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Class Information
Number: 118/723AN
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > Having antenna
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5865896 |
High density plasma CVD reactor with combined inductive and capacitive coupling |
Feb. 2, 1999 |
| 5838111 |
Plasma generator with antennas attached to top electrodes |
Nov. 17, 1998 |
| 5824602 |
Helicon wave excitation to produce energetic electrons for manufacturing semiconductors |
Oct. 20, 1998 |
| 5810932 |
Plasma generating apparatus used for fabrication of semiconductor device |
Sep. 22, 1998 |
| 5800621 |
Plasma source for HDP-CVD chamber |
Sep. 1, 1998 |
| 5767628 |
Helicon plasma processing tool utilizing a ferromagnetic induction coil with an internal cooling channel |
Jun. 16, 1998 |
| 5753320 |
Process for forming deposited film |
May. 19, 1998 |
| 5696429 |
Method for charge neutralization of surface in space with space-charge neutral plasma |
Dec. 9, 1997 |
| 5637150 |
Device and method for forming a plasma by application of microwaves |
Jun. 10, 1997 |
| 5614055 |
High density plasma CVD and etching reactor |
Mar. 25, 1997 |
| 5560776 |
Plasma discharge generating antenna |
Oct. 1, 1996 |
| 5522934 |
Plasma processing apparatus using vertical gas inlets one on top of another |
Jun. 4, 1996 |
| 5517085 |
Apparatus including ring-shaped resonators for producing microwave plasmas |
May. 14, 1996 |
| 5514936 |
RF plasma source and method for plasma cleaning of surface in space |
May. 7, 1996 |
| 5433813 |
Semiconductor device manufacturing apparatus |
Jul. 18, 1995 |
| 5429070 |
High density plasma deposition and etching apparatus |
Jul. 4, 1995 |
| 5421891 |
High density plasma deposition and etching apparatus |
Jun. 6, 1995 |
| 5418431 |
RF plasma source and antenna therefor |
May. 23, 1995 |
| 5411591 |
Apparatus for the simultaneous microwave deposition of thin films in multiple discrete zones |
May. 2, 1995 |
| 5401351 |
Radio frequency electron cyclotron resonance plasma etching apparatus |
Mar. 28, 1995 |
| 5401318 |
Plasma reactor for performing an etching or deposition method |
Mar. 28, 1995 |
| 5387288 |
Apparatus for depositing diamond and refractory materials comprising rotating antenna |
Feb. 7, 1995 |
| 5378284 |
Apparatus for coating substrates using a microwave ECR plasma source |
Jan. 3, 1995 |
| 5324362 |
Apparatus for treating substrates in a microwave-generated gas-supported plasma |
Jun. 28, 1994 |
| 5310426 |
High-speed film forming method by microwave plasma chemical vapor deposition (CVD) under high pressure and an apparatus therefor |
May. 10, 1994 |
| 5296784 |
Apparatus for the production of glow discharge |
Mar. 22, 1994 |
| 5180436 |
Microwave plasma film deposition system |
Jan. 19, 1993 |
| 5149375 |
Apparatus for forming a deposited film of large area with the use of a plurality of activated gases separately formed |
Sep. 22, 1992 |
| 5126635 |
Microwave plasma operation using a high power microwave transmissive window assembly |
Jun. 30, 1992 |
| 5125358 |
Microwave plasma film deposition system |
Jun. 30, 1992 |
| 5090356 |
Chemically active isolation passageway for deposition chambers |
Feb. 25, 1992 |
| 4995341 |
Microwave plasma CVD apparatus for the formation of a large-area functional deposited film |
Feb. 26, 1991 |
| 4940015 |
Plasma reactor for diamond synthesis |
Jul. 10, 1990 |
| 4931756 |
High power microwave transmissive window assembly |
Jun. 5, 1990 |
| 4804431 |
Microwave plasma etching machine and method of etching |
Feb. 14, 1989 |
| 4745337 |
Method and device for exciting a plasma using microwaves at the electronic cyclotronic resonance |
May. 17, 1988 |
| 4723507 |
Isolation passageway including annular region |
Feb. 9, 1988 |
| 4715927 |
Improved method of making a photoconductive member |
Dec. 29, 1987 |
| 4515107 |
Apparatus for the manufacture of photovoltaic devices |
May. 7, 1985 |
| 4479455 |
Process gas introduction and channeling system to produce a profiled semiconductor layer |
Oct. 30, 1984 |
| 4339326 |
Surface processing apparatus utilizing microwave plasma |
Jul. 13, 1982 |
| 4265730 |
Surface treating apparatus utilizing plasma generated by microwave discharge |
May. 5, 1981 |
| 4051382 |
Activated gas reaction apparatus |
Sep. 27, 1977 |
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