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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6269765 |
Collection devices for plasma immersion ion implantation |
Aug. 7, 2001 |
| 6264812 |
Method and apparatus for generating a plasma |
Jul. 24, 2001 |
| 6263829 |
Process chamber having improved gas distributor and method of manufacture |
Jul. 24, 2001 |
| 6265831 |
Plasma processing method and apparatus with control of rf bias |
Jul. 24, 2001 |
| 6259209 |
Plasma processing apparatus with coils in dielectric windows |
Jul. 10, 2001 |
| 6254746 |
Recessed coil for generating a plasma |
Jul. 3, 2001 |
| 6254737 |
Active shield for generating a plasma for sputtering |
Jul. 3, 2001 |
| 6253704 |
Apparatus and method for pulsed plasma processing of a semiconductor substrate |
Jul. 3, 2001 |
| 6254738 |
Use of variable impedance having rotating core to control coil sputter distribution |
Jul. 3, 2001 |
| 6251187 |
Gas distribution in deposition chambers |
Jun. 26, 2001 |
| 6252354 |
RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control |
Jun. 26, 2001 |
| 6251241 |
Inductive-coupled plasma apparatus employing shield and method for manufacturing the shield |
Jun. 26, 2001 |
| 6248250 |
RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
Jun. 19, 2001 |
| 6247425 |
Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor |
Jun. 19, 2001 |
| 6248251 |
Apparatus and method for electrostatically shielding an inductively coupled RF plasma source and facilitating ignition of a plasma |
Jun. 19, 2001 |
| 6244210 |
Strength coil for ionized copper plasma deposition |
Jun. 12, 2001 |
| 6245202 |
Plasma treatment device |
Jun. 12, 2001 |
| 6239403 |
Power segmented electrode |
May. 29, 2001 |
| 6237526 |
Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
May. 29, 2001 |
| 6238532 |
Radio-frequency coil for use in an ionized physical vapor deposition apparatus |
May. 29, 2001 |
| 6234219 |
Liner for use in processing chamber |
May. 22, 2001 |
| 6235169 |
Modulated power for ionized metal plasma deposition |
May. 22, 2001 |
| 6230651 |
Gas injection system for plasma processing |
May. 15, 2001 |
| 6229264 |
Plasma processor with coil having variable rf coupling |
May. 8, 2001 |
| 6223686 |
Apparatus for forming a thin film by plasma chemical vapor deposition |
May. 1, 2001 |
| 6225744 |
Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coil |
May. 1, 2001 |
| 6220201 |
High density plasma CVD reactor with combined inductive and capacitive coupling |
Apr. 24, 2001 |
| 6217724 |
Coated platen design for plasma immersion ion implantation |
Apr. 17, 2001 |
| 6217718 |
Method and apparatus for reducing plasma nonuniformity across the surface of a substrate in apparatus for producing an ionized metal plasma |
Apr. 17, 2001 |
| 6217662 |
Susceptor designs for silicon carbide thin films |
Apr. 17, 2001 |
| 6217658 |
Sequencing of the recipe steps for the optimal low-dielectric constant HDP-CVD Processing |
Apr. 17, 2001 |
| 6218640 |
Atmospheric pressure inductive plasma apparatus |
Apr. 17, 2001 |
| 6217785 |
Scavenging fluorine in a planar inductively coupled plasma reactor |
Apr. 17, 2001 |
| 6214162 |
Plasma processing apparatus |
Apr. 10, 2001 |
| 6209480 |
Hermetically-sealed inductively-coupled plasma source structure and method of use |
Apr. 3, 2001 |
| 6210539 |
Method and apparatus for producing a uniform density plasma above a substrate |
Apr. 3, 2001 |
| 6211621 |
Energy transfer microwave plasma source |
Apr. 3, 2001 |
| 6205948 |
Modulator for plasma-immersion ion implantation |
Mar. 27, 2001 |
| 6204607 |
Plasma source with multiple magnetic flux sources each having a ferromagnetic core |
Mar. 20, 2001 |
| 6204604 |
Method and apparatus for controlling electrostatic coupling to plasmas |
Mar. 20, 2001 |
| 6202589 |
Grounding mechanism which maintains a low resistance electrical ground path between a plate electrode and an etch chamber |
Mar. 20, 2001 |
| 6199506 |
Radio frequency supply circuit for in situ cleaning of plasma-enhanced chemical vapor deposition chamber using NF3 or NF3/He mixture |
Mar. 13, 2001 |
| 6199505 |
Plasma processing apparatus |
Mar. 13, 2001 |
| 6200539 |
Paraelectric gas flow accelerator |
Mar. 13, 2001 |
| 6196155 |
Plasma processing apparatus and method of cleaning the apparatus |
Mar. 6, 2001 |
| 6192829 |
Antenna coil assemblies for substrate processing chambers |
Feb. 27, 2001 |
| 6194835 |
Device for producing plasma |
Feb. 27, 2001 |
| 6193836 |
Center gas feed apparatus for a high density plasma reactor |
Feb. 27, 2001 |
| 6192827 |
Double slit-valve doors for plasma processing |
Feb. 27, 2001 |
| 6189484 |
Plasma reactor having a helicon wave high density plasma source |
Feb. 20, 2001 |
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