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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5599396 |
High density inductively and capacitively coupled plasma chamber |
Feb. 4, 1997 |
| 5597438 |
Etch chamber having three independently controlled electrodes |
Jan. 28, 1997 |
| 5591493 |
Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber |
Jan. 7, 1997 |
| 5591268 |
Plasma process with radicals |
Jan. 7, 1997 |
| 5587038 |
Apparatus and process for producing high density axially extending plasmas |
Dec. 24, 1996 |
| 5580385 |
Structure and method for incorporating an inductively coupled plasma source in a plasma processing chamber |
Dec. 3, 1996 |
| 5573595 |
Methods and apparatus for generating plasma |
Nov. 12, 1996 |
| 5571366 |
Plasma processing apparatus |
Nov. 5, 1996 |
| 5560776 |
Plasma discharge generating antenna |
Oct. 1, 1996 |
| 5558722 |
Plasma processing apparatus |
Sep. 24, 1996 |
| 5556521 |
Sputter etching apparatus with plasma source having a dielectric pocket and contoured plasma source |
Sep. 17, 1996 |
| 5554223 |
Plasma processing apparatus with a rotating electromagnetic field |
Sep. 10, 1996 |
| 5540800 |
Inductively coupled high density plasma reactor for plasma assisted materials processing |
Jul. 30, 1996 |
| 5540824 |
Plasma reactor with multi-section RF coil and isolated conducting lid |
Jul. 30, 1996 |
| 5531834 |
Plasma film forming method and apparatus and plasma processing apparatus |
Jul. 2, 1996 |
| 5529657 |
Plasma processing apparatus |
Jun. 25, 1996 |
| 5525159 |
Plasma process apparatus |
Jun. 11, 1996 |
| 5513765 |
Plasma generating apparatus and method |
May. 7, 1996 |
| 5505780 |
High-density plasma-processing tool with toroidal magnetic field |
Apr. 9, 1996 |
| 5472508 |
Apparatus for selective chemical vapor deposition of dielectric, semiconductor and conductive films on semiconductor and metallic substrates |
Dec. 5, 1995 |
| 5468296 |
Apparatus for igniting low pressure inductively coupled plasma |
Nov. 21, 1995 |
| 5464476 |
Plasma processing device comprising plural RF inductive coils |
Nov. 7, 1995 |
| 5458732 |
Method and system for identifying process conditions |
Oct. 17, 1995 |
| 5449432 |
Method of treating a workpiece with a plasma and processing reactor having plasma igniter and inductive coupler for semiconductor fabrication |
Sep. 12, 1995 |
| 5435880 |
Plasma processing apparatus |
Jul. 25, 1995 |
| 5433812 |
Apparatus for enhanced inductive coupling to plasmas with reduced sputter contamination |
Jul. 18, 1995 |
| 5401350 |
Coil configurations for improved uniformity in inductively coupled plasma systems |
Mar. 28, 1995 |
| 5368647 |
Photo-excited processing apparatus for manufacturing a semiconductor device that uses a cylindrical reflecting surface |
Nov. 29, 1994 |
| 5346578 |
Induction plasma source |
Sep. 13, 1994 |
| 5332441 |
Apparatus for gettering of particles during plasma processing |
Jul. 26, 1994 |
| 5324360 |
Method for producing non-monocrystalline semiconductor device and apparatus therefor |
Jun. 28, 1994 |
| 5304279 |
Radio frequency induction/multipole plasma processing tool |
Apr. 19, 1994 |
| 5288329 |
Chemical vapor deposition apparatus of in-line type |
Feb. 22, 1994 |
| 5284544 |
Apparatus for and method of surface treatment for microelectronic devices |
Feb. 8, 1994 |
| 5281274 |
Atomic layer epitaxy (ALE) apparatus for growing thin films of elemental semiconductors |
Jan. 25, 1994 |
| 5279669 |
Plasma reactor for processing substrates comprising means for inducing electron cyclotron resonance (ECR) and ion cyclotron resonance (ICR) conditions |
Jan. 18, 1994 |
| 5277751 |
Method and apparatus for producing low pressure planar plasma using a coil with its axis parallel to the surface of a coupling window |
Jan. 11, 1994 |
| 5261962 |
Plasma-chemical vapor-phase epitaxy system comprising a planar antenna |
Nov. 16, 1993 |
| 5250137 |
Plasma treating apparatus |
Oct. 5, 1993 |
| 5248370 |
Apparatus for heating and cooling semiconductor wafers in semiconductor wafer processing equipment |
Sep. 28, 1993 |
| 5234527 |
Liquid level detecting device and a processing apparatus |
Aug. 10, 1993 |
| 5234529 |
Plasma generating apparatus employing capacitive shielding and process for using such apparatus |
Aug. 10, 1993 |
| 5226967 |
Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber |
Jul. 13, 1993 |
| 5121706 |
Apparatus for applying a composite insulative coating to a substrate |
Jun. 16, 1992 |
| 4948458 |
Method and apparatus for producing magnetically-coupled planar plasma |
Aug. 14, 1990 |
| 4915807 |
Method and apparatus for processing a semiconductor wafer |
Apr. 10, 1990 |
| 4795880 |
Low pressure chemical vapor deposition furnace plasma clean apparatus |
Jan. 3, 1989 |
| H566 |
Apparatus and process for deposition of hard carbon films |
Jan. 3, 1989 |
| 4729341 |
Method and apparatus for making electrophotographic devices |
Mar. 8, 1988 |
| 4686113 |
Plasma confinement in a low pressure electrically grounded R.F. heated reactor and deposition method |
Aug. 11, 1987 |
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