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Class Information
Number: 118/723MA
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > With magnet (e.g., electron cyclotron resonance, etc.)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5714010 |
Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same |
Feb. 3, 1998 |
| 5707452 |
Coaxial microwave applicator for an electron cyclotron resonance plasma source |
Jan. 13, 1998 |
| 5700326 |
Microwave plasma processing apparatus |
Dec. 23, 1997 |
| 5685913 |
Plasma processing apparatus and method |
Nov. 11, 1997 |
| 5674321 |
Method and apparatus for producing plasma uniformity in a magnetic field-enhanced plasma reactor |
Oct. 7, 1997 |
| 5665167 |
Plasma treatment apparatus having a workpiece-side electrode grounding circuit |
Sep. 9, 1997 |
| 5658389 |
Thin film forming method and apparatus |
Aug. 19, 1997 |
| 5639341 |
Dry etching with less particles |
Jun. 17, 1997 |
| 5627435 |
Hollow cathode array and method of cleaning sheet stock therewith |
May. 6, 1997 |
| 5607510 |
Vacuum processing apparatus |
Mar. 4, 1997 |
| 5605576 |
High frequency magnetron plasma apparatus |
Feb. 25, 1997 |
| 5587205 |
Plasma processing method and an apparatus for carrying out the same |
Dec. 24, 1996 |
| 5587207 |
Arc assisted CVD coating and sintering method |
Dec. 24, 1996 |
| 5567243 |
Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor |
Oct. 22, 1996 |
| 5565248 |
Method and apparatus for coating hollow containers through plasma-assisted deposition of an inorganic substance |
Oct. 15, 1996 |
| 5558736 |
Electron cyclotron resonance apparatus |
Sep. 24, 1996 |
| 5554249 |
Magnetron plasma processing system |
Sep. 10, 1996 |
| 5522934 |
Plasma processing apparatus using vertical gas inlets one on top of another |
Jun. 4, 1996 |
| 5520741 |
Apparatus for producing a plasma polymer protective layer on workpieces, in particular headlamp reflectors |
May. 28, 1996 |
| 5518547 |
Method and apparatus for reducing particulates in a plasma tool through steady state flows |
May. 21, 1996 |
| 5517085 |
Apparatus including ring-shaped resonators for producing microwave plasmas |
May. 14, 1996 |
| 5514217 |
Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric me |
May. 7, 1996 |
| 5512102 |
Microwave enhanced CVD system under magnetic field |
Apr. 30, 1996 |
| 5505780 |
High-density plasma-processing tool with toroidal magnetic field |
Apr. 9, 1996 |
| 5496410 |
Plasma processing apparatus and method of processing substrates by using same apparatus |
Mar. 5, 1996 |
| 5466295 |
ECR plasma generation apparatus and methods |
Nov. 14, 1995 |
| 5453305 |
Plasma reactor for processing substrates |
Sep. 26, 1995 |
| 5453125 |
ECR plasma source for gas abatement |
Sep. 26, 1995 |
| 5435881 |
Apparatus for producing planar plasma using varying magnetic poles |
Jul. 25, 1995 |
| 5433788 |
Apparatus for plasma treatment using electron cyclotron resonance |
Jul. 18, 1995 |
| 5431769 |
Method and system for plasma treatment |
Jul. 11, 1995 |
| 5399253 |
Plasma generating device |
Mar. 21, 1995 |
| 5378284 |
Apparatus for coating substrates using a microwave ECR plasma source |
Jan. 3, 1995 |
| 5370765 |
Electron cyclotron resonance plasma source and method of operation |
Dec. 6, 1994 |
| 5368646 |
Reaction chamber design to minimize particle generation in chemical vapor deposition reactors |
Nov. 29, 1994 |
| 5366586 |
Plasma formation using electron cyclotron resonance and method for processing substrate by using the same |
Nov. 22, 1994 |
| 5308417 |
Uniformity for magnetically enhanced plasma chambers |
May. 3, 1994 |
| 5304277 |
Plasma processing apparatus using plasma produced by microwaves |
Apr. 19, 1994 |
| 5292395 |
ECR plasma reaction apparatus having uniform magnetic field gradient |
Mar. 8, 1994 |
| 5266364 |
Method and apparatus for controlling plasma processing |
Nov. 30, 1993 |
| 5266146 |
Microwave-powered plasma-generating apparatus and method |
Nov. 30, 1993 |
| 5246532 |
Plasma processing apparatus |
Sep. 21, 1993 |
| 5234565 |
Microwave plasma source |
Aug. 10, 1993 |
| 5145711 |
Cyclotron resonance chemical vapor deposition method of forming a halogen-containing diamond on a substrate |
Sep. 8, 1992 |
| 5133825 |
Plasma generating apparatus |
Jul. 28, 1992 |
| 5133826 |
Electron cyclotron resonance plasma source |
Jul. 28, 1992 |
| 5132105 |
Materials with diamond-like properties and method and means for manufacturing them |
Jul. 21, 1992 |
| 5079033 |
Process and apparatus for resin-coating of extrusions |
Jan. 7, 1992 |
| 5038713 |
Microwave plasma treating apparatus |
Aug. 13, 1991 |
| 5034086 |
Plasma processing apparatus for etching, ashing and film-formation |
Jul. 23, 1991 |
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