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Class Information
Number: 118/723MA
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > With magnet (e.g., electron cyclotron resonance, etc.)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6273022 |
Distributed inductively-coupled plasma source |
Aug. 14, 2001 |
| 6270618 |
Plasma processing apparatus |
Aug. 7, 2001 |
| 6245190 |
Plasma processing system and plasma processing method |
Jun. 12, 2001 |
| 6225592 |
Method and apparatus for launching microwave energy into a plasma processing chamber |
May. 1, 2001 |
| 6196155 |
Plasma processing apparatus and method of cleaning the apparatus |
Mar. 6, 2001 |
| 6194628 |
Method and apparatus for cleaning a vacuum line in a CVD system |
Feb. 27, 2001 |
| 6194836 |
Magnetic system, particularly for ECR sources, for producing closed surfaces of equimodule B of form dimensions |
Feb. 27, 2001 |
| 6190495 |
Magnetron plasma processing apparatus |
Feb. 20, 2001 |
| 6189484 |
Plasma reactor having a helicon wave high density plasma source |
Feb. 20, 2001 |
| 6184624 |
Ion source |
Feb. 6, 2001 |
| 6171438 |
Plasma processing apparatus and plasma processing method |
Jan. 9, 2001 |
| 6161498 |
Plasma processing device and a method of plasma process |
Dec. 19, 2000 |
| 6155200 |
ECR plasma generator and an ECR system using the generator |
Dec. 5, 2000 |
| 6156154 |
Apparatus for etching discs and pallets prior to sputter deposition |
Dec. 5, 2000 |
| 6113731 |
Magnetically-enhanced plasma chamber with non-uniform magnetic field |
Sep. 5, 2000 |
| 6109208 |
Plasma generating apparatus with multiple microwave introducing means |
Aug. 29, 2000 |
| 6099687 |
Etching system |
Aug. 8, 2000 |
| 6096160 |
Helicon wave plasma processing apparatus |
Aug. 1, 2000 |
| 6084356 |
Plasma processing apparatus with a dielectric body in the waveguide |
Jul. 4, 2000 |
| 6076484 |
Apparatus and method for microwave plasma process |
Jun. 20, 2000 |
| 6076483 |
Plasma processing apparatus using a partition panel |
Jun. 20, 2000 |
| 6074518 |
Plasma processing apparatus |
Jun. 13, 2000 |
| 6055929 |
Magnetron |
May. 2, 2000 |
| 6054063 |
Method for plasma treatment and apparatus for plasma treatment |
Apr. 25, 2000 |
| 6016766 |
Microwave plasma processor |
Jan. 25, 2000 |
| 6010755 |
Method and apparatus for forming thin films using dual ECR plasma generators |
Jan. 4, 2000 |
| 6000360 |
Plasma processing apparatus |
Dec. 14, 1999 |
| 5985091 |
Microwave plasma processing apparatus and microwave plasma processing method |
Nov. 16, 1999 |
| 5983829 |
Microwave plasma etching apparatus |
Nov. 16, 1999 |
| 5975014 |
Coaxial resonant multi-port microwave applicator for an ECR plasma source |
Nov. 2, 1999 |
| 5976257 |
Apparatus for continuously forming a large area deposited film by means of microwave plasma CVD process |
Nov. 2, 1999 |
| 5976334 |
Reliable sustained self-sputtering |
Nov. 2, 1999 |
| 5961773 |
Plasma processing apparatus and plasma processing method using the same |
Oct. 5, 1999 |
| 5958141 |
Dry etching device |
Sep. 28, 1999 |
| 5944942 |
Varying multipole plasma source |
Aug. 31, 1999 |
| 5935335 |
Film-forming apparatus and film-forming method |
Aug. 10, 1999 |
| 5935455 |
Method and an electrode system for excitation of a plasma |
Aug. 10, 1999 |
| 5928461 |
RF plasma source for cleaning spacecraft surfaces |
Jul. 27, 1999 |
| 5897923 |
Plasma treatment device |
Apr. 27, 1999 |
| 5895551 |
Plasma etching apparatus |
Apr. 20, 1999 |
| 5874012 |
Plasma processing apparatus and plasma processing method |
Feb. 23, 1999 |
| 5858162 |
Plasma processing apparatus |
Jan. 12, 1999 |
| 5824602 |
Helicon wave excitation to produce energetic electrons for manufacturing semiconductors |
Oct. 20, 1998 |
| 5824607 |
Plasma confinement for an inductively coupled plasma reactor |
Oct. 20, 1998 |
| 5803975 |
Microwave plasma processing apparatus and method therefor |
Sep. 8, 1998 |
| 5800620 |
Plasma treatment apparatus |
Sep. 1, 1998 |
| 5779802 |
Thin film deposition chamber with ECR-plasma source |
Jul. 14, 1998 |
| 5772772 |
Plasma diffusion control apparatus |
Jun. 30, 1998 |
| 5762814 |
Plasma processing method and apparatus using plasma produced by microwaves |
Jun. 9, 1998 |
| 5753320 |
Process for forming deposited film |
May. 19, 1998 |
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