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Class Information
Number: 118/723E
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Having glow discharge electrodes (e.g., dc, ac, rf, etc.)
Description:


Sub-classes under this class:

Class Number Class Name Patents
118/723ER Producing energized gas remotely located from substrate 184


Patents under this class:

Patent Number Title Of Patent Date Issued
7444955 Apparatus for directing plasma flow to coat internal passageways Nov. 4, 2008
7442273 Apparatus using hybrid coupled plasma Oct. 28, 2008
7441513 Plasma-generated coating apparatus for medical devices and a method of coating deposition Oct. 28, 2008
7438783 Plasma processing apparatus and plasma processing method Oct. 21, 2008
7438765 Adjustable shielding plate for adjusting an etching area of a semiconductor wafer and related apparatus and methods Oct. 21, 2008
7430986 Plasma confinement ring assemblies having reduced polymer deposition characteristics Oct. 7, 2008
7426900 Integrated electrostatic inductive coupling for plasma processing Sep. 23, 2008
7422654 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor Sep. 9, 2008
7421974 Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus Sep. 9, 2008
7418921 Plasma CVD apparatus for forming uniform film Sep. 2, 2008
7415940 Plasma processor Aug. 26, 2008
7411352 Dual plasma beam sources and method Aug. 12, 2008
7404874 Method and apparatus for treating wafer edge region with toroidal plasma Jul. 29, 2008
7399364 Hermetic cap layers formed on low-.kappa. films by plasma enhanced chemical vapor deposition Jul. 15, 2008
7393432 RF ground switch for plasma processing system Jul. 1, 2008
7389741 Apparatus of fabricating a display device Jun. 24, 2008
7387081 Plasma reactor including helical electrodes Jun. 17, 2008
7381661 Method for the production of a substrate with a magnetron sputter coating and unit for the same Jun. 3, 2008
7381291 Dual-chamber plasma processing apparatus Jun. 3, 2008
7374636 Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor May. 20, 2008
7374620 Substrate processing apparatus May. 20, 2008
7373899 Plasma processing apparatus using active matching May. 20, 2008
RE40195 Large area plasma source Apr. 1, 2008
7337745 Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor Mar. 4, 2008
7332039 Plasma processing apparatus and method thereof Feb. 19, 2008
7331307 Thermally sprayed member, electrode and plasma processing apparatus using the electrode Feb. 19, 2008
7323219 Apparatus and method for applying diamond-like carbon coatings Jan. 29, 2008
7323081 High-frequency plasma processing apparatus Jan. 29, 2008
7322313 Plasma processing system Jan. 29, 2008
7316761 Apparatus for uniformly etching a dielectric layer Jan. 8, 2008
7316199 Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber Jan. 8, 2008
7311784 Plasma processing device Dec. 25, 2007
7309842 Shielded monolithic microplasma source for prevention of continuous thin film formation Dec. 18, 2007
7306829 RF plasma reactor having a distribution chamber with at least one grid Dec. 11, 2007
7300684 Method and system for coating internal surfaces of prefabricated process piping in the field Nov. 27, 2007
7300558 Rapid cycle time gas burster Nov. 27, 2007
7296534 Hybrid ball-lock attachment apparatus Nov. 20, 2007
7294283 Penning discharge plasma source Nov. 13, 2007
7294224 Magnet assembly for plasma containment Nov. 13, 2007
7288166 Plasma processing apparatus Oct. 30, 2007
7282454 Switched uniformity control Oct. 16, 2007
7281492 System and method for generating a discharge in gases Oct. 16, 2007
7281491 Dielectric-coated electrode, plasma discharge treatment apparatus and method for forming thin film Oct. 16, 2007
7276135 Vacuum plasma processor including control in response to DC bias voltage Oct. 2, 2007
7270713 Tunable gas distribution plate assembly Sep. 18, 2007
7255773 Plasma processing apparatus and evacuation ring Aug. 14, 2007
7244336 Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift Jul. 17, 2007
7241397 Honeycomb optical window deposition shield and method for a plasma processing system Jul. 10, 2007
7225754 Plasma processing apparatus including a plurality of plasma processing units having reduced variation Jun. 5, 2007
7220462 Method and electrode assembly for non-equilibrium plasma treatment May. 22, 2007



 
 
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