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Class Information
Number: 118/723HC
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Hot cathode means for thermionic emission of electrons (e.g., tungsten filament, etc.)
Description:
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7531816 |
Vacuum conveying apparatus and charged particle beam equipment with the same |
May. 12, 2009 |
| 7338581 |
Sputtering apparatus |
Mar. 4, 2008 |
| 7211152 |
Heating element CVD system and connection structure between heating element and electric power supply mechanism in the heating element CVD system |
May. 1, 2007 |
| 7185602 |
Ion implantation ion source, system and method |
Mar. 6, 2007 |
| 7165506 |
Method and device for plasma-treating the surface of substrates by ion bombardment |
Jan. 23, 2007 |
| 7042145 |
Electron beam projector provided with a linear thermionic emitting cathode for electron beam heating |
May. 9, 2006 |
| 7005047 |
Film deposition apparatus and film deposition method |
Feb. 28, 2006 |
| 6981465 |
Chemical vapor deposition process and apparatus thereof |
Jan. 3, 2006 |
| 6942892 |
Hot element CVD apparatus and a method for removing a deposited film |
Sep. 13, 2005 |
| 6918352 |
Method for producing coated workpieces, uses and installation for the method |
Jul. 19, 2005 |
| 6875326 |
Plasma processing apparatus with real-time particle filter |
Apr. 5, 2005 |
| 6772710 |
Plasma enhanced chemical vapor deposition apparatus |
Aug. 10, 2004 |
| 6755151 |
Hot-filament chemical vapor deposition chamber and process with multiple gas inlets |
Jun. 29, 2004 |
| 6708645 |
Arc resistant high voltage feedthru fitting for a vacuum deposition chamber |
Mar. 23, 2004 |
| 6699525 |
Method of forming carbon nanotubes and apparatus therefor |
Mar. 2, 2004 |
| 6692574 |
Gas dispersion apparatus for use in a hot filament chemical vapor deposition chamber |
Feb. 17, 2004 |
| 6673392 |
Method of vertically aligning carbon nanotubes on substrates at low pressure using thermal chemical vapor deposition with DC bias |
Jan. 6, 2004 |
| 6638403 |
Plasma processing apparatus with real-time particle filter |
Oct. 28, 2003 |
| 6633133 |
Ion source |
Oct. 14, 2003 |
| 6548946 |
Electron beam generator |
Apr. 15, 2003 |
| 6539890 |
Multiple source deposition plasma apparatus |
Apr. 1, 2003 |
| 6432206 |
Heating element for use in a hot filament chemical vapor deposition chamber |
Aug. 13, 2002 |
| 6427622 |
Hot wire chemical vapor deposition method and apparatus using graphite hot rods |
Aug. 6, 2002 |
| 6368678 |
Plasma processing system and method |
Apr. 9, 2002 |
| 6349669 |
Method and apparatus for depositing a thin film, and semiconductor device having a semiconductor-insulator junction |
Feb. 26, 2002 |
| 6325857 |
CVD apparatus |
Dec. 4, 2001 |
| 6211622 |
Plasma processing equipment |
Apr. 3, 2001 |
| 6203862 |
Processing systems with dual ion sources |
Mar. 20, 2001 |
| 6146462 |
Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same |
Nov. 14, 2000 |
| 6110540 |
Plasma apparatus and method |
Aug. 29, 2000 |
| 6101972 |
Plasma processing system and method |
Aug. 15, 2000 |
| 6026763 |
Thin-film deposition apparatus using cathodic arc discharge |
Feb. 22, 2000 |
| 6021738 |
Carriage electrode contact system used in coating objects by vacuum deposit |
Feb. 8, 2000 |
| 5968276 |
Heat exchange passage connection |
Oct. 19, 1999 |
| 5942854 |
Electron-beam excited plasma generator with side orifices in the discharge chamber |
Aug. 24, 1999 |
| 5900065 |
Apparatus for the plasma-chemical deposition of polycrystalline diamond |
May. 4, 1999 |
| 5879450 |
Method of heteroepitaxial growth of beta silicon carbide on silicon |
Mar. 9, 1999 |
| 5833753 |
Reactor having an array of heating filaments and a filament force regulator |
Nov. 10, 1998 |
| 5753045 |
Vacuum treatment system for homogeneous workpiece processing |
May. 19, 1998 |
| 5693173 |
Thermal gas cracking source technology |
Dec. 2, 1997 |
| 5677012 |
Plasma processing method and plasma processing apparatus |
Oct. 14, 1997 |
| 5662741 |
Process for the ionization of thermally generated material vapors and a device for conducting the process |
Sep. 2, 1997 |
| 5656141 |
Apparatus for coating substrates |
Aug. 12, 1997 |
| 5601654 |
Flow-through ion beam source |
Feb. 11, 1997 |
| 5580386 |
Coating a substrate surface with a permeation barrier |
Dec. 3, 1996 |
| 5573596 |
Arc suppression in a plasma processing system |
Nov. 12, 1996 |
| 5571332 |
Electron jet vapor deposition system |
Nov. 5, 1996 |
| 5554222 |
Ionization deposition apparatus |
Sep. 10, 1996 |
| 5498290 |
Confinement of secondary electrons in plasma ion processing |
Mar. 12, 1996 |
| 5476693 |
Method for the deposition of diamond film by high density direct current glow discharge |
Dec. 19, 1995 |
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