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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6383334 |
Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
May. 7, 2002 |
| 6374871 |
Liner for use in processing chamber |
Apr. 23, 2002 |
| 6376028 |
Device and method for treating the inside surface of a plastic container with a narrow opening in a plasma enhanced process |
Apr. 23, 2002 |
| 6375744 |
Sequential in-situ heating and deposition of halogen-doped silicon oxide |
Apr. 23, 2002 |
| 6371045 |
Physical vapor deposition device for forming a metallic layer on a semiconductor wafer |
Apr. 16, 2002 |
| 6369349 |
Plasma reactor with coil antenna of interleaved conductors |
Apr. 9, 2002 |
| 6367412 |
Porous ceramic liner for a plasma source |
Apr. 9, 2002 |
| 6367410 |
Closed-loop dome thermal control apparatus for a semiconductor wafer processing system |
Apr. 9, 2002 |
| 6368987 |
Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions |
Apr. 9, 2002 |
| 6368452 |
Plasma treatment apparatus and method of semiconductor processing |
Apr. 9, 2002 |
| 6369348 |
Plasma reactor with coil antenna of plural helical conductors with equally spaced ends |
Apr. 9, 2002 |
| 6364995 |
Dome-shaped inductive coupling wall having a plurality of radii for an inductively coupled plasma reactor |
Apr. 2, 2002 |
| 6364958 |
Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges |
Apr. 2, 2002 |
| 6361644 |
Parallel-plate electrode reactor having an inductive antenna coupling power through a parallel plate electrode |
Mar. 26, 2002 |
| 6353201 |
Discharge electrode, RF plasma generation apparatus using the same, and power supply method |
Mar. 5, 2002 |
| 6352611 |
Ceramic composition for an apparatus and method for processing a substrate |
Mar. 5, 2002 |
| 6350347 |
Plasma processing apparatus |
Feb. 26, 2002 |
| 6348126 |
Externally excited torroidal plasma source |
Feb. 19, 2002 |
| 6345588 |
Use of variable RF generator to control coil voltage distribution |
Feb. 12, 2002 |
| 6346915 |
Plasma processing method and apparatus |
Feb. 12, 2002 |
| 6341574 |
Plasma processing systems |
Jan. 29, 2002 |
| 6340499 |
Method to increase gas residence time in a reactor |
Jan. 22, 2002 |
| 6338313 |
System for the plasma treatment of large area substrates |
Jan. 15, 2002 |
| 6339206 |
Apparatus and method for adjusting density distribution of a plasma |
Jan. 15, 2002 |
| 6331754 |
Inductively-coupled-plasma-processing apparatus |
Dec. 18, 2001 |
| 6323595 |
High frequency discharging method and apparatus, and high frequency processing apparatus |
Nov. 27, 2001 |
| 6323133 |
Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
Nov. 27, 2001 |
| 6321681 |
Method and apparatus to produce large inductive plasma for plasma processing |
Nov. 27, 2001 |
| 6322661 |
Method and apparatus for controlling the volume of a plasma |
Nov. 27, 2001 |
| 6319355 |
Plasma processor with coil responsive to variable amplitude rf envelope |
Nov. 20, 2001 |
| 6320154 |
Plasma processing method |
Nov. 20, 2001 |
| 6312556 |
Beat frequency modulation for plasma generation |
Nov. 6, 2001 |
| 6311638 |
Plasma processing method and apparatus |
Nov. 6, 2001 |
| 6312555 |
Thin film electrostatic shield for inductive plasma processing |
Nov. 6, 2001 |
| 6308654 |
Inductively coupled parallel-plate plasma reactor with a conical dome |
Oct. 30, 2001 |
| 6309978 |
Beat frequency modulation for plasma generation |
Oct. 30, 2001 |
| 6306247 |
Apparatus and method for preventing etch chamber contamination |
Oct. 23, 2001 |
| 6305316 |
Integrated power oscillator RF source of plasma immersion ion implantation system |
Oct. 23, 2001 |
| 6306244 |
Apparatus for reducing polymer deposition on substrate support |
Oct. 23, 2001 |
| 6299725 |
Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor |
Oct. 9, 2001 |
| 6297468 |
Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
Oct. 2, 2001 |
| 6294227 |
Method of forming protective film on plastic part for vehicle-use and apparatus |
Sep. 25, 2001 |
| 6291793 |
Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
Sep. 18, 2001 |
| 6286451 |
Dome: shape and temperature controlled surfaces |
Sep. 11, 2001 |
| 6280563 |
Plasma device including a powered non-magnetic metal member between a plasma AC excitation source and the plasma |
Aug. 28, 2001 |
| 6281469 |
Capacitively coupled RF-plasma reactor |
Aug. 28, 2001 |
| 6276296 |
Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization |
Aug. 21, 2001 |
| 6277235 |
In situ plasma clean gas injection |
Aug. 21, 2001 |
| 6273022 |
Distributed inductively-coupled plasma source |
Aug. 14, 2001 |
| 6270617 |
RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
Aug. 7, 2001 |
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