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Class Information
Number: 118/723MP
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Multiple gas energizing means associated with one deposition site (i.e., excluding substrate heater as an energizing means)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7531816 |
Vacuum conveying apparatus and charged particle beam equipment with the same |
May. 12, 2009 |
| 7444955 |
Apparatus for directing plasma flow to coat internal passageways |
Nov. 4, 2008 |
| 7430984 |
Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
Oct. 7, 2008 |
| 7374941 |
Active reactant vapor pulse monitoring in a chemical reactor |
May. 20, 2008 |
| 7296532 |
Bypass gas feed system and method to improve reactant gas flow and film deposition |
Nov. 20, 2007 |
| 7285196 |
Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals |
Oct. 23, 2007 |
| 7282454 |
Switched uniformity control |
Oct. 16, 2007 |
| 7205034 |
Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus |
Apr. 17, 2007 |
| 7186314 |
Plasma processor and plasma processing method |
Mar. 6, 2007 |
| 7182842 |
Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device |
Feb. 27, 2007 |
| 7183715 |
Method for operating a semiconductor processing apparatus |
Feb. 27, 2007 |
| 7166167 |
Laser CVD device and laser CVD method |
Jan. 23, 2007 |
| 7094316 |
Externally excited torroidal plasma source |
Aug. 22, 2006 |
| 7063981 |
Active pulse monitoring in a chemical reactor |
Jun. 20, 2006 |
| 7025863 |
Vacuum system with separable work piece support |
Apr. 11, 2006 |
| 6998785 |
Liquid-jet/liquid droplet initiated plasma discharge for generating useful plasma radiation |
Feb. 14, 2006 |
| 6988463 |
Ion beam source with gas introduced directly into deposition/vacuum chamber |
Jan. 24, 2006 |
| 6969953 |
System and method for inductive coupling of an expanding thermal plasma |
Nov. 29, 2005 |
| 6917165 |
Low power plasma generator |
Jul. 12, 2005 |
| 6907841 |
Apparatus and method for synthesizing spherical diamond powder by using chemical vapor deposition method |
Jun. 21, 2005 |
| 6905582 |
Configurable vacuum system and method |
Jun. 14, 2005 |
| 6858120 |
Method and apparatus for the fabrication of ferroelectric films |
Feb. 22, 2005 |
| 6827870 |
Method and apparatus for etching and deposition using micro-plasmas |
Dec. 7, 2004 |
| 6818852 |
Microwave plasma processing device, plasma processing method, and microwave radiating member |
Nov. 16, 2004 |
| 6808592 |
High throughput plasma treatment system |
Oct. 26, 2004 |
| 6793978 |
Method and device for coating at least one wiper-blade element |
Sep. 21, 2004 |
| 6787010 |
Non-thermionic sputter material transport device, methods of use, and materials produced thereby |
Sep. 7, 2004 |
| 6764658 |
Plasma generator |
Jul. 20, 2004 |
| 6734119 |
Electro-optical apparatus and method for fabricating a film, semiconductor device and memory device at near atmospheric pressure |
May. 11, 2004 |
| 6726769 |
Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition |
Apr. 27, 2004 |
| 6692649 |
Inductively coupled plasma downstream strip module |
Feb. 17, 2004 |
| 6685774 |
Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition |
Feb. 3, 2004 |
| 6673197 |
Chemical plasma cathode |
Jan. 6, 2004 |
| 6670741 |
Plasma processing apparatus with annular waveguide |
Dec. 30, 2003 |
| 6660342 |
Pulsed electromagnetic energy method for forming a film |
Dec. 9, 2003 |
| 6656540 |
Method for forming metallic film and apparatus for forming the same |
Dec. 2, 2003 |
| 6649545 |
Photo-assisted remote plasma apparatus and method |
Nov. 18, 2003 |
| 6645301 |
Ion source |
Nov. 11, 2003 |
| 6629508 |
Ionizer for gas cluster ion beam formation |
Oct. 7, 2003 |
| 6610169 |
Semiconductor processing system and method |
Aug. 26, 2003 |
| 6596133 |
Method and system for physically-assisted chemical-vapor deposition |
Jul. 22, 2003 |
| 6593150 |
Methods and apparatus for depositing magnetic films |
Jul. 15, 2003 |
| 6579428 |
Arc evaporator, method for driving arc evaporator, and ion plating apparatus |
Jun. 17, 2003 |
| 6568346 |
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply |
May. 27, 2003 |
| 6533908 |
Device and method for coating substrates in a vacuum utilizing an absorber electrode |
Mar. 18, 2003 |
| 6521104 |
Configurable vacuum system and method |
Feb. 18, 2003 |
| 6503366 |
Chemical plasma cathode |
Jan. 7, 2003 |
| 6497803 |
Unbalanced plasma generating apparatus having cylindrical symmetry |
Dec. 24, 2002 |
| 6478931 |
Apparatus and method for intra-layer modulation of the material deposition and assist beam and the multilayer structure produced therefrom |
Nov. 12, 2002 |
| 6465051 |
Method of operating high density plasma CVD reactor with combined inductive and capacitive coupling |
Oct. 15, 2002 |
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