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Class Information
Number: 118/723FI
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Focusing means for ion beam coating material or focused ion beam gas energizing means (i.e., excluding ion plating or ion implanting)
Description:










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8664561 System and method for selectively controlling ion composition of ion sources Mar. 4, 2014
8658004 Vapor-barrier vacuum isolation system Feb. 25, 2014
8601978 Substrate processing apparatus, and magnetic recording medium manufacturing method Dec. 10, 2013
8603244 Vapor deposition device Dec. 10, 2013
8530006 Localized plasma processing Sep. 10, 2013
8319196 Technique for low-temperature ion implantation Nov. 27, 2012
8281740 Substrate processing apparatus, and magnetic recording medium manufacturing method Oct. 9, 2012
8251013 Vapor deposition device Aug. 28, 2012
8252115 System and method for growing nanotubes with a specified isotope composition via ion implantation using a catalytic transmembrane Aug. 28, 2012
8237136 Method and system for tilting a substrate during gas cluster ion beam processing Aug. 7, 2012
8142607 High density helicon plasma source for wide ribbon ion beam generation Mar. 27, 2012
8134287 Low voltage closed drift anode layer ion source Mar. 13, 2012
8092605 Magnetic confinement of a plasma Jan. 10, 2012
8087379 Localized plasma processing Jan. 3, 2012
7947129 Ion source apparatus and cleaning optimized method thereof May. 24, 2011
7935942 Technique for low-temperature ion implantation May. 3, 2011
7932678 Magnetic mirror plasma source and method using same Apr. 26, 2011
7905199 Method and system for directional growth using a gas cluster ion beam Mar. 15, 2011
7820460 Patterned assembly for manufacturing a solar cell and a method thereof Oct. 26, 2010
7807961 Techniques for ion implantation of molecular ions Oct. 5, 2010
7803255 Device for plasma-activated vapor coating of large surfaces Sep. 28, 2010
7741621 Apparatus and method for focused electric field enhanced plasma-based ion implantation Jun. 22, 2010
7718222 Apparatus and method for high rate uniform coating, including non-line of sight May. 18, 2010
7695590 Chemical vapor deposition plasma reactor having plural ion shower grids Apr. 13, 2010
7667212 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor Feb. 23, 2010
7569995 Apparatus for magnetic and electrostatic confinement of plasma Aug. 4, 2009
7513215 Systems and methods for the production of highly tetrahedral amorphous carbon coatings Apr. 7, 2009
7442946 Nonuniform ion implantation apparatus and method using a wide beam Oct. 28, 2008
7439678 Magnetic and electrostatic confinement of plasma with tuning of electrostatic field Oct. 21, 2008
7419546 Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof Sep. 2, 2008
7389580 Method and apparatus for thin-film battery having ultra-thin electrolyte Jun. 24, 2008
7241360 Method and apparatus for neutralization of ion beam using AC ion source Jul. 10, 2007
7194801 Thin-film battery having ultra-thin electrolyte and associated method Mar. 27, 2007
7180242 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma Feb. 20, 2007
7171918 Focused ion beam deposition Feb. 6, 2007
7126284 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma Oct. 24, 2006
7119491 Magnetic and electrostatic confinement of plasma with tuning of electrostatic field Oct. 10, 2006
7109487 Particle beam device Sep. 19, 2006
7094312 Focused particle beam systems and methods using a tilt column Aug. 22, 2006
7026763 Apparatus for magnetic and electrostatic confinement of plasma Apr. 11, 2006
7023128 Dipole ion source Apr. 4, 2006
7015646 Magnetic and electrostatic confinement of plasma with tuning of electrostatic field Mar. 21, 2006
6995515 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma Feb. 7, 2006
6988463 Ion beam source with gas introduced directly into deposition/vacuum chamber Jan. 24, 2006
6957624 Apparatus and a method for forming an alloy layer over a substrate Oct. 25, 2005
6911779 Magnetic mirror plasma source Jun. 28, 2005
6874443 Layer-by-layer etching apparatus using neutral beam and etching method using the same Apr. 5, 2005
6799531 Method for making films utilizing a pulsed laser for ion injection and deposition Oct. 5, 2004
6733590 Method and apparatus for multilayer deposition utilizing a common beam source May. 11, 2004
6669824 Dual-scan thin film processing system Dec. 30, 2003

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