| |
 |
|
Class Information
Number: 118/723MP
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Multiple gas energizing means associated with one deposition site (i.e., excluding substrate heater as an energizing means)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5975012 |
Deposition apparatus |
Nov. 2, 1999 |
| 5968276 |
Heat exchange passage connection |
Oct. 19, 1999 |
| 5968274 |
Continuous forming method for functional deposited films and deposition apparatus |
Oct. 19, 1999 |
| 5961726 |
Deposited film forming apparatus and electrode for use in it |
Oct. 5, 1999 |
| 5961773 |
Plasma processing apparatus and plasma processing method using the same |
Oct. 5, 1999 |
| 5948485 |
Plasma deposition method and an apparatus therefor |
Sep. 7, 1999 |
| 5942039 |
Self-cleaning focus ring |
Aug. 24, 1999 |
| 5935455 |
Method and an electrode system for excitation of a plasma |
Aug. 10, 1999 |
| 5935391 |
Method of manufacturing a tube having a film on its inner peripheral surface and apparatus for manufacturing the same |
Aug. 10, 1999 |
| 5916455 |
Method and apparatus for generating a low pressure plasma |
Jun. 29, 1999 |
| 5914000 |
Apparatus for manufacturing semiconductor device and method of removing silicon oxidation film |
Jun. 22, 1999 |
| 5907221 |
Inductively coupled plasma reactor with an inductive coil antenna having independent loops |
May. 25, 1999 |
| 5879575 |
Self-cleaning plasma processing reactor |
Mar. 9, 1999 |
| 5858162 |
Plasma processing apparatus |
Jan. 12, 1999 |
| 5851600 |
Plasma process method and apparatus |
Dec. 22, 1998 |
| 5804923 |
Plasma processing apparatus having a protected microwave transmission window |
Sep. 8, 1998 |
| 5803974 |
Chemical vapor deposition apparatus |
Sep. 8, 1998 |
| 5779802 |
Thin film deposition chamber with ECR-plasma source |
Jul. 14, 1998 |
| 5753320 |
Process for forming deposited film |
May. 19, 1998 |
| 5750207 |
System and method for depositing coating of modulated composition |
May. 12, 1998 |
| 5749966 |
Process for depositing diamond and refractory materials |
May. 12, 1998 |
| 5741364 |
Thin film formation apparatus |
Apr. 21, 1998 |
| 5728222 |
Apparatus for chemical vapor deposition of aluminum oxide |
Mar. 17, 1998 |
| 5716500 |
Method and an apparatus for generation of a discharge in own vapors of a radio frequency electrode for sustained self-sputtering and evaporation of the electrode |
Feb. 10, 1998 |
| 5704983 |
Methods and apparatus for depositing barrier coatings |
Jan. 6, 1998 |
| 5702530 |
Distributed microwave plasma reactor for semiconductor processing |
Dec. 30, 1997 |
| 5698036 |
Plasma processing apparatus |
Dec. 16, 1997 |
| 5690745 |
Apparatus for plasma treatment of the inside surface of a fuel tank |
Nov. 25, 1997 |
| 5690050 |
Plasma treating apparatus and plasma treating method |
Nov. 25, 1997 |
| 5658389 |
Thin film forming method and apparatus |
Aug. 19, 1997 |
| 5654043 |
Pulsed plate plasma implantation system and method |
Aug. 5, 1997 |
| 5653811 |
System for the plasma treatment of large area substrates |
Aug. 5, 1997 |
| 5650013 |
Layer member forming method |
Jul. 22, 1997 |
| 5647913 |
Plasma reactors |
Jul. 15, 1997 |
| 5639309 |
Plasma processing apparatus adjusted for a batch-processing of a plurality of wafers with plasma gases |
Jun. 17, 1997 |
| 5630880 |
Method and apparatus for a large volume plasma processor that can utilize any feedstock material |
May. 20, 1997 |
| 5626679 |
Method and apparatus for preparing a silicon oxide film |
May. 6, 1997 |
| 5622566 |
Film-forming apparatus |
Apr. 22, 1997 |
| 5618349 |
Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity |
Apr. 8, 1997 |
| 5616181 |
MBE apparatus and gas branch piping apparatus |
Apr. 1, 1997 |
| 5614025 |
Plasma processing apparatus |
Mar. 25, 1997 |
| 5611863 |
Semiconductor processing apparatus and cleaning method thereof |
Mar. 18, 1997 |
| 5611898 |
Reaction chamber having in situ oxygen generation |
Mar. 18, 1997 |
| 5607509 |
High impedance plasma ion implantation apparatus |
Mar. 4, 1997 |
| 5601653 |
Apparatus for performing plasma process on semiconductor wafers and the like and method of performing plasma process |
Feb. 11, 1997 |
| 5597624 |
Method and apparatus for coating dielectrics |
Jan. 28, 1997 |
| 5595605 |
Apparatus for preventing the unstable growth rate of oxide caused by water vapor remaining in the inlet pipes of a horizontal driven field oxidation tube |
Jan. 21, 1997 |
| 5595602 |
Diffuser for uniform gas distribution in semiconductor processing and method for using the same |
Jan. 21, 1997 |
| 5585148 |
Process for forming a deposited film using a light transmissive perforated diffusion plate |
Dec. 17, 1996 |
| 5582648 |
Apparatus for preparing a functional deposited film by microwave plasma chemical vapor deposition |
Dec. 10, 1996 |
|
|
|
