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Class Information
Number: 118/723MP
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Multiple gas energizing means associated with one deposition site (i.e., excluding substrate heater as an energizing means)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6465051 |
Method of operating high density plasma CVD reactor with combined inductive and capacitive coupling |
Oct. 15, 2002 |
| 6454912 |
Method and apparatus for the fabrication of ferroelectric films |
Sep. 24, 2002 |
| 6432255 |
Method and apparatus for enhancing chamber cleaning |
Aug. 13, 2002 |
| 6432260 |
Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
Aug. 13, 2002 |
| 6397776 |
Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators |
Jun. 4, 2002 |
| 6383565 |
Vapor deposition coating apparatus |
May. 7, 2002 |
| 6371045 |
Physical vapor deposition device for forming a metallic layer on a semiconductor wafer |
Apr. 16, 2002 |
| 6368678 |
Plasma processing system and method |
Apr. 9, 2002 |
| 6363881 |
Plasma chemical vapor deposition apparatus |
Apr. 2, 2002 |
| 6352049 |
Plasma assisted processing chamber with separate control of species density |
Mar. 5, 2002 |
| 6338313 |
System for the plasma treatment of large area substrates |
Jan. 15, 2002 |
| 6338778 |
Vacuum coating system with a coating chamber and at least one source chamber |
Jan. 15, 2002 |
| 6332947 |
Plasma processing apparatus and plasma processing method using the same |
Dec. 25, 2001 |
| 6312554 |
Apparatus and method for controlling the ratio of reactive to non-reactive ions in a semiconductor wafer processing chamber |
Nov. 6, 2001 |
| 6298806 |
Device for exciting a gas by a surface wave plasma |
Oct. 9, 2001 |
| 6287430 |
Apparatus and method forming thin film |
Sep. 11, 2001 |
| 6269765 |
Collection devices for plasma immersion ion implantation |
Aug. 7, 2001 |
| 6267074 |
Plasma treatment systems |
Jul. 31, 2001 |
| 6263829 |
Process chamber having improved gas distributor and method of manufacture |
Jul. 24, 2001 |
| 6258173 |
Film forming apparatus for forming a crystalline silicon film |
Jul. 10, 2001 |
| 6236163 |
Multiple-beam ion-beam assembly |
May. 22, 2001 |
| 6220204 |
Film deposition method for forming copper film |
Apr. 24, 2001 |
| 6217724 |
Coated platen design for plasma immersion ion implantation |
Apr. 17, 2001 |
| 6203862 |
Processing systems with dual ion sources |
Mar. 20, 2001 |
| 6189481 |
Microwave plasma processing apparatus |
Feb. 20, 2001 |
| 6171454 |
Method for coating surfaces using a facility having sputter electrodes |
Jan. 9, 2001 |
| 6160350 |
Ion plating apparatus |
Dec. 12, 2000 |
| 6158382 |
Method for forming a deposited film by plasma chemical vapor deposition and apparatus for forming a deposited film by plasma chemical vapor deposition |
Dec. 12, 2000 |
| 6152071 |
High-frequency introducing means, plasma treatment apparatus, and plasma treatment method |
Nov. 28, 2000 |
| 6152070 |
Tandem process chamber |
Nov. 28, 2000 |
| 6139700 |
Method of and apparatus for forming a metal interconnection in the contact hole of a semiconductor device |
Oct. 31, 2000 |
| 6125788 |
Plasma reactor with enhanced plasma uniformity by gas addition, reduced chamber diameter and reduced RF wafer pedestal diameter |
Oct. 3, 2000 |
| 6120660 |
Removable liner design for plasma immersion ion implantation |
Sep. 19, 2000 |
| 6116185 |
Gas injector for plasma enhanced chemical vapor deposition |
Sep. 12, 2000 |
| 6110540 |
Plasma apparatus and method |
Aug. 29, 2000 |
| 6101972 |
Plasma processing system and method |
Aug. 15, 2000 |
| 6095085 |
Photo-assisted remote plasma apparatus and method |
Aug. 1, 2000 |
| 6090247 |
Apparatus for coating substrates |
Jul. 18, 2000 |
| 6089184 |
CVD apparatus and CVD method |
Jul. 18, 2000 |
| 6073578 |
RF induction plasma source generating apparatus |
Jun. 13, 2000 |
| 6071572 |
Forming tin thin films using remote activated specie generation |
Jun. 6, 2000 |
| 6055927 |
Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology |
May. 2, 2000 |
| 6051073 |
Perforated shield for plasma immersion ion implantation |
Apr. 18, 2000 |
| 6024045 |
Apparatus for fabricating semiconductor device and method for fabricating semiconductor device |
Feb. 15, 2000 |
| 6020570 |
Plasma processing apparatus |
Feb. 1, 2000 |
| 6001736 |
Method of manufacturing semiconductor device and an apparatus for manufacturing the same |
Dec. 14, 1999 |
| 5993622 |
Apparatus for coating a web on a rotating drum by plasma assisted vapor deposition |
Nov. 30, 1999 |
| 5980687 |
Plasma processing apparatus comprising a compensating-process-gas supply means in synchronism with a rotating magnetic field |
Nov. 9, 1999 |
| 5976259 |
Semiconductor device, manufacturing method, and system |
Nov. 2, 1999 |
| 5976261 |
Multi-zone gas injection apparatus and method for microelectronics manufacturing equipment |
Nov. 2, 1999 |
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