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Class Information
Number: 118/723IR
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means > Producing energized gas remotely located from substrate
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7611603 |
Plasma processing apparatus having impedance varying electrodes |
Nov. 3, 2009 |
| 7604708 |
Cleaning of native oxide with hydrogen-containing radicals |
Oct. 20, 2009 |
| 7591935 |
Enhanced reliability deposition baffle for iPVD |
Sep. 22, 2009 |
| 7520957 |
Lid assembly for front end of line fabrication |
Apr. 21, 2009 |
| 7482757 |
Inductively coupled high-density plasma source |
Jan. 27, 2009 |
| 7444955 |
Apparatus for directing plasma flow to coat internal passageways |
Nov. 4, 2008 |
| 7430984 |
Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
Oct. 7, 2008 |
| 7413627 |
Deposition chamber and method for depositing low dielectric constant films |
Aug. 19, 2008 |
| 7411148 |
Plasma generation apparatus |
Aug. 12, 2008 |
| 7374648 |
Single piece coil support assemblies, coil constructions and methods of assembling coil constructions |
May. 20, 2008 |
| 7331306 |
Plasma processing method and apparatus |
Feb. 19, 2008 |
| 7244474 |
Chemical vapor deposition plasma process using an ion shower grid |
Jul. 17, 2007 |
| 7245084 |
Transformer ignition circuit for a transformer coupled plasma source |
Jul. 17, 2007 |
| 7205240 |
HDP-CVD multistep gapfill process |
Apr. 17, 2007 |
| 7156950 |
Gas diffusion plate for use in ICP etcher |
Jan. 2, 2007 |
| 7150805 |
Plasma process device |
Dec. 19, 2006 |
| 7137354 |
Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage |
Nov. 21, 2006 |
| 7094316 |
Externally excited torroidal plasma source |
Aug. 22, 2006 |
| 7037376 |
Backflush chamber clean |
May. 2, 2006 |
| 6939434 |
Externally excited torroidal plasma source with magnetic control of ion distribution |
Sep. 6, 2005 |
| 6905625 |
Plasma processing method and apparatus |
Jun. 14, 2005 |
| 6876155 |
Plasma processor apparatus and method, and antenna |
Apr. 5, 2005 |
| 6873112 |
Method for producing a semiconductor device |
Mar. 29, 2005 |
| 6863021 |
Method and apparatus for providing and integrating a general metal delivery source (GMDS) with atomic layer deposition (ALD) |
Mar. 8, 2005 |
| 6822396 |
Transformer ignition circuit for a transformer coupled plasma source |
Nov. 23, 2004 |
| 6814838 |
Vacuum treatment chamber and method for treating surfaces |
Nov. 9, 2004 |
| 6802933 |
Apparatus for performing self cleaning method of forming deep trenches in silicon substrates |
Oct. 12, 2004 |
| 6783627 |
Reactor with remote plasma system and method of processing a semiconductor substrate |
Aug. 31, 2004 |
| 6770165 |
Apparatus for plasma treatment |
Aug. 3, 2004 |
| 6761796 |
Method and apparatus for micro-jet enabled, low-energy ion generation transport in plasma processing |
Jul. 13, 2004 |
| 6753123 |
Process and apparatus for manufacturing electrophotographic photosensitive member |
Jun. 22, 2004 |
| 6749717 |
Device for in-situ cleaning of an inductively-coupled plasma chambers |
Jun. 15, 2004 |
| 6736931 |
Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
May. 18, 2004 |
| 6712020 |
Toroidal plasma source for plasma processing |
Mar. 30, 2004 |
| 6692649 |
Inductively coupled plasma downstream strip module |
Feb. 17, 2004 |
| 6692622 |
Plasma processing apparatus with an electrically conductive wall |
Feb. 17, 2004 |
| 6679981 |
Inductive plasma loop enhancing magnetron sputtering |
Jan. 20, 2004 |
| 6676802 |
Remote exposure of workpieces using a plasma |
Jan. 13, 2004 |
| 6657395 |
Close coupled match structure for RF drive electrode |
Dec. 2, 2003 |
| 6656540 |
Method for forming metallic film and apparatus for forming the same |
Dec. 2, 2003 |
| 6656282 |
Atomic layer deposition apparatus and process using remote plasma |
Dec. 2, 2003 |
| 6641698 |
Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow |
Nov. 4, 2003 |
| 6634313 |
High-frequency electrostatically shielded toroidal plasma and radical source |
Oct. 21, 2003 |
| 6583572 |
Inductive plasma processor including current sensor for plasma excitation coil |
Jun. 24, 2003 |
| 6578514 |
Modular device of tubular plasma source |
Jun. 17, 2003 |
| 6568346 |
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply |
May. 27, 2003 |
| 6553933 |
Apparatus for injecting and modifying gas concentration of a meta-stable species in a downstream plasma reactor |
Apr. 29, 2003 |
| 6554953 |
Thin film electrostatic shield for inductive plasma processing |
Apr. 29, 2003 |
| 6551447 |
Inductive plasma reactor |
Apr. 22, 2003 |
| 6545420 |
Plasma reactor using inductive RF coupling, and processes |
Apr. 8, 2003 |
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