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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6712020 |
Toroidal plasma source for plasma processing |
Mar. 30, 2004 |
| 6707253 |
Matching circuit and plasma processing apparatus |
Mar. 16, 2004 |
| 6705246 |
RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
Mar. 16, 2004 |
| 6706142 |
Systems and methods for enhancing plasma processing of a semiconductor substrate |
Mar. 16, 2004 |
| 6703080 |
Method and apparatus for VHF plasma processing with load mismatch reliability and stability |
Mar. 9, 2004 |
| 6694915 |
Plasma reactor having a symmetrical parallel conductor coil antenna |
Feb. 24, 2004 |
| 6692622 |
Plasma processing apparatus with an electrically conductive wall |
Feb. 17, 2004 |
| 6689220 |
Plasma enhanced pulsed layer deposition |
Feb. 10, 2004 |
| 6685800 |
Apparatus for generating inductively coupled plasma |
Feb. 3, 2004 |
| 6685799 |
Variable efficiency faraday shield |
Feb. 3, 2004 |
| 6685798 |
Plasma reactor having a symmetrical parallel conductor coil antenna |
Feb. 3, 2004 |
| 6682630 |
Uniform gas distribution in large area plasma source |
Jan. 27, 2004 |
| 6673199 |
Shaping a plasma with a magnetic field to control etch rate uniformity |
Jan. 6, 2004 |
| 6673197 |
Chemical plasma cathode |
Jan. 6, 2004 |
| 6673198 |
Semiconductor processing equipment having improved process drift control |
Jan. 6, 2004 |
| 6669807 |
Method for reactive ion etching and apparatus therefor |
Dec. 30, 2003 |
| 6667577 |
Plasma reactor with spoke antenna having a VHF mode with the spokes in phase |
Dec. 23, 2003 |
| 6666982 |
Protection of dielectric window in inductively coupled plasma generation |
Dec. 23, 2003 |
| 6664496 |
Plasma processing system |
Dec. 16, 2003 |
| 6660134 |
Feedthrough overlap coil |
Dec. 9, 2003 |
| 6660127 |
Apparatus for plasma etching at a constant etch rate |
Dec. 9, 2003 |
| 6656283 |
Channelled chamber surface for a semiconductor substrate processing chamber |
Dec. 2, 2003 |
| 6652712 |
Inductive antenna for a plasma reactor producing reduced fluorine dissociation |
Nov. 25, 2003 |
| 6652717 |
Use of variable impedance to control coil sputter distribution |
Nov. 25, 2003 |
| 6646385 |
Plasma excitation coil |
Nov. 11, 2003 |
| 6641698 |
Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow |
Nov. 4, 2003 |
| 6641697 |
Substrate processing using a member comprising an oxide of a group IIIB metal |
Nov. 4, 2003 |
| 6634313 |
High-frequency electrostatically shielded toroidal plasma and radical source |
Oct. 21, 2003 |
| 6632322 |
Switched uniformity control |
Oct. 14, 2003 |
| 6631693 |
Absorptive filter for semiconductor processing systems |
Oct. 14, 2003 |
| 6632324 |
System for the plasma treatment of large area substrates |
Oct. 14, 2003 |
| 6630792 |
High frequency power source, plasma processing apparatus, inspection method for plasma processing apparatus, and plasma processing method |
Oct. 7, 2003 |
| 6623595 |
Wavy and roughened dome in plasma processing reactor |
Sep. 23, 2003 |
| 6623596 |
Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
Sep. 23, 2003 |
| 6620289 |
Method and apparatus for asymmetric gas distribution in a semiconductor wafer processing system |
Sep. 16, 2003 |
| 6617256 |
Method for controlling the temperature of a gas distribution plate in a process reactor |
Sep. 9, 2003 |
| 6613189 |
Apparatus for controlling the temperature of a gas distribution plate in a process reactor |
Sep. 2, 2003 |
| 6610169 |
Semiconductor processing system and method |
Aug. 26, 2003 |
| 6592710 |
Apparatus for controlling the voltage applied to an electrostatic shield used in a plasma generator |
Jul. 15, 2003 |
| 6592707 |
Corrosion-resistant protective coating for an apparatus and method for processing a substrate |
Jul. 15, 2003 |
| 6592709 |
Method and apparatus for plasma processing |
Jul. 15, 2003 |
| 6583572 |
Inductive plasma processor including current sensor for plasma excitation coil |
Jun. 24, 2003 |
| 6583064 |
Low contamination high density plasma etch chambers and methods for making the same |
Jun. 24, 2003 |
| 6579428 |
Arc evaporator, method for driving arc evaporator, and ion plating apparatus |
Jun. 17, 2003 |
| 6580057 |
Enhanced cooling IMP coil support |
Jun. 17, 2003 |
| 6578514 |
Modular device of tubular plasma source |
Jun. 17, 2003 |
| 6578515 |
Film formation apparatus comprising movable gas introduction members |
Jun. 17, 2003 |
| 6579426 |
Use of variable impedance to control coil sputter distribution |
Jun. 17, 2003 |
| 6572732 |
Parallel-plate electrode plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
Jun. 3, 2003 |
| 6568346 |
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply |
May. 27, 2003 |
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