for remote plasma generator |
Jul. 24, 2001 |
| 6196155 |
Plasma processing apparatus and method of cleaning the apparatus |
Mar. 6, 2001 |
| 6194836 |
Magnetic system, particularly for ECR sources, for producing closed surfaces of equimodule B of form dimensions |
Feb. 27, 2001 |
| 6194628 |
Method and apparatus for cleaning a vacuum line in a CVD system |
Feb. 27, 2001 |
| 6189484 |
Plasma reactor having a helicon wave high density plasma source |
Feb. 20, 2001 |
| 6184624 |
Ion source |
Feb. 6, 2001 |
| 6171438 |
Plasma processing apparatus and plasma processing method |
Jan. 9, 2001 |
| 6172321 |
Method and apparatus for plasma processing apparatus |
Jan. 9, 2001 |
| 6161498 |
Plasma processing device and a method of plasma process |
Dec. 19, 2000 |
| 6156154 |
Apparatus for etching discs and pallets prior to sputter deposition |
Dec. 5, 2000 |
| 6155200 |
ECR plasma generator and an ECR system using the generator |
Dec. 5, 2000 |
| 6136387 |
Ion flow forming method and apparatus |
Oct. 24, 2000 |
| 6113701 |
Semiconductor device, manufacturing method, and system |
Sep. 5, 2000 |
| 6096389 |
Method and apparatus for forming a deposited film using a microwave CVD process |
Aug. 1, 2000 |
| 6096160 |
Helicon wave plasma processing apparatus |
Aug. 1, 2000 |
| 6086679 |
Deposition systems and processes for transport polymerization and chemical vapor deposition |
Jul. 11, 2000 |
| 6087614 |
Plasma treating device |
Jul. 11, 2000 |
| 6076484 |
Apparatus and method for microwave plasma process |
Jun. 20, 2000 |
| 6054016 |
Magnetically enhanced microwave plasma generating apparatus |
Apr. 25, 2000 |
| 6029602 |
Apparatus and method for efficient and compact remote microwave plasma generation |
Feb. 29, 2000 |
| 5983829 |
Microwave plasma etching apparatus |
Nov. 16, 1999 |
| 5985091 |
Microwave plasma processing apparatus and microwave plasma processing method |
Nov. 16, 1999 |
| 5976259 |
Semiconductor device, manufacturing method, and system |
Nov. 2, 1999 |
| 5961773 |
Plasma processing apparatus and plasma processing method using the same |
Oct. 5, 1999 |
| 5961850 |
Plasma processing method and apparatus |
Oct. 5, 1999 |
| 5958141 |
Dry etching device |
Sep. 28, 1999 |
| 5948485 |
Plasma deposition method and an apparatus therefor |
Sep. 7, 1999 |
| 5935335 |
Film-forming apparatus and film-forming method |
Aug. 10, 1999 |
| 5904799 |
Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks |
May. 18, 1999 |
| 5895551 |
Plasma etching apparatus |
Apr. 20, 1999 |
| 5874012 |
Plasma processing apparatus and plasma processing method |
Feb. 23, 1999 |
| 5865897 |
Method of producing film of nitrogen-doped II-VI group compound semiconductor |
Feb. 2, 1999 |
| 5858162 |
Plasma processing apparatus |
Jan. 12, 1999 |
| 5843236 |
Plasma processing apparatus for radiating microwave from rectangular waveguide through long slot to plasma chamber |
Dec. 1, 1998 |
| 5824602 |
Helicon wave excitation to produce energetic electrons for manufacturing semiconductors |
Oct. 20, 1998 |
| 5824607 |
Plasma confinement for an inductively coupled plasma reactor |
Oct. 20, 1998 |
| 5803975 |
Microwave plasma processing apparatus and method therefor |
Sep. 8, 1998 |
| 5800620 |
Plasma treatment apparatus |
Sep. 1, 1998 |
| 5772772 |
Plasma diffusion control apparatus |
Jun. 30, 1998 |
| 5762814 |
Plasma processing method and apparatus using plasma produced by microwaves |
Jun. 9, 1998 |
| 5753320 |
Process for forming deposited film |
May. 19, 1998 |
| 5733405 |
Plasma processing apparatus |
Mar. 31, 1998 |
| 5725674 |
Device and method for epitaxially growing gallium nitride layers |
Mar. 10, 1998 |
| 5717294 |
Plasma process apparatus |
Feb. 10, 1998 |
| 5714010 |
Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same |
Feb. 3, 1998 |
| 5707452 |
Coaxial microwave applicator for an electron cyclotron resonance plasma source |
Jan. 13, 1998 |
|
|
|
