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Class Information
Number: 118/723I
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Radio frequency antenna or radio frequency inductive coil discharge means
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6098568 |
Mixed frequency CVD apparatus |
Aug. 8, 2000 |
| 6095159 |
Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities |
Aug. 1, 2000 |
| 6096160 |
Helicon wave plasma processing apparatus |
Aug. 1, 2000 |
| 6097157 |
System for ion energy control during plasma processing |
Aug. 1, 2000 |
| 6095083 |
Vacuum processing chamber having multi-mode access |
Aug. 1, 2000 |
| 6093281 |
Baffle plate design for decreasing conductance lost during precipitation of polymer precursors in plasma etching chambers |
Jul. 25, 2000 |
| 6090303 |
Process for etching oxides in an electromagnetically coupled planar plasma apparatus |
Jul. 18, 2000 |
| 6090167 |
Method and apparatus for improving film stability of halogen-doped silicon oxide films |
Jul. 18, 2000 |
| 6089182 |
Plasma processing apparatus |
Jul. 18, 2000 |
| 6085688 |
Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor |
Jul. 11, 2000 |
| 6085689 |
Apparatus to increase gas residence time in a reactor |
Jul. 11, 2000 |
| 6087778 |
Scalable helicon wave plasma processing device with a non-cylindrical source chamber having a serpentine antenna |
Jul. 11, 2000 |
| 6080271 |
Plasma source for generating inductively coupled, plate-shaped plasma, having magnetically permeable core |
Jun. 27, 2000 |
| 6079357 |
Plasma processing apparatus |
Jun. 27, 2000 |
| 6076482 |
Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion |
Jun. 20, 2000 |
| 6077384 |
Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
Jun. 20, 2000 |
| 6074512 |
Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
Jun. 13, 2000 |
| 6074516 |
High sputter, etch resistant window for plasma processing chambers |
Jun. 13, 2000 |
| 6073578 |
RF induction plasma source generating apparatus |
Jun. 13, 2000 |
| 6071372 |
RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls |
Jun. 6, 2000 |
| 6070550 |
Apparatus for the stabilization of halogen-doped films through the use of multiple sealing layers |
Jun. 6, 2000 |
| 6070551 |
Deposition chamber and method for depositing low dielectric constant films |
Jun. 6, 2000 |
| 6068784 |
Process used in an RF coupled plasma reactor |
May. 30, 2000 |
| 6063233 |
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
May. 16, 2000 |
| 6062163 |
Plasma initiating assembly |
May. 16, 2000 |
| 6056848 |
Thin film electrostatic shield for inductive plasma processing |
May. 2, 2000 |
| 6055927 |
Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology |
May. 2, 2000 |
| 6054013 |
Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density |
Apr. 25, 2000 |
| 6051286 |
High temperature, high deposition rate process and apparatus for depositing titanium layers |
Apr. 18, 2000 |
| 6051151 |
Apparatus and method of producing a negative ion plasma |
Apr. 18, 2000 |
| 6051120 |
Thin film forming apparatus |
Apr. 18, 2000 |
| 6042687 |
Method and apparatus for improving etch and deposition uniformity in plasma semiconductor processing |
Mar. 28, 2000 |
| 6041735 |
Inductively coupled plasma powder vaporization for fabricating integrated circuits |
Mar. 28, 2000 |
| 6033585 |
Method and apparatus for preventing lightup of gas distribution holes |
Mar. 7, 2000 |
| 6030667 |
Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma |
Feb. 29, 2000 |
| 6030486 |
Magnetically confined plasma reactor for processing a semiconductor wafer |
Feb. 29, 2000 |
| 6028286 |
Method for igniting a plasma inside a plasma processing reactor |
Feb. 22, 2000 |
| 6027603 |
Inductively coupled planar source for substantially uniform plasma flux |
Feb. 22, 2000 |
| 6027606 |
Center gas feed apparatus for a high density plasma reactor |
Feb. 22, 2000 |
| 6028285 |
High density plasma source for semiconductor processing |
Feb. 22, 2000 |
| 6028395 |
Vacuum plasma processor having coil with added conducting segments to its peripheral part |
Feb. 22, 2000 |
| 6027601 |
Automatic frequency tuning of an RF plasma source of an inductively coupled plasma reactor |
Feb. 22, 2000 |
| 6024826 |
Plasma reactor with heated source of a polymer-hardening precursor material |
Feb. 15, 2000 |
| 6024827 |
Plasma processing apparatus |
Feb. 15, 2000 |
| 6023038 |
Resistive heating of powered coil to reduce transient heating/start up effects multiple loadlock system |
Feb. 8, 2000 |
| 6022460 |
Enhanced inductively coupled plasma reactor |
Feb. 8, 2000 |
| 6016765 |
Plasma processing apparatus |
Jan. 25, 2000 |
| 6015476 |
Plasma reactor magnet with independently controllable parallel axial current-carrying elements |
Jan. 18, 2000 |
| 6013155 |
Gas injection system for plasma processing |
Jan. 11, 2000 |
| 6006694 |
Plasma reactor with a deposition shield |
Dec. 28, 1999 |
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