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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6468388 |
Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate |
Oct. 22, 2002 |
| 6468385 |
Apparatus and method for preventing etch chamber contamination |
Oct. 22, 2002 |
| 6463873 |
High density plasmas |
Oct. 15, 2002 |
| 6463875 |
Multiple coil antenna for inductively-coupled plasma generation systems |
Oct. 15, 2002 |
| 6464843 |
Contamination controlling method and apparatus for a plasma processing chamber |
Oct. 15, 2002 |
| 6465051 |
Method of operating high density plasma CVD reactor with combined inductive and capacitive coupling |
Oct. 15, 2002 |
| 6458239 |
Plasma processing apparatus |
Oct. 1, 2002 |
| 6459066 |
Transmission line based inductively coupled plasma source with stable impedance |
Oct. 1, 2002 |
| 6453842 |
Externally excited torroidal plasma source using a gas distribution plate |
Sep. 24, 2002 |
| 6451161 |
Method and apparatus for generating high-density uniform plasma |
Sep. 17, 2002 |
| 6447637 |
Process chamber having a voltage distribution electrode |
Sep. 10, 2002 |
| 6447636 |
Plasma reactor with dynamic RF inductive and capacitive coupling control |
Sep. 10, 2002 |
| 6444084 |
Low density high frequency process for a parallel-plate electrode plasma reactor having an inductive antenna |
Sep. 3, 2002 |
| 6444085 |
Inductively coupled RF plasma reactor having an antenna adjacent a window electrode |
Sep. 3, 2002 |
| 6441555 |
Plasma excitation coil |
Aug. 27, 2002 |
| 6440260 |
Plasma monitoring method and semiconductor production apparatus |
Aug. 27, 2002 |
| 6440221 |
Process chamber having improved temperature control |
Aug. 27, 2002 |
| 6440220 |
Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation |
Aug. 27, 2002 |
| 6439154 |
Plasma processing apparatus for semiconductors |
Aug. 27, 2002 |
| 6433314 |
Direct temperature control for a component of a substrate processing chamber |
Aug. 13, 2002 |
| 6431113 |
Plasma vacuum substrate treatment process and system |
Aug. 13, 2002 |
| 6432260 |
Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
Aug. 13, 2002 |
| 6425953 |
All-surface biasable and/or temperature-controlled electrostatically-shielded RF plasma source |
Jul. 30, 2002 |
| 6422172 |
Plasma processing apparatus and plasma processing method |
Jul. 23, 2002 |
| 6424091 |
Plasma treatment apparatus and plasma treatment method performed by use of the same apparatus |
Jul. 23, 2002 |
| 6422173 |
Apparatus and methods for actively controlling RF peak-to-peak voltage in an inductively coupled plasma etching system |
Jul. 23, 2002 |
| 6423176 |
Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles |
Jul. 23, 2002 |
| 6423177 |
Apparatus for performing plasma process on particles |
Jul. 23, 2002 |
| 6418874 |
Toroidal plasma source for plasma processing |
Jul. 16, 2002 |
| 6417111 |
Plasma processing apparatus |
Jul. 9, 2002 |
| 6417626 |
Immersed inductively--coupled plasma source |
Jul. 9, 2002 |
| 6413359 |
Plasma reactor with high selectivity and reduced damage |
Jul. 2, 2002 |
| 6414648 |
Plasma reactor having a symmetric parallel conductor coil antenna |
Jul. 2, 2002 |
| 6409877 |
Apparatus and method for plasma etching |
Jun. 25, 2002 |
| 6401652 |
Plasma reactor inductive coil antenna with flat surface facing the plasma |
Jun. 11, 2002 |
| 6402885 |
Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma |
Jun. 11, 2002 |
| 6402886 |
Use of a chemically active reticle carrier for photomask etching |
Jun. 11, 2002 |
| 6397775 |
Deposited film forming system and process |
Jun. 4, 2002 |
| 6394026 |
Low contamination high density plasma etch chambers and methods for making the same |
May. 28, 2002 |
| 6395128 |
RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
May. 28, 2002 |
| 6395641 |
Apparatus and method for pulsed plasma processing of a semiconductor substrate |
May. 28, 2002 |
| 6394025 |
Vacuum film growth apparatus |
May. 28, 2002 |
| 6392351 |
Inductive RF plasma source with external discharge bridge |
May. 21, 2002 |
| 6390019 |
Chamber having improved process monitoring window |
May. 21, 2002 |
| 6391146 |
Erosion resistant gas energizer |
May. 21, 2002 |
| 6391171 |
Flangeless feed through |
May. 21, 2002 |
| 6392187 |
Apparatus and method for utilizing a plasma density gradient to produce a flow of particles |
May. 21, 2002 |
| 6387208 |
Inductive coupling plasma processing apparatus |
May. 14, 2002 |
| 6382129 |
Semiconductor wafer processor, plasma generating apparatus, magnetic field generator, and method of generating a magnetic field |
May. 7, 2002 |
| 6383299 |
Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film |
May. 7, 2002 |
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