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Class Information
Number:
118/723MP
Name:
Coating apparatus
>
Gas or vapor deposition
>
With treating means (e.g., jarring)
>
By creating electric field (e.g., gas activation, plasma, etc.)
> Multiple gas energizing means associated with one deposition site (i.e., excluding substrate heater as an energizing means)
Description:
Patents under this class:
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Patent Number
Title Of Patent
Date Issued
4426237
Volatile metal oxide suppression in molecular beam epitaxy systems
Jan. 17, 1984
4262631
Thin film deposition apparatus using an RF glow discharge
Apr. 21, 1981
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