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Class Information
Number: 118/723IR
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means > Producing energized gas remotely located from substrate
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6514376 |
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
Feb. 4, 2003 |
| 6503330 |
Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition |
Jan. 7, 2003 |
| 6499424 |
Plasma processing apparatus and method |
Dec. 31, 2002 |
| 6494986 |
Externally excited multiple torroidal plasma source |
Dec. 17, 2002 |
| 6495233 |
Apparatus for distributing gases in a chemical vapor deposition system |
Dec. 17, 2002 |
| 6474258 |
Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
Nov. 5, 2002 |
| 6475334 |
Dry etching device and dry etching method |
Nov. 5, 2002 |
| 6471822 |
Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma |
Oct. 29, 2002 |
| 6463873 |
High density plasmas |
Oct. 15, 2002 |
| 6453842 |
Externally excited torroidal plasma source using a gas distribution plate |
Sep. 24, 2002 |
| 6450117 |
Directing a flow of gas in a substrate processing chamber |
Sep. 17, 2002 |
| 6446572 |
Embedded plasma source for plasma density improvement |
Sep. 10, 2002 |
| 6444085 |
Inductively coupled RF plasma reactor having an antenna adjacent a window electrode |
Sep. 3, 2002 |
| 6435131 |
Ion flow forming method and apparatus |
Aug. 20, 2002 |
| 6432260 |
Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
Aug. 13, 2002 |
| 6431113 |
Plasma vacuum substrate treatment process and system |
Aug. 13, 2002 |
| 6419752 |
Structuring device for processing a substrate |
Jul. 16, 2002 |
| 6418874 |
Toroidal plasma source for plasma processing |
Jul. 16, 2002 |
| 6412438 |
Downstream sapphire elbow joint for remote plasma generator |
Jul. 2, 2002 |
| 6413358 |
Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks |
Jul. 2, 2002 |
| 6401652 |
Plasma reactor inductive coil antenna with flat surface facing the plasma |
Jun. 11, 2002 |
| 6391171 |
Flangeless feed through |
May. 21, 2002 |
| 6388383 |
Method of an apparatus for obtaining neutral dissociated gas atoms |
May. 14, 2002 |
| 6382129 |
Semiconductor wafer processor, plasma generating apparatus, magnetic field generator, and method of generating a magnetic field |
May. 7, 2002 |
| 6383334 |
Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
May. 7, 2002 |
| 6383299 |
Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film |
May. 7, 2002 |
| 6352050 |
Remote plasma mixer |
Mar. 5, 2002 |
| 6352049 |
Plasma assisted processing chamber with separate control of species density |
Mar. 5, 2002 |
| 6340499 |
Method to increase gas residence time in a reactor |
Jan. 22, 2002 |
| 6323133 |
Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
Nov. 27, 2001 |
| 6312554 |
Apparatus and method for controlling the ratio of reactive to non-reactive ions in a semiconductor wafer processing chamber |
Nov. 6, 2001 |
| 6312555 |
Thin film electrostatic shield for inductive plasma processing |
Nov. 6, 2001 |
| 6300227 |
Enhanced plasma mode and system for plasma immersion ion implantation |
Oct. 9, 2001 |
| 6291939 |
Ion source device |
Sep. 18, 2001 |
| 6264812 |
Method and apparatus for generating a plasma |
Jul. 24, 2001 |
| 6263831 |
Downstream plasma using oxygen gas mixtures |
Jul. 24, 2001 |
| 6259209 |
Plasma processing apparatus with coils in dielectric windows |
Jul. 10, 2001 |
| 6258171 |
Direct liquid injection system with on-line cleaning |
Jul. 10, 2001 |
| 6254737 |
Active shield for generating a plasma for sputtering |
Jul. 3, 2001 |
| 6248206 |
Apparatus for sidewall profile control during an etch process |
Jun. 19, 2001 |
| 6248251 |
Apparatus and method for electrostatically shielding an inductively coupled RF plasma source and facilitating ignition of a plasma |
Jun. 19, 2001 |
| 6246175 |
Large area microwave plasma generator |
Jun. 12, 2001 |
| 6245202 |
Plasma treatment device |
Jun. 12, 2001 |
| 6239553 |
RF plasma source for material processing |
May. 29, 2001 |
| 6237526 |
Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
May. 29, 2001 |
| 6235169 |
Modulated power for ionized metal plasma deposition |
May. 22, 2001 |
| 6225744 |
Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coil |
May. 1, 2001 |
| 6217718 |
Method and apparatus for reducing plasma nonuniformity across the surface of a substrate in apparatus for producing an ionized metal plasma |
Apr. 17, 2001 |
| 6217724 |
Coated platen design for plasma immersion ion implantation |
Apr. 17, 2001 |
| 6213050 |
Enhanced plasma mode and computer system for plasma immersion ion implantation |
Apr. 10, 2001 |
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