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Class Information
Number: 118/723MP
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Multiple gas energizing means associated with one deposition site (i.e., excluding substrate heater as an energizing means)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5324362 |
Apparatus for treating substrates in a microwave-generated gas-supported plasma |
Jun. 28, 1994 |
| 5310452 |
Plasma process apparatus and plasma processing method |
May. 10, 1994 |
| 5292370 |
Coupled microwave ECR and radio-frequency plasma source for plasma processing |
Mar. 8, 1994 |
| 5288684 |
Photochemical vapor phase reaction apparatus and method of causing a photochemical vapor phase reaction |
Feb. 22, 1994 |
| 5286297 |
Multi-electrode plasma processing apparatus |
Feb. 15, 1994 |
| 5196102 |
Method and apparatus for applying a compound of a metal and a gas onto a surface |
Mar. 23, 1993 |
| 5183511 |
Photo CVD apparatus with a glow discharge system |
Feb. 2, 1993 |
| 5154135 |
Apparatus for forming a deposited film |
Oct. 13, 1992 |
| 5149375 |
Apparatus for forming a deposited film of large area with the use of a plurality of activated gases separately formed |
Sep. 22, 1992 |
| 5147520 |
Apparatus and method for controlling processing uniformity in a magnetron |
Sep. 15, 1992 |
| 5145711 |
Cyclotron resonance chemical vapor deposition method of forming a halogen-containing diamond on a substrate |
Sep. 8, 1992 |
| 5138973 |
Wafer processing apparatus having independently controllable energy sources |
Aug. 18, 1992 |
| 5129359 |
Microwave plasma CVD apparatus for the formation of functional deposited film with discharge space provided with gas feed device capable of applying bias voltage between the gas feed device an |
Jul. 14, 1992 |
| 5110619 |
Method for production of films |
May. 5, 1992 |
| 5082542 |
Distributed-array magnetron-plasma processing module and method |
Jan. 21, 1992 |
| 5079481 |
Plasma-assisted processing magneton with magnetic field adjustment |
Jan. 7, 1992 |
| 5058527 |
Thin film forming apparatus |
Oct. 22, 1991 |
| 5030476 |
Process and apparatus for the formation of a functional deposited film on a cylindrical substrate by means of microwave plasma chemical vapor deposition |
Jul. 9, 1991 |
| 5016565 |
Microwave plasma chemical vapor deposition apparatus for forming functional deposited film with means for stabilizing plasma discharge |
May. 21, 1991 |
| 4993361 |
Chemical vapor deposition |
Feb. 19, 1991 |
| 4991541 |
Device and process for treating fine particles |
Feb. 12, 1991 |
| 4989544 |
Apparatus for forming functional deposited films by way of hybrid excitation |
Feb. 5, 1991 |
| 4987004 |
Plasma processing method and apparatus |
Jan. 22, 1991 |
| 4986214 |
Thin film forming apparatus |
Jan. 22, 1991 |
| 4974544 |
Vapor deposition apparatus |
Dec. 4, 1990 |
| 4971667 |
Plasma processing method and apparatus |
Nov. 20, 1990 |
| 4971832 |
HR-CVD process for the formation of a functional deposited film on a substrate with application of a voltage in the range of -5 to -100 V |
Nov. 20, 1990 |
| 4960071 |
Thin film forming apparatus |
Oct. 2, 1990 |
| 4950956 |
Plasma processing apparatus |
Aug. 21, 1990 |
| 4948750 |
Method and apparatus for producing semiconductor layers composed of amorphous silicon-germanium alloys through glow discharge technique, particularly for solar cells |
Aug. 14, 1990 |
| 4926791 |
Microwave plasma apparatus employing helmholtz coils and ioffe bars |
May. 22, 1990 |
| 4919077 |
Semiconductor producing apparatus |
Apr. 24, 1990 |
| 4913929 |
Thermal/microwave remote plasma multiprocessing reactor and method of use |
Apr. 3, 1990 |
| 4832981 |
Method and apparatus for forming non-single crystal layer |
May. 23, 1989 |
| 4811684 |
Photo CVD apparatus, with deposition prevention in light source chamber |
Mar. 14, 1989 |
| 4799454 |
Apparatus for forming a thin film |
Jan. 24, 1989 |
| 4798167 |
Apparatus for preparing a photoelectromotive force member having a concentric triplicate conduit for generating active species and precursor |
Jan. 17, 1989 |
| 4729341 |
Method and apparatus for making electrophotographic devices |
Mar. 8, 1988 |
| 4716852 |
Apparatus for thin film formation using photo-induced chemical reaction |
Jan. 5, 1988 |
| 4691662 |
Dual plasma microwave apparatus and method for treating a surface |
Sep. 8, 1987 |
| 4689093 |
Process for the preparation of photoelectromotive force member |
Aug. 25, 1987 |
| 4664938 |
Method for deposition of silicon |
May. 12, 1987 |
| 4615298 |
Method of making non-crystalline semiconductor layer |
Oct. 7, 1986 |
| 4582720 |
Method and apparatus for forming non-single-crystal layer |
Apr. 15, 1986 |
| 4539068 |
Vapor phase growth method |
Sep. 3, 1985 |
| 4522674 |
Surface treatment apparatus |
Jun. 11, 1985 |
| 4513684 |
Upstream cathode assembly |
Apr. 30, 1985 |
| 4479455 |
Process gas introduction and channeling system to produce a profiled semiconductor layer |
Oct. 30, 1984 |
| 4461783 |
Non-single-crystalline semiconductor layer on a substrate and method of making same |
Jul. 24, 1984 |
| 4440108 |
Ion beam coating apparatus |
Apr. 3, 1984 |
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