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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5863376 |
Temperature controlling method and apparatus for a plasma processing chamber |
Jan. 26, 1999 |
| 5858100 |
Substrate holder and reaction apparatus |
Jan. 12, 1999 |
| 5855685 |
Plasma enhanced CVD apparatus, plasma enhanced processing apparatus and plasma enhanced CVD method |
Jan. 5, 1999 |
| 5851600 |
Plasma process method and apparatus |
Dec. 22, 1998 |
| 5846331 |
Plasma processing apparatus |
Dec. 8, 1998 |
| 5837093 |
Apparatus for performing plain etching treatment |
Nov. 17, 1998 |
| 5833752 |
Manifold system |
Nov. 10, 1998 |
| 5824605 |
Gas dispersion window for plasma apparatus and method of use thereof |
Oct. 20, 1998 |
| 5824158 |
Chemical vapor deposition using inductively coupled plasma and system therefor |
Oct. 20, 1998 |
| 5824602 |
Helicon wave excitation to produce energetic electrons for manufacturing semiconductors |
Oct. 20, 1998 |
| 5820947 |
Plasma processing method and apparatus |
Oct. 13, 1998 |
| 5810932 |
Plasma generating apparatus used for fabrication of semiconductor device |
Sep. 22, 1998 |
| 5811022 |
Inductive plasma reactor |
Sep. 22, 1998 |
| 5804027 |
Apparatus for generating and utilizing magnetically neutral line discharge type plasma |
Sep. 8, 1998 |
| 5800621 |
Plasma source for HDP-CVD chamber |
Sep. 1, 1998 |
| 5800620 |
Plasma treatment apparatus |
Sep. 1, 1998 |
| 5800619 |
Vacuum plasma processor having coil with minimum magnetic field in its center |
Sep. 1, 1998 |
| 5795429 |
Plasma processing apparatus |
Aug. 18, 1998 |
| 5792272 |
Plasma enhanced chemical processing reactor and method |
Aug. 11, 1998 |
| 5792261 |
Plasma process apparatus |
Aug. 11, 1998 |
| 5785878 |
RF antenna having high temperature, oxidation resistant coating |
Jul. 28, 1998 |
| 5779849 |
Plasma reactors and method of cleaning a plasma reactor |
Jul. 14, 1998 |
| 5772771 |
Deposition chamber for improved deposition thickness uniformity |
Jun. 30, 1998 |
| 5767628 |
Helicon plasma processing tool utilizing a ferromagnetic induction coil with an internal cooling channel |
Jun. 16, 1998 |
| 5762750 |
Magnetic neutral line discharged plasma type surface cleaning apparatus |
Jun. 9, 1998 |
| 5759280 |
Inductively coupled source for deriving substantially uniform plasma flux |
Jun. 2, 1998 |
| 5753044 |
RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
May. 19, 1998 |
| 5753320 |
Process for forming deposited film |
May. 19, 1998 |
| 5735960 |
Apparatus and method to increase gas residence time in a reactor |
Apr. 7, 1998 |
| 5720846 |
Construction of a chamber casing in a plasma etching system |
Feb. 24, 1998 |
| 5716451 |
Plasma processing apparatus |
Feb. 10, 1998 |
| 5707692 |
Apparatus and method for processing a base substance using plasma and a magnetic field |
Jan. 13, 1998 |
| 5690781 |
Plasma processing apparatus for manufacture of semiconductor devices |
Nov. 25, 1997 |
| 5686796 |
Ion implantation helicon plasma source with magnetic dipoles |
Nov. 11, 1997 |
| 5685941 |
Inductively coupled plasma reactor with top electrode for enhancing plasma ignition |
Nov. 11, 1997 |
| 5683537 |
Plasma processing apparatus |
Nov. 4, 1997 |
| 5683548 |
Inductively coupled plasma reactor and process |
Nov. 4, 1997 |
| 5681393 |
Plasma processing apparatus |
Oct. 28, 1997 |
| 5669975 |
Plasma producing method and apparatus including an inductively-coupled plasma source |
Sep. 23, 1997 |
| 5670218 |
Method for forming ferroelectric thin film and apparatus therefor |
Sep. 23, 1997 |
| 5665167 |
Plasma treatment apparatus having a workpiece-side electrode grounding circuit |
Sep. 9, 1997 |
| 5653811 |
System for the plasma treatment of large area substrates |
Aug. 5, 1997 |
| 5650032 |
Apparatus for producing an inductive plasma for plasma processes |
Jul. 22, 1997 |
| 5647911 |
Gas diffuser plate assembly and RF electrode |
Jul. 15, 1997 |
| 5647913 |
Plasma reactors |
Jul. 15, 1997 |
| 5643364 |
Plasma chamber with fixed RF matching |
Jul. 1, 1997 |
| 5630880 |
Method and apparatus for a large volume plasma processor that can utilize any feedstock material |
May. 20, 1997 |
| 5620523 |
Apparatus for forming film |
Apr. 15, 1997 |
| 5614055 |
High density plasma CVD and etching reactor |
Mar. 25, 1997 |
| 5607542 |
Inductively enhanced reactive ion etching |
Mar. 4, 1997 |
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