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Class Information
Number: 118/723MA
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > With magnet (e.g., electron cyclotron resonance, etc.)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5032202 |
Plasma generating apparatus for large area plasma processing |
Jul. 16, 1991 |
| 5021114 |
Apparatus for treating material by using plasma |
Jun. 4, 1991 |
| 5015494 |
Microwave enhanced CVD method for depositing diamond |
May. 14, 1991 |
| 4973494 |
Microwave enhanced CVD method for depositing a boron nitride and carbon |
Nov. 27, 1990 |
| 4939424 |
Apparatus for producing a plasma and for the treatment of substrates |
Jul. 3, 1990 |
| 4926791 |
Microwave plasma apparatus employing helmholtz coils and ioffe bars |
May. 22, 1990 |
| 4913928 |
Microwave plasma chemical vapor deposition apparatus with magnet on waveguide |
Apr. 3, 1990 |
| 4897285 |
Method and apparatus for PCVD internal coating a metallic pipe by means of a microwave plasma |
Jan. 30, 1990 |
| 4876983 |
Plasma operation apparatus |
Oct. 31, 1989 |
| 4871581 |
Carbon deposition by ECR CVD using a catalytic gas |
Oct. 3, 1989 |
| 4745337 |
Method and device for exciting a plasma using microwaves at the electronic cyclotronic resonance |
May. 17, 1988 |
| 4727293 |
Plasma generating apparatus using magnets and method |
Feb. 23, 1988 |
| 4123316 |
Plasma processor |
Oct. 31, 1978 |
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