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Class Information
Number: 118/723MR
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > Producing energized gas remotely located from substrate > With magnet (e.g., electron cyclotron resonance, etc.)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7444955 |
Apparatus for directing plasma flow to coat internal passageways |
Nov. 4, 2008 |
| 7442946 |
Nonuniform ion implantation apparatus and method using a wide beam |
Oct. 28, 2008 |
| 7430985 |
Plasma processing equipment |
Oct. 7, 2008 |
| 7419567 |
Plasma processing apparatus and method |
Sep. 2, 2008 |
| 7338575 |
Hydrocarbon dielectric heat transfer fluids for microwave plasma generators |
Mar. 4, 2008 |
| 7327089 |
Beam plasma source |
Feb. 5, 2008 |
| 7316199 |
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber |
Jan. 8, 2008 |
| 7311796 |
Plasma processing apparatus |
Dec. 25, 2007 |
| 7156046 |
Plasma CVD apparatus |
Jan. 2, 2007 |
| 7067034 |
Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma |
Jun. 27, 2006 |
| 6972524 |
Plasma processing system control |
Dec. 6, 2005 |
| 6939434 |
Externally excited torroidal plasma source with magnetic control of ion distribution |
Sep. 6, 2005 |
| 6916400 |
Device for the plasma treatment of gases |
Jul. 12, 2005 |
| 6866747 |
Plasma processing apparatus |
Mar. 15, 2005 |
| 6858120 |
Method and apparatus for the fabrication of ferroelectric films |
Feb. 22, 2005 |
| 6851939 |
System for chemical vapor deposition at ambient temperature using electron cyclotron resonance and method for depositing metal composite film using the same |
Feb. 8, 2005 |
| 6849857 |
Beam processing apparatus |
Feb. 1, 2005 |
| 6805770 |
Technique for improving uniformity of magnetic fields that rotate or oscillate about an axis |
Oct. 19, 2004 |
| 6771026 |
Plasma generation by mode-conversion of RF-electromagnetic wave to electron cyclotron wave |
Aug. 3, 2004 |
| 6764575 |
Magnetron plasma processing apparatus |
Jul. 20, 2004 |
| 6733617 |
Direct detection of dielectric etch system magnet driver and coil malfunctions |
May. 11, 2004 |
| 6706141 |
Device to generate excited/ionized particles in a plasma |
Mar. 16, 2004 |
| 6689930 |
Method and apparatus for cleaning an exhaust line in a semiconductor processing system |
Feb. 10, 2004 |
| 6680420 |
Apparatus for cleaning an exhaust line in a semiconductor processing system |
Jan. 20, 2004 |
| 6673199 |
Shaping a plasma with a magnetic field to control etch rate uniformity |
Jan. 6, 2004 |
| 6660342 |
Pulsed electromagnetic energy method for forming a film |
Dec. 9, 2003 |
| 6620290 |
Plasma process apparatus |
Sep. 16, 2003 |
| 6617152 |
Method for creating a cell growth surface on a polymeric substrate |
Sep. 9, 2003 |
| 6571729 |
Apparatus for depositing a thin film on a data recording disk |
Jun. 3, 2003 |
| 6568346 |
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply |
May. 27, 2003 |
| 6562079 |
Microwave discharge apparatus |
May. 13, 2003 |
| 6561198 |
Method and installation for treating a metal part surface |
May. 13, 2003 |
| 6503364 |
Plasma processing apparatus |
Jan. 7, 2003 |
| 6475333 |
Discharge plasma processing device |
Nov. 5, 2002 |
| 6454912 |
Method and apparatus for the fabrication of ferroelectric films |
Sep. 24, 2002 |
| 6439155 |
Remote plasma generator with sliding short tuner |
Aug. 27, 2002 |
| 6435131 |
Ion flow forming method and apparatus |
Aug. 20, 2002 |
| 6436230 |
Process device |
Aug. 20, 2002 |
| 6432819 |
Method and apparatus of forming a sputtered doped seed layer |
Aug. 13, 2002 |
| 6431114 |
Method and apparatus for plasma processing |
Aug. 13, 2002 |
| 6419752 |
Structuring device for processing a substrate |
Jul. 16, 2002 |
| 6401653 |
Microwave plasma generator |
Jun. 11, 2002 |
| 6390018 |
Microwave plasma treatment apparatus |
May. 21, 2002 |
| 6375860 |
Controlled potential plasma source |
Apr. 23, 2002 |
| 6351075 |
Plasma processing apparatus having rotating magnets |
Feb. 26, 2002 |
| 6347602 |
Plasma processing apparatus |
Feb. 19, 2002 |
| 6341574 |
Plasma processing systems |
Jan. 29, 2002 |
| 6333601 |
Planar gas introducing unit of a CCP reactor |
Dec. 25, 2001 |
| 6332425 |
Surface treatment method and system |
Dec. 25, 2001 |
| 6290806 |
Plasma reactor |
Sep. 18, 2001 |
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