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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6946054 |
Modified transfer function deposition baffles and high density plasma ignition therewith in semiconductor processing |
Sep. 20, 2005 |
| 6936144 |
High frequency plasma source |
Aug. 30, 2005 |
| 6935269 |
Apparatus for treating the surface with neutral particle beams |
Aug. 30, 2005 |
| 6914207 |
Plasma processing method |
Jul. 5, 2005 |
| 6900596 |
Capacitively coupled plasma reactor with uniform radial distribution of plasma |
May. 31, 2005 |
| 6894245 |
Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression |
May. 17, 2005 |
| 6893533 |
Plasma reactor having a symmetric parallel conductor coil antenna |
May. 17, 2005 |
| 6888313 |
Impedance matching network with termination of secondary RF frequencies |
May. 3, 2005 |
| 6887339 |
RF power supply with integrated matching network |
May. 3, 2005 |
| 6885154 |
Discharge plasma processing system |
Apr. 26, 2005 |
| 6885153 |
Plasma processing apparatus and method |
Apr. 26, 2005 |
| 6884635 |
Control of power delivered to a multiple segment inject electrode |
Apr. 26, 2005 |
| 6876155 |
Plasma processor apparatus and method, and antenna |
Apr. 5, 2005 |
| 6875307 |
Method and apparatus for plasma processing |
Apr. 5, 2005 |
| 6872259 |
Method of and apparatus for tunable gas injection in a plasma processing system |
Mar. 29, 2005 |
| 6858112 |
Process depending on plasma discharges sustained by inductive coupling |
Feb. 22, 2005 |
| 6855225 |
Single-tube interlaced inductively coupling plasma source |
Feb. 15, 2005 |
| 6850012 |
Plasma processing apparatus |
Feb. 1, 2005 |
| 6847003 |
Plasma processing apparatus |
Jan. 25, 2005 |
| 6846363 |
Plasma processing apparatus and method |
Jan. 25, 2005 |
| 6841943 |
Plasma processor with electrode simultaneously responsive to plural frequencies |
Jan. 11, 2005 |
| 6842147 |
Method and apparatus for producing uniform processing rates |
Jan. 11, 2005 |
| 6838831 |
Apparatus and methods for generating persistent ionization plasmas |
Jan. 4, 2005 |
| 6835275 |
Reducing deposition of process residues on a surface in a chamber |
Dec. 28, 2004 |
| 6833052 |
Deposition chamber and method for depositing low dielectric constant films |
Dec. 21, 2004 |
| 6833049 |
Apparatus for controlling the temperature of a gas distribution plate in a process reactor |
Dec. 21, 2004 |
| 6833050 |
Apparatus for manufacturing semiconductor device |
Dec. 21, 2004 |
| 6833051 |
Plasma processing apparatus and method |
Dec. 21, 2004 |
| 6825618 |
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply |
Nov. 30, 2004 |
| 6820570 |
Atomic layer deposition reactor |
Nov. 23, 2004 |
| 6818562 |
Method and apparatus for tuning an RF matching network in a plasma enhanced semiconductor wafer processing system |
Nov. 16, 2004 |
| 6819053 |
Hall effect ion source at high current density |
Nov. 16, 2004 |
| 6814838 |
Vacuum treatment chamber and method for treating surfaces |
Nov. 9, 2004 |
| 6812646 |
Method and device for attenuating harmonics in semiconductor plasma processing systems |
Nov. 2, 2004 |
| 6808759 |
Plasma processing method and apparatus |
Oct. 26, 2004 |
| 6802933 |
Apparatus for performing self cleaning method of forming deep trenches in silicon substrates |
Oct. 12, 2004 |
| 6790311 |
Plasma reactor having RF power applicator and a dual-purpose window |
Sep. 14, 2004 |
| 6772710 |
Plasma enhanced chemical vapor deposition apparatus |
Aug. 10, 2004 |
| 6770836 |
Impedance matching circuit for inductively coupled plasma source |
Aug. 3, 2004 |
| 6755935 |
Plasma processing apparatus |
Jun. 29, 2004 |
| 6756737 |
Plasma processing apparatus and method |
Jun. 29, 2004 |
| 6755150 |
Multi-core transformer plasma source |
Jun. 29, 2004 |
| 6749717 |
Device for in-situ cleaning of an inductively-coupled plasma chambers |
Jun. 15, 2004 |
| 6744212 |
Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions |
Jun. 1, 2004 |
| 6740842 |
Radio frequency power source for generating an inductively coupled plasma |
May. 25, 2004 |
| 6737123 |
Silicon-based film formation process, silicon-based film, semiconductor device, and silicon-based film formation system |
May. 18, 2004 |
| 6736931 |
Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
May. 18, 2004 |
| 6727654 |
Plasma processing apparatus |
Apr. 27, 2004 |
| 6726804 |
RF power delivery for plasma processing using modulated power signal |
Apr. 27, 2004 |
| 6719876 |
Internal electrode type plasma processing apparatus and plasma processing method |
Apr. 13, 2004 |
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