| |
 |
|
Class Information
Number: 118/723IR
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means > Producing energized gas remotely located from substrate
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6203657 |
Inductively coupled plasma downstream strip module |
Mar. 20, 2001 |
| 6192827 |
Double slit-valve doors for plasma processing |
Feb. 27, 2001 |
| 6194835 |
Device for producing plasma |
Feb. 27, 2001 |
| 6182603 |
Surface-treated shower head for use in a substrate processing chamber |
Feb. 6, 2001 |
| 6181068 |
Plasma generating apparatus |
Jan. 30, 2001 |
| 6174407 |
Apparatus and method for detecting an endpoint of an etching process by transmitting infrared light signals through a semiconductor wafer |
Jan. 16, 2001 |
| 6165311 |
Inductively coupled RF plasma reactor having an overhead solenoidal antenna |
Dec. 26, 2000 |
| 6164241 |
Multiple coil antenna for inductively-coupled plasma generation systems |
Dec. 26, 2000 |
| 6162323 |
Plasma processing apparatus |
Dec. 19, 2000 |
| 6155199 |
Parallel-antenna transformer-coupled plasma generation system |
Dec. 5, 2000 |
| 6143124 |
Apparatus and method for generating a plasma from an electromagnetic field having a lissajous pattern |
Nov. 7, 2000 |
| 6143081 |
Film forming apparatus and method, and film modifying apparatus and method |
Nov. 7, 2000 |
| 6143084 |
Apparatus and method for generating plasma |
Nov. 7, 2000 |
| 6135053 |
Apparatus for forming a deposited film by plasma chemical vapor deposition |
Oct. 24, 2000 |
| 6132566 |
Apparatus and method for sputtering ionized material in a plasma |
Oct. 17, 2000 |
| 6132552 |
Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
Oct. 17, 2000 |
| 6116186 |
Apparatus for cooling a plasma generator |
Sep. 12, 2000 |
| 6112696 |
Downstream plasma using oxygen gas mixture |
Sep. 5, 2000 |
| 6110556 |
Lid assembly for a process chamber employing asymmetric flow geometries |
Aug. 29, 2000 |
| 6109206 |
Remote plasma source for chamber cleaning |
Aug. 29, 2000 |
| 6107152 |
Method of forming tungsten nitride comprising layers using NF.sub.3 as a nitrogen source gas |
Aug. 22, 2000 |
| 6096160 |
Helicon wave plasma processing apparatus |
Aug. 1, 2000 |
| 6095159 |
Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities |
Aug. 1, 2000 |
| 6095085 |
Photo-assisted remote plasma apparatus and method |
Aug. 1, 2000 |
| 6089182 |
Plasma processing apparatus |
Jul. 18, 2000 |
| 6085689 |
Apparatus to increase gas residence time in a reactor |
Jul. 11, 2000 |
| 6087778 |
Scalable helicon wave plasma processing device with a non-cylindrical source chamber having a serpentine antenna |
Jul. 11, 2000 |
| 6074512 |
Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
Jun. 13, 2000 |
| 6071572 |
Forming tin thin films using remote activated specie generation |
Jun. 6, 2000 |
| 6063233 |
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
May. 16, 2000 |
| 6056848 |
Thin film electrostatic shield for inductive plasma processing |
May. 2, 2000 |
| 6051073 |
Perforated shield for plasma immersion ion implantation |
Apr. 18, 2000 |
| 6051151 |
Apparatus and method of producing a negative ion plasma |
Apr. 18, 2000 |
| 6030667 |
Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma |
Feb. 29, 2000 |
| 6027606 |
Center gas feed apparatus for a high density plasma reactor |
Feb. 22, 2000 |
| 6024826 |
Plasma reactor with heated source of a polymer-hardening precursor material |
Feb. 15, 2000 |
| 6022460 |
Enhanced inductively coupled plasma reactor |
Feb. 8, 2000 |
| 6016765 |
Plasma processing apparatus |
Jan. 25, 2000 |
| 6015476 |
Plasma reactor magnet with independently controllable parallel axial current-carrying elements |
Jan. 18, 2000 |
| 6009830 |
Independent gas feeds in a plasma reactor |
Jan. 4, 2000 |
| 5983828 |
Apparatus and method for pulsed plasma processing of a semiconductor substrate |
Nov. 16, 1999 |
| 5976308 |
High density plasma CVD and etching reactor |
Nov. 2, 1999 |
| 5965034 |
High frequency plasma process wherein the plasma is executed by an inductive structure in which the phase and anti-phase portion of the capacitive currents between the inductive structure and |
Oct. 12, 1999 |
| 5961772 |
Atmospheric-pressure plasma jet |
Oct. 5, 1999 |
| 5951773 |
Inductively coupled plasma chemical vapor deposition apparatus |
Sep. 14, 1999 |
| 5948168 |
Distributed microwave plasma reactor for semiconductor processing |
Sep. 7, 1999 |
| 5935336 |
Apparatus to increase gas residence time in a reactor |
Aug. 10, 1999 |
| 5916455 |
Method and apparatus for generating a low pressure plasma |
Jun. 29, 1999 |
| 5865896 |
High density plasma CVD reactor with combined inductive and capacitive coupling |
Feb. 2, 1999 |
| 5858100 |
Substrate holder and reaction apparatus |
Jan. 12, 1999 |
|
|
|
