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Class Information
Number: 118/723IR
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means > Producing energized gas remotely located from substrate
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5855725 |
Vacuum processing system and method of removing film deposited on inner face of vacuum vessel in the vacuum processing system |
Jan. 5, 1999 |
| 5851600 |
Plasma process method and apparatus |
Dec. 22, 1998 |
| 5824158 |
Chemical vapor deposition using inductively coupled plasma and system therefor |
Oct. 20, 1998 |
| 5810932 |
Plasma generating apparatus used for fabrication of semiconductor device |
Sep. 22, 1998 |
| 5811022 |
Inductive plasma reactor |
Sep. 22, 1998 |
| 5803974 |
Chemical vapor deposition apparatus |
Sep. 8, 1998 |
| 5800619 |
Vacuum plasma processor having coil with minimum magnetic field in its center |
Sep. 1, 1998 |
| 5759280 |
Inductively coupled source for deriving substantially uniform plasma flux |
Jun. 2, 1998 |
| 5753320 |
Process for forming deposited film |
May. 19, 1998 |
| 5753044 |
RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
May. 19, 1998 |
| 5735960 |
Apparatus and method to increase gas residence time in a reactor |
Apr. 7, 1998 |
| 5728222 |
Apparatus for chemical vapor deposition of aluminum oxide |
Mar. 17, 1998 |
| 5716451 |
Plasma processing apparatus |
Feb. 10, 1998 |
| 5707692 |
Apparatus and method for processing a base substance using plasma and a magnetic field |
Jan. 13, 1998 |
| 5690781 |
Plasma processing apparatus for manufacture of semiconductor devices |
Nov. 25, 1997 |
| 5690050 |
Plasma treating apparatus and plasma treating method |
Nov. 25, 1997 |
| 5685941 |
Inductively coupled plasma reactor with top electrode for enhancing plasma ignition |
Nov. 11, 1997 |
| 5683539 |
Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling |
Nov. 4, 1997 |
| 5683548 |
Inductively coupled plasma reactor and process |
Nov. 4, 1997 |
| 5681418 |
Plasma processing with inductive coupling |
Oct. 28, 1997 |
| 5681393 |
Plasma processing apparatus |
Oct. 28, 1997 |
| 5669975 |
Plasma producing method and apparatus including an inductively-coupled plasma source |
Sep. 23, 1997 |
| 5630880 |
Method and apparatus for a large volume plasma processor that can utilize any feedstock material |
May. 20, 1997 |
| 5620523 |
Apparatus for forming film |
Apr. 15, 1997 |
| 5614055 |
High density plasma CVD and etching reactor |
Mar. 25, 1997 |
| 5558722 |
Plasma processing apparatus |
Sep. 24, 1996 |
| 5540800 |
Inductively coupled high density plasma reactor for plasma assisted materials processing |
Jul. 30, 1996 |
| 5540824 |
Plasma reactor with multi-section RF coil and isolated conducting lid |
Jul. 30, 1996 |
| 5525159 |
Plasma process apparatus |
Jun. 11, 1996 |
| 5474642 |
Apparatus for the treatment of a solid body |
Dec. 12, 1995 |
| 5472507 |
IC wiring connecting method and apparatus |
Dec. 5, 1995 |
| 5425811 |
Apparatus for manufacturing a nitrogen containing compound thin film |
Jun. 20, 1995 |
| 5389153 |
Plasma processing system using surface wave plasma generating apparatus and method |
Feb. 14, 1995 |
| 5378285 |
Apparatus for forming a diamond-like thin film |
Jan. 3, 1995 |
| 5346578 |
Induction plasma source |
Sep. 13, 1994 |
| 5180435 |
Remote plasma enhanced CVD method and apparatus for growing an epitaxial semiconductor layer |
Jan. 19, 1993 |
| 5154135 |
Apparatus for forming a deposited film |
Oct. 13, 1992 |
| 5122251 |
High density plasma deposition and etching apparatus |
Jun. 16, 1992 |
| 5108535 |
Dry etching apparatus |
Apr. 28, 1992 |
| 5091049 |
High density plasma deposition and etching apparatus |
Feb. 25, 1992 |
| 5082517 |
Plasma density controller for semiconductor device processing equipment |
Jan. 21, 1992 |
| 5045166 |
Magnetron method and apparatus for producing high density ionic gas discharge |
Sep. 3, 1991 |
| 5018479 |
Remote plasma enhanced CVD method and apparatus for growing an epitaxial semconductor layer |
May. 28, 1991 |
| 4990229 |
High density plasma deposition and etching apparatus |
Feb. 5, 1991 |
| 4971832 |
HR-CVD process for the formation of a functional deposited film on a substrate with application of a voltage in the range of -5 to -100 V |
Nov. 20, 1990 |
| 4948750 |
Method and apparatus for producing semiconductor layers composed of amorphous silicon-germanium alloys through glow discharge technique, particularly for solar cells |
Aug. 14, 1990 |
| 4945857 |
Plasma formation of hydride compounds |
Aug. 7, 1990 |
| 4878989 |
Chemical beam epitaxy system |
Nov. 7, 1989 |
| 4867952 |
Cracking traps for process gas components having a condensed phase |
Sep. 19, 1989 |
| 4853250 |
Process of depositing particulate material on a substrate |
Aug. 1, 1989 |
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