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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6191532 |
Arrangement for producing plasma |
Feb. 20, 2001 |
| 6182602 |
Inductively coupled HDP-CVD reactor |
Feb. 6, 2001 |
| 6184488 |
Low inductance large area coil for an inductively coupled plasma source |
Feb. 6, 2001 |
| 6184623 |
Method for controlling plasma-generating high frequency power, and plasma generating apparatus |
Feb. 6, 2001 |
| 6181069 |
High frequency discharging method and apparatus, and high frequency processing apparatus |
Jan. 30, 2001 |
| 6179955 |
Dry etching apparatus for manufacturing semiconductor devices |
Jan. 30, 2001 |
| 6180019 |
Plasma processing apparatus and method |
Jan. 30, 2001 |
| 6178919 |
Perforated plasma confinement ring in plasma reactors |
Jan. 30, 2001 |
| 6178918 |
Plasma enhanced chemical processing reactor |
Jan. 30, 2001 |
| 6178920 |
Plasma reactor with internal inductive antenna capable of generating helicon wave |
Jan. 30, 2001 |
| 6174450 |
Methods and apparatus for controlling ion energy and plasma density in a plasma processing system |
Jan. 16, 2001 |
| 6173674 |
Plasma reactor with a deposition shield |
Jan. 16, 2001 |
| 6171438 |
Plasma processing apparatus and plasma processing method |
Jan. 9, 2001 |
| 6170431 |
Plasma reactor with a deposition shield |
Jan. 9, 2001 |
| 6170428 |
Symmetric tunable inductively coupled HDP-CVD reactor |
Jan. 9, 2001 |
| 6165311 |
Inductively coupled RF plasma reactor having an overhead solenoidal antenna |
Dec. 26, 2000 |
| 6164241 |
Multiple coil antenna for inductively-coupled plasma generation systems |
Dec. 26, 2000 |
| 6164240 |
Semiconductor wafer processor, plasma generating apparatus, magnetic field generator, and method of generating a magnetic field |
Dec. 26, 2000 |
| 6162323 |
Plasma processing apparatus |
Dec. 19, 2000 |
| 6161500 |
Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions |
Dec. 19, 2000 |
| 6158384 |
Plasma reactor with multiple small internal inductive antennas |
Dec. 12, 2000 |
| 6155203 |
Apparatus for control of deposit build-up on an inner surface of a plasma processing chamber |
Dec. 5, 2000 |
| 6155199 |
Parallel-antenna transformer-coupled plasma generation system |
Dec. 5, 2000 |
| 6153977 |
ECR type plasma generating apparatus |
Nov. 28, 2000 |
| 6153849 |
Method and apparatus for preventing etch rate drop after machine idle in plasma etch chamber |
Nov. 28, 2000 |
| 6150763 |
Inductively-coupled high density plasma producing apparatus and plasma processing equipment provided with the same |
Nov. 21, 2000 |
| 6149760 |
Plasma processing apparatus |
Nov. 21, 2000 |
| 6149730 |
Apparatus for forming films of a semiconductor device, a method of manufacturing a semiconductor device, and a method of forming thin films of a semiconductor |
Nov. 21, 2000 |
| 6143084 |
Apparatus and method for generating plasma |
Nov. 7, 2000 |
| 6143078 |
Gas distribution system for a CVD processing chamber |
Nov. 7, 2000 |
| 6143144 |
Method for etch rate enhancement by background oxygen control in a soft etch system |
Nov. 7, 2000 |
| 6139679 |
Coil and coil feedthrough |
Oct. 31, 2000 |
| 6135052 |
Method and apparatus for temperature control of the semiconductor |
Oct. 24, 2000 |
| 6136139 |
Plasma processing apparatus |
Oct. 24, 2000 |
| 6136140 |
Plasma processing apparatus |
Oct. 24, 2000 |
| 6136165 |
Apparatus for inductively-coupled-plasma-enhanced ionized physical-vapor deposition |
Oct. 24, 2000 |
| 6132566 |
Apparatus and method for sputtering ionized material in a plasma |
Oct. 17, 2000 |
| 6132552 |
Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
Oct. 17, 2000 |
| 6129807 |
Apparatus for monitoring processing of a substrate |
Oct. 10, 2000 |
| 6126778 |
Beat frequency modulation for plasma generation |
Oct. 3, 2000 |
| H1868 |
Method of and apparatus for controlling plasma potential and eliminating unipolar arcs in plasma chambers |
Oct. 3, 2000 |
| 6123791 |
Ceramic composition for an apparatus and method for processing a substrate |
Sep. 26, 2000 |
| 6120660 |
Removable liner design for plasma immersion ion implantation |
Sep. 19, 2000 |
| 6116187 |
Thin film forming apparatus |
Sep. 12, 2000 |
| 6109206 |
Remote plasma source for chamber cleaning |
Aug. 29, 2000 |
| 6110556 |
Lid assembly for a process chamber employing asymmetric flow geometries |
Aug. 29, 2000 |
| 6105518 |
Durable plasma treatment apparatus and method |
Aug. 22, 2000 |
| 6103070 |
Powered shield source for high density plasma |
Aug. 15, 2000 |
| 6101970 |
Plasma processing apparatus |
Aug. 15, 2000 |
| 6099705 |
Physical vapor deposition device for forming a uniform metal layer on a semiconductor wafer |
Aug. 8, 2000 |
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