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Class Information
Number:
118/723CB
Name:
Coating apparatus
>
Gas or vapor deposition
>
With treating means (e.g., jarring)
>
By creating electric field (e.g., gas activation, plasma, etc.)
>
Vacuum evaporation means within deposition chamber (e.g., activated reactive evaporation, etc.)
> Ion cluster beam
Description:
Patents under this class:
1
2
Patent Number
Title Of Patent
Date Issued
4451499
Method for producing a beryllium oxide film
May. 29, 1984
4286545
Apparatus for vapor depositing a stoichiometric compound
Sep. 1, 1981
4223048
Plasma enhanced chemical vapor processing of semiconductive wafers
Sep. 16, 1980
4217855
Vaporized-metal cluster ion source and ionized-cluster beam deposition device
Aug. 19, 1980
4082636
Ion plating method
Apr. 4, 1978
1
2
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