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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 4623417 |
Magnetron plasma reactor |
Nov. 18, 1986 |
| 4615298 |
Method of making non-crystalline semiconductor layer |
Oct. 7, 1986 |
| 4523544 |
Apparatus for glow discharge deposition of a thin film |
Jun. 18, 1985 |
| 4487161 |
Semiconductor device manufacturing unit |
Dec. 11, 1984 |
| 4486461 |
Method and apparatus for gas phase treating substrates |
Dec. 4, 1984 |
| 4461783 |
Non-single-crystalline semiconductor layer on a substrate and method of making same |
Jul. 24, 1984 |
| 4454001 |
Interferometric method and apparatus for measuring etch rate and fabricating devices |
Jun. 12, 1984 |
| 4434742 |
Installation for depositing thin layers in the reactive vapor phase |
Mar. 6, 1984 |
| 4433006 |
Process for oxidizing semiconducting compounds, especially gallium arsenide |
Feb. 21, 1984 |
| 4371412 |
Dry etching apparatus |
Feb. 1, 1983 |
| 4329418 |
Organometallic semiconductor devices |
May. 11, 1982 |
| 4320716 |
Ultra-high frequency device for depositing thin films on solids |
Mar. 23, 1982 |
| 4298629 |
Method for forming a nitride insulating film on a silicon semiconductor substrate surface by direct nitridation |
Nov. 3, 1981 |
| 4262035 |
Modified chemical vapor deposition of an optical fiber using an rf plasma |
Apr. 14, 1981 |
| 4233109 |
Dry etching method |
Nov. 11, 1980 |
| 4028155 |
Process and material for manufacturing thin film integrated circuits |
Jun. 7, 1977 |
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