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Class Information
Number: 118/723E
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Having glow discharge electrodes (e.g., dc, ac, rf, etc.)

Sub-classes under this class:

Class Number Class Name Patents
118/723ER Producing energized gas remotely located from substrate 257

Patents under this class:

Patent Number Title Of Patent Date Issued
8704445 Method for improving uniformity of high-frequency plasma discharge by means of frequency modulation Apr. 22, 2014
8703586 Apparatus for forming deposited film and method for forming deposited film Apr. 22, 2014
8702866 Showerhead electrode assembly with gas flow modification for extended electrode life Apr. 22, 2014
8701308 Fluid heater, manufacturing method thereof, substrate processing apparatus including fluid heater, and substrate processing method Apr. 22, 2014
8692467 Synchronized and shortened master-slave RF pulsing in a plasma processing chamber Apr. 8, 2014
8691047 Large area plasma processing chamber with at-electrode RF matching Apr. 8, 2014
8689734 Deposition of active films Apr. 8, 2014
8689733 Plasma processor Apr. 8, 2014
8686711 High-frequency measuring device and high-frequency measuring device calibration method Apr. 1, 2014
8683943 Plasma process apparatus and plasma process method Apr. 1, 2014
8679288 Showerhead electrode assemblies for plasma processing apparatuses Mar. 25, 2014
8679252 Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof Mar. 25, 2014
8677590 Plasma confinement structures in plasma processing systems and methods thereof Mar. 25, 2014
8674327 Systems and methods for uniformly implanting materials on substrates using directed magnetic fields Mar. 18, 2014
8673078 Take-up vacuum processing apparatus Mar. 18, 2014
8671882 Plasma processing apparatus Mar. 18, 2014
8663572 Micro plasma jet generator Mar. 4, 2014
8652297 Symmetric VHF plasma power coupler with active uniformity steering Feb. 18, 2014
8651049 Plasma processing apparatus Feb. 18, 2014
8646409 Plasma booster for plasma treatment installation Feb. 11, 2014
8646407 Film formation apparatus for semiconductor process and method for using the same Feb. 11, 2014
8643281 Signal generation system Feb. 4, 2014
8636872 Upper electrode and plasma processing apparatus Jan. 28, 2014
8636871 Plasma processing apparatus, plasma processing method and storage medium Jan. 28, 2014
8629370 Assembly for delivering RF power and DC voltage to a plasma processing chamber Jan. 14, 2014
8628640 Plasma processing unit and high-frequency electric power supplying unit Jan. 14, 2014
8623172 Gas flow path structure and substrate processing apparatus Jan. 7, 2014
8623171 Plasma processing apparatus Jan. 7, 2014
8618446 Substrate support with substrate heater and symmetric RF return Dec. 31, 2013
8617350 Linear plasma system Dec. 31, 2013
8617349 Showerhead assembly for plasma processing chamber Dec. 31, 2013
8613827 Plasma treatment system Dec. 24, 2013
8610355 Reactor structure and plasma treatment apparatus Dec. 17, 2013
8609203 Method and apparatus for plasma surface treatment of moving substrate Dec. 17, 2013
8608900 Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes Dec. 17, 2013
8608851 Plasma confinement apparatus, and method for confining a plasma Dec. 17, 2013
8607732 In-liquid plasma film-forming apparatus, electrode for in-liquid plasma, and film-forming method using in-liquid plasma Dec. 17, 2013
8607731 Cathode with inner and outer electrodes at different heights Dec. 17, 2013
8603293 Plasma processing apparatus and method Dec. 10, 2013
8585862 Plasma processing device and plasma discharge state monitoring device Nov. 19, 2013
8580079 Electrode carrier assemblies Nov. 12, 2013
8578879 Apparatus for VHF impedance match tuning Nov. 12, 2013
8574445 Method for generating hollow cathode plasma and method for treating large area substrate using hollow cathode plasma Nov. 5, 2013
8573153 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode Nov. 5, 2013
8573152 Showerhead electrode Nov. 5, 2013
8568554 Movable gas introduction structure and substrate processing apparatus having same Oct. 29, 2013
8561572 Gas supply system, substrate processing apparatus and gas supply method Oct. 22, 2013
8555810 Plasma dry etching apparatus having coupling ring with cooling and heating units Oct. 15, 2013
8555808 Substrate processing apparatus Oct. 15, 2013
8551890 Showerhead for CVD depositions Oct. 8, 2013

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