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Class Information
Number: 118/723MP
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Multiple gas energizing means associated with one deposition site (i.e., excluding substrate heater as an energizing means)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5580386 |
Coating a substrate surface with a permeation barrier |
Dec. 3, 1996 |
| 5580385 |
Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber |
Dec. 3, 1996 |
| 5578129 |
Gas supplying head and load lock chamber of semiconductor processing system |
Nov. 26, 1996 |
| 5573595 |
Methods and apparatus for generating plasma |
Nov. 12, 1996 |
| 5573597 |
Plasma processing system with reduced particle contamination |
Nov. 12, 1996 |
| 5571332 |
Electron jet vapor deposition system |
Nov. 5, 1996 |
| 5567243 |
Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor |
Oct. 22, 1996 |
| 5565036 |
Apparatus and method for igniting plasma in a process module |
Oct. 15, 1996 |
| 5560779 |
Apparatus for synthesizing diamond films utilizing an arc plasma |
Oct. 1, 1996 |
| 5558719 |
Plasma processing apparatus |
Sep. 24, 1996 |
| 5556475 |
Microwave plasma reactor |
Sep. 17, 1996 |
| 5545258 |
Microwave plasma processing system |
Aug. 13, 1996 |
| 5540781 |
Plasma CVD process using a very-high-frequency and plasma CVD apparatus |
Jul. 30, 1996 |
| 5534070 |
Plasma CVD process using a very-high-frequency and plasma CVD apparatus |
Jul. 9, 1996 |
| 5531834 |
Plasma film forming method and apparatus and plasma processing apparatus |
Jul. 2, 1996 |
| 5529632 |
Microwave plasma processing system |
Jun. 25, 1996 |
| 5527394 |
Apparatus for plasma enhanced processing of substrates |
Jun. 18, 1996 |
| 5527417 |
Photo-assisted CVD apparatus |
Jun. 18, 1996 |
| 5527396 |
Deposited film forming apparatus |
Jun. 18, 1996 |
| 5525158 |
Thin film deposition apparatus |
Jun. 11, 1996 |
| 5522935 |
Plasma CVD apparatus for manufacturing a semiconductor device |
Jun. 4, 1996 |
| 5522343 |
Thin film formation apparatus |
Jun. 4, 1996 |
| 5518572 |
Plasma processing system and method |
May. 21, 1996 |
| 5513765 |
Plasma generating apparatus and method |
May. 7, 1996 |
| 5512102 |
Microwave enhanced CVD system under magnetic field |
Apr. 30, 1996 |
| 5501740 |
Microwave plasma reactor |
Mar. 26, 1996 |
| 5498291 |
Arrangement for coating or etching substrates |
Mar. 12, 1996 |
| 5487785 |
Plasma treatment apparatus |
Jan. 30, 1996 |
| 5472507 |
IC wiring connecting method and apparatus |
Dec. 5, 1995 |
| 5468296 |
Apparatus for igniting low pressure inductively coupled plasma |
Nov. 21, 1995 |
| 5466296 |
Thin film deposition apparatus, mainly dedicated to PECVD and sputtering techniques and respective processes |
Nov. 14, 1995 |
| 5464476 |
Plasma processing device comprising plural RF inductive coils |
Nov. 7, 1995 |
| 5449412 |
Apparatus and method for controlling plasma size and position in plasma-activated chemical vapor deposition processes |
Sep. 12, 1995 |
| 5449432 |
Method of treating a workpiece with a plasma and processing reactor having plasma igniter and inductive coupler for semiconductor fabrication |
Sep. 12, 1995 |
| 5449411 |
Microwave plasma processing apparatus |
Sep. 12, 1995 |
| 5441569 |
Apparatus and method for laser deposition of durable coatings |
Aug. 15, 1995 |
| 5439715 |
Process and apparatus for microwave plasma chemical vapor deposition |
Aug. 8, 1995 |
| 5433790 |
Deposit film forming apparatus with microwave CVD method |
Jul. 18, 1995 |
| 5433787 |
Apparatus for forming deposited film including light transmissive diffusion plate |
Jul. 18, 1995 |
| 5429070 |
High density plasma deposition and etching apparatus |
Jul. 4, 1995 |
| 5425811 |
Apparatus for manufacturing a nitrogen containing compound thin film |
Jun. 20, 1995 |
| 5411591 |
Apparatus for the simultaneous microwave deposition of thin films in multiple discrete zones |
May. 2, 1995 |
| 5389153 |
Plasma processing system using surface wave plasma generating apparatus and method |
Feb. 14, 1995 |
| 5378284 |
Apparatus for coating substrates using a microwave ECR plasma source |
Jan. 3, 1995 |
| 5374314 |
Methods and apparatus for externally treating a container with application of internal bias gas |
Dec. 20, 1994 |
| 5356672 |
Method for microwave plasma assisted supersonic gas jet deposition of thin films |
Oct. 18, 1994 |
| 5356673 |
Evaporation system and method for gas jet deposition of thin film materials |
Oct. 18, 1994 |
| 5350454 |
Plasma processing apparatus for controlling plasma constituents using neutral and plasma sound waves |
Sep. 27, 1994 |
| 5348587 |
Apparatus for elimination of low temperature ammonia salts in TiCl.sub.4 NH.sub.3 CVD reaction |
Sep. 20, 1994 |
| 5342448 |
Apparatus for processing a sample using a charged beam and reactive gases |
Aug. 30, 1994 |
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