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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7323219 |
Apparatus and method for applying diamond-like carbon coatings |
Jan. 29, 2008 |
| 7319295 |
High-frequency power supply structure and plasma CVD device using the same |
Jan. 15, 2008 |
| 7316199 |
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber |
Jan. 8, 2008 |
| 7309961 |
Driving frequency modulation system and method for plasma accelerator |
Dec. 18, 2007 |
| 7285916 |
Multi chamber plasma process system |
Oct. 23, 2007 |
| 7273533 |
Plasma processing system with locally-efficient inductive plasma coupling |
Sep. 25, 2007 |
| 7223321 |
Faraday shield disposed within an inductively coupled plasma etching apparatus |
May. 29, 2007 |
| 7223448 |
Methods for providing uniformity in plasma-assisted material processes |
May. 29, 2007 |
| 7220937 |
Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination |
May. 22, 2007 |
| 7217337 |
Plasma process chamber and system |
May. 15, 2007 |
| 7210424 |
High-density plasma processing apparatus |
May. 1, 2007 |
| 7211708 |
Exhaust processing method, plasma processing method and plasma processing apparatus |
May. 1, 2007 |
| 7205240 |
HDP-CVD multistep gapfill process |
Apr. 17, 2007 |
| 7199328 |
Apparatus and method for plasma processing |
Apr. 3, 2007 |
| 7190119 |
Methods and apparatus for optimizing a substrate in a plasma processing system |
Mar. 13, 2007 |
| 7186943 |
MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression |
Mar. 6, 2007 |
| 7183716 |
Charged particle source and operation thereof |
Feb. 27, 2007 |
| 7176469 |
Negative ion source with external RF antenna |
Feb. 13, 2007 |
| 7163603 |
Plasma source assembly and method of manufacture |
Jan. 16, 2007 |
| 7163602 |
Apparatus for generating planar plasma using concentric coils and ferromagnetic cores |
Jan. 16, 2007 |
| 7156950 |
Gas diffusion plate for use in ICP etcher |
Jan. 2, 2007 |
| 7156047 |
Apparatus for fabricating semiconductor device using plasma |
Jan. 2, 2007 |
| 7150805 |
Plasma process device |
Dec. 19, 2006 |
| 7141757 |
Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent |
Nov. 28, 2006 |
| 7137354 |
Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage |
Nov. 21, 2006 |
| 7135089 |
Method and apparatus for plasma processing |
Nov. 14, 2006 |
| 7132040 |
Matching unit for semiconductor plasma processing apparatus |
Nov. 7, 2006 |
| 7115185 |
Pulsed excitation of inductively coupled plasma sources |
Oct. 3, 2006 |
| 7105075 |
DC power supply utilizing real time estimation of dynamic impedance |
Sep. 12, 2006 |
| 7102292 |
Method and device for removing harmonics in semiconductor plasma processing systems |
Sep. 5, 2006 |
| 7100532 |
Plasma production device and method and RF driver circuit with adjustable duty cycle |
Sep. 5, 2006 |
| 7096819 |
Inductive plasma processor having coil with plural windings and method of controlling plasma density |
Aug. 29, 2006 |
| 7094316 |
Externally excited torroidal plasma source |
Aug. 22, 2006 |
| 7078862 |
Beam source and beam processing apparatus |
Jul. 18, 2006 |
| 7075031 |
Method of and structure for controlling electrode temperature |
Jul. 11, 2006 |
| 7074298 |
High density plasma CVD chamber |
Jul. 11, 2006 |
| 7071442 |
Plasma processing apparatus |
Jul. 4, 2006 |
| 7067761 |
Semiconductor device manufacturing system for etching a semiconductor by plasma discharge |
Jun. 27, 2006 |
| 7067034 |
Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma |
Jun. 27, 2006 |
| 7047903 |
Method and device for plasma CVD |
May. 23, 2006 |
| 7030335 |
Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression |
Apr. 18, 2006 |
| 7025857 |
Plasma treatment apparatus, matching box, impedance matching device, and coupler |
Apr. 11, 2006 |
| 7018506 |
Plasma processing apparatus |
Mar. 28, 2006 |
| 7019253 |
Electrically controlled plasma uniformity in a high density plasma source |
Mar. 28, 2006 |
| RE39020 |
Plasma process apparatus |
Mar. 21, 2006 |
| 7015414 |
Method and apparatus for determining plasma impedance |
Mar. 21, 2006 |
| 7000565 |
Plasma surface treatment system and plasma surface treatment method |
Feb. 21, 2006 |
| 6974771 |
Methods and apparatus for forming barrier layers in high aspect ratio vias |
Dec. 13, 2005 |
| 6969953 |
System and method for inductive coupling of an expanding thermal plasma |
Nov. 29, 2005 |
| 6962644 |
Tandem etch chamber plasma processing system |
Nov. 8, 2005 |
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