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Class Information
Number: 118/723FI
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Focusing means for ion beam coating material or focused ion beam gas energizing means (i.e., excluding ion plating or ion implanting)
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7569995 |
Apparatus for magnetic and electrostatic confinement of plasma |
Aug. 4, 2009 |
| 7513215 |
Systems and methods for the production of highly tetrahedral amorphous carbon coatings |
Apr. 7, 2009 |
| 7442946 |
Nonuniform ion implantation apparatus and method using a wide beam |
Oct. 28, 2008 |
| 7439678 |
Magnetic and electrostatic confinement of plasma with tuning of electrostatic field |
Oct. 21, 2008 |
| 7419546 |
Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof |
Sep. 2, 2008 |
| 7389580 |
Method and apparatus for thin-film battery having ultra-thin electrolyte |
Jun. 24, 2008 |
| 7241360 |
Method and apparatus for neutralization of ion beam using AC ion source |
Jul. 10, 2007 |
| 7194801 |
Thin-film battery having ultra-thin electrolyte and associated method |
Mar. 27, 2007 |
| 7180242 |
Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma |
Feb. 20, 2007 |
| 7171918 |
Focused ion beam deposition |
Feb. 6, 2007 |
| 7126284 |
Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma |
Oct. 24, 2006 |
| 7119491 |
Magnetic and electrostatic confinement of plasma with tuning of electrostatic field |
Oct. 10, 2006 |
| 7109487 |
Particle beam device |
Sep. 19, 2006 |
| 7094312 |
Focused particle beam systems and methods using a tilt column |
Aug. 22, 2006 |
| 7026763 |
Apparatus for magnetic and electrostatic confinement of plasma |
Apr. 11, 2006 |
| 7023128 |
Dipole ion source |
Apr. 4, 2006 |
| 7015646 |
Magnetic and electrostatic confinement of plasma with tuning of electrostatic field |
Mar. 21, 2006 |
| 6995515 |
Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma |
Feb. 7, 2006 |
| 6988463 |
Ion beam source with gas introduced directly into deposition/vacuum chamber |
Jan. 24, 2006 |
| 6957624 |
Apparatus and a method for forming an alloy layer over a substrate |
Oct. 25, 2005 |
| 6911779 |
Magnetic mirror plasma source |
Jun. 28, 2005 |
| 6874443 |
Layer-by-layer etching apparatus using neutral beam and etching method using the same |
Apr. 5, 2005 |
| 6799531 |
Method for making films utilizing a pulsed laser for ion injection and deposition |
Oct. 5, 2004 |
| 6733590 |
Method and apparatus for multilayer deposition utilizing a common beam source |
May. 11, 2004 |
| 6669824 |
Dual-scan thin film processing system |
Dec. 30, 2003 |
| 6664740 |
Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma |
Dec. 16, 2003 |
| 6663747 |
Apparatus and method for enhancing the uniform etching capability of an ion beam grid |
Dec. 16, 2003 |
| 6653792 |
Ion implanting system |
Nov. 25, 2003 |
| 6645301 |
Ion source |
Nov. 11, 2003 |
| 6533908 |
Device and method for coating substrates in a vacuum utilizing an absorber electrode |
Mar. 18, 2003 |
| 6526909 |
Biased ion beam deposition of high density carbon |
Mar. 4, 2003 |
| 6497194 |
Focused particle beam systems and methods using a tilt column |
Dec. 24, 2002 |
| 6467426 |
Photomask correction device |
Oct. 22, 2002 |
| 6394025 |
Vacuum film growth apparatus |
May. 28, 2002 |
| 6365905 |
Focused ion beam processing apparatus |
Apr. 2, 2002 |
| 6331227 |
Enhanced etching/smoothing of dielectric surfaces |
Dec. 18, 2001 |
| 6319326 |
Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
Nov. 20, 2001 |
| 6294479 |
Film forming method and apparatus |
Sep. 25, 2001 |
| 6286453 |
Shield design for IBC deposition |
Sep. 11, 2001 |
| 6258173 |
Film forming apparatus for forming a crystalline silicon film |
Jul. 10, 2001 |
| 6251218 |
Ion beam processing apparatus |
Jun. 26, 2001 |
| 6220204 |
Film deposition method for forming copper film |
Apr. 24, 2001 |
| 6209481 |
Sequential ion implantation and deposition (SIID) system |
Apr. 3, 2001 |
| 6182605 |
Apparatus for particle beam induced modification of a specimen |
Feb. 6, 2001 |
| 6180049 |
Layer manufacturing using focused chemical vapor deposition |
Jan. 30, 2001 |
| 6146462 |
Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same |
Nov. 14, 2000 |
| 6136387 |
Ion flow forming method and apparatus |
Oct. 24, 2000 |
| 6132805 |
Shutter for thin-film processing equipment |
Oct. 17, 2000 |
| 6125789 |
Increasing the sensitivity of an in-situ particle monitor |
Oct. 3, 2000 |
| 6126790 |
Method of magnetically orienting thin magnetic films with a multiple-coil electromagnet |
Oct. 3, 2000 |
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