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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6007675 |
Wafer transfer system and method of using the same |
Dec. 28, 1999 |
| 6000360 |
Plasma processing apparatus |
Dec. 14, 1999 |
| 5998933 |
RF plasma inductor with closed ferrite core |
Dec. 7, 1999 |
| 5998931 |
Method and apparatus for controlling electrostatic coupling to plasmas |
Dec. 7, 1999 |
| 5993594 |
Particle controlling method and apparatus for a plasma processing chamber |
Nov. 30, 1999 |
| 5993678 |
Device and method for processing a plasma to alter the surface of a substrate |
Nov. 30, 1999 |
| 5983828 |
Apparatus and method for pulsed plasma processing of a semiconductor substrate |
Nov. 16, 1999 |
| 5980688 |
Plasma reactors and method of cleaning a plasma reactor |
Nov. 9, 1999 |
| 5976993 |
Method for reducing the intrinsic stress of high density plasma films |
Nov. 2, 1999 |
| 5975013 |
Vacuum plasma processor having coil with small magnetic field in its center |
Nov. 2, 1999 |
| 5976308 |
High density plasma CVD and etching reactor |
Nov. 2, 1999 |
| 5968379 |
High temperature ceramic heater assembly with RF capability and related methods |
Oct. 19, 1999 |
| 5968276 |
Heat exchange passage connection |
Oct. 19, 1999 |
| 5964949 |
ICP reactor having a conically-shaped plasma-generating section |
Oct. 12, 1999 |
| 5965034 |
High frequency plasma process wherein the plasma is executed by an inductive structure in which the phase and anti-phase portion of the capacitive currents between the inductive structure and |
Oct. 12, 1999 |
| 5961850 |
Plasma processing method and apparatus |
Oct. 5, 1999 |
| 5951773 |
Inductively coupled plasma chemical vapor deposition apparatus |
Sep. 14, 1999 |
| 5948168 |
Distributed microwave plasma reactor for semiconductor processing |
Sep. 7, 1999 |
| 5944940 |
Wafer transfer system and method of using the same |
Aug. 31, 1999 |
| 5944902 |
Plasma source for HDP-CVD chamber |
Aug. 31, 1999 |
| 5944899 |
Inductively coupled plasma processing chamber |
Aug. 31, 1999 |
| 5944942 |
Varying multipole plasma source |
Aug. 31, 1999 |
| 5945012 |
Tumbling barrel plasma processor |
Aug. 31, 1999 |
| 5942855 |
Monolithic miniaturized inductively coupled plasma source |
Aug. 24, 1999 |
| 5942042 |
Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system |
Aug. 24, 1999 |
| 5942039 |
Self-cleaning focus ring |
Aug. 24, 1999 |
| 5938883 |
Plasma processing apparatus |
Aug. 17, 1999 |
| 5936352 |
Plasma processing apparatus for producing plasma at low electron temperatures |
Aug. 10, 1999 |
| 5935373 |
Plasma processing apparatus |
Aug. 10, 1999 |
| 5935336 |
Apparatus to increase gas residence time in a reactor |
Aug. 10, 1999 |
| 5922223 |
Plasma processing method and apparatus |
Jul. 13, 1999 |
| 5919382 |
Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor |
Jul. 6, 1999 |
| 5916455 |
Method and apparatus for generating a low pressure plasma |
Jun. 29, 1999 |
| 5916454 |
Methods and apparatus for reducing byproduct particle generation in a plasma processing chamber |
Jun. 29, 1999 |
| 5908508 |
Gas diffuser plate assembly and RF electrode |
Jun. 1, 1999 |
| 5900699 |
Plasma generator with a shield interposing the antenna |
May. 4, 1999 |
| 5900105 |
Wafer transfer system and method of using the same |
May. 4, 1999 |
| 5897712 |
Plasma uniformity control for an inductive plasma source |
Apr. 27, 1999 |
| 5897713 |
Plasma generating apparatus |
Apr. 27, 1999 |
| 5891252 |
Plasma processing apparatus |
Apr. 6, 1999 |
| 5891348 |
Process gas focusing apparatus and method |
Apr. 6, 1999 |
| 5891349 |
Plasma enhanced CVD apparatus and process, and dry etching apparatus and process |
Apr. 6, 1999 |
| 5888413 |
Plasma processing method and apparatus |
Mar. 30, 1999 |
| 5885358 |
Gas injection slit nozzle for a plasma process reactor |
Mar. 23, 1999 |
| 5883016 |
Apparatus and method for hydrogenating polysilicon thin film transistors by plasma immersion ion implantation |
Mar. 16, 1999 |
| 5879575 |
Self-cleaning plasma processing reactor |
Mar. 9, 1999 |
| 5874014 |
Durable plasma treatment apparatus and method |
Feb. 23, 1999 |
| 5874704 |
Low inductance large area coil for an inductively coupled plasma source |
Feb. 23, 1999 |
| 5868897 |
Device and method for processing a plasma to alter the surface of a substrate using neutrals |
Feb. 9, 1999 |
| 5865896 |
High density plasma CVD reactor with combined inductive and capacitive coupling |
Feb. 2, 1999 |
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