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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6570333 |
Method for generating surface plasma |
May. 27, 2003 |
| 6562189 |
Plasma reactor with a tri-magnet plasma confinement apparatus |
May. 13, 2003 |
| 6563076 |
Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor |
May. 13, 2003 |
| 6554953 |
Thin film electrostatic shield for inductive plasma processing |
Apr. 29, 2003 |
| 6554979 |
Method and apparatus for bias deposition in a modulating electric field |
Apr. 29, 2003 |
| 6551447 |
Inductive plasma reactor |
Apr. 22, 2003 |
| 6545420 |
Plasma reactor using inductive RF coupling, and processes |
Apr. 8, 2003 |
| 6541982 |
Plasma density measuring method and apparatus, and plasma processing system using the same |
Apr. 1, 2003 |
| 6531030 |
Inductively coupled plasma etching apparatus |
Mar. 11, 2003 |
| 6531031 |
Plasma etching installation |
Mar. 11, 2003 |
| 6531029 |
Vacuum plasma processor apparatus and method |
Mar. 11, 2003 |
| 6530342 |
Large area plasma source |
Mar. 11, 2003 |
| 6527912 |
Stacked RF excitation coil for inductive plasma processor |
Mar. 4, 2003 |
| 6528751 |
Plasma reactor with overhead RF electrode tuned to the plasma |
Mar. 4, 2003 |
| 6524432 |
Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density |
Feb. 25, 2003 |
| 6523493 |
Ring-shaped high-density plasma source and method |
Feb. 25, 2003 |
| 6518190 |
Plasma reactor with dry clean apparatus and method |
Feb. 11, 2003 |
| 6516742 |
Apparatus for improved low pressure inductively coupled high density plasma reactor |
Feb. 11, 2003 |
| 6516814 |
Method of rapid prevention of particle pollution in pre-clean chambers |
Feb. 11, 2003 |
| 6514376 |
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
Feb. 4, 2003 |
| 6514378 |
Method for improving uniformity and reducing etch rate variation of etching polysilicon |
Feb. 4, 2003 |
| 6511577 |
Reduced impedance chamber |
Jan. 28, 2003 |
| 6509542 |
Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor |
Jan. 21, 2003 |
| 6508198 |
Automatic tuning in a tapped RF transformer inductive source of a plasma reactor for processing a semiconductor wafer |
Jan. 21, 2003 |
| 6508911 |
Diamond coated parts in a plasma reactor |
Jan. 21, 2003 |
| 6504126 |
Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions |
Jan. 7, 2003 |
| 6503368 |
Substrate support having bonded sections and method |
Jan. 7, 2003 |
| 6503367 |
Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma |
Jan. 7, 2003 |
| 6503366 |
Chemical plasma cathode |
Jan. 7, 2003 |
| 6503410 |
Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities |
Jan. 7, 2003 |
| 6500315 |
Method and apparatus for forming a layer on a substrate |
Dec. 31, 2002 |
| 6499424 |
Plasma processing apparatus and method |
Dec. 31, 2002 |
| 6494958 |
Plasma chamber support with coupled electrode |
Dec. 17, 2002 |
| 6494986 |
Externally excited multiple torroidal plasma source |
Dec. 17, 2002 |
| 6495963 |
Inductive coil assembly having multiple coil segments for plasma processing apparatus |
Dec. 17, 2002 |
| 6494998 |
Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma using an internal inductive element |
Dec. 17, 2002 |
| 6492612 |
Plasma apparatus and lower electrode thereof |
Dec. 10, 2002 |
| 6488807 |
Magnetic confinement in a plasma reactor having an RF bias electrode |
Dec. 3, 2002 |
| 6490536 |
Integrated load simulator |
Dec. 3, 2002 |
| 6485605 |
High temperature process chamber having improved heat endurance |
Nov. 26, 2002 |
| 6485572 |
Use of pulsed grounding source in a plasma reactor |
Nov. 26, 2002 |
| 6481368 |
Device and a method for heat treatment of an object in a susceptor |
Nov. 19, 2002 |
| 6481370 |
Plasma processsing apparatus |
Nov. 19, 2002 |
| 6478924 |
Plasma chamber support having dual electrodes |
Nov. 12, 2002 |
| 6474258 |
Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
Nov. 5, 2002 |
| 6474257 |
High density plasma chemical vapor deposition chamber |
Nov. 5, 2002 |
| 6475334 |
Dry etching device and dry etching method |
Nov. 5, 2002 |
| 6475335 |
RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
Nov. 5, 2002 |
| 6471822 |
Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma |
Oct. 29, 2002 |
| 6469448 |
Inductively coupled RF plasma source |
Oct. 22, 2002 |
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