| |
 |
|
Class Information
Number: 118/723AN
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > Having antenna
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6259209 |
Plasma processing apparatus with coils in dielectric windows |
Jul. 10, 2001 |
| 6254746 |
Recessed coil for generating a plasma |
Jul. 3, 2001 |
| 6248251 |
Apparatus and method for electrostatically shielding an inductively coupled RF plasma source and facilitating ignition of a plasma |
Jun. 19, 2001 |
| 6245202 |
Plasma treatment device |
Jun. 12, 2001 |
| 6244211 |
Plasma processing apparatus |
Jun. 12, 2001 |
| 6237526 |
Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
May. 29, 2001 |
| 6239553 |
RF plasma source for material processing |
May. 29, 2001 |
| 6229264 |
Plasma processor with coil having variable rf coupling |
May. 8, 2001 |
| 6227141 |
RF powered plasma enhanced chemical vapor deposition reactor and methods |
May. 8, 2001 |
| 6225744 |
Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coil |
May. 1, 2001 |
| 6225592 |
Method and apparatus for launching microwave energy into a plasma processing chamber |
May. 1, 2001 |
| 6223686 |
Apparatus for forming a thin film by plasma chemical vapor deposition |
May. 1, 2001 |
| 6220201 |
High density plasma CVD reactor with combined inductive and capacitive coupling |
Apr. 24, 2001 |
| 6194835 |
Device for producing plasma |
Feb. 27, 2001 |
| 6192826 |
Method and apparatus for monitoring plasma processing operations |
Feb. 27, 2001 |
| 6192829 |
Antenna coil assemblies for substrate processing chambers |
Feb. 27, 2001 |
| 6191532 |
Arrangement for producing plasma |
Feb. 20, 2001 |
| 6184623 |
Method for controlling plasma-generating high frequency power, and plasma generating apparatus |
Feb. 6, 2001 |
| 6181068 |
Plasma generating apparatus |
Jan. 30, 2001 |
| 6173674 |
Plasma reactor with a deposition shield |
Jan. 16, 2001 |
| 6170431 |
Plasma reactor with a deposition shield |
Jan. 9, 2001 |
| 6165311 |
Inductively coupled RF plasma reactor having an overhead solenoidal antenna |
Dec. 26, 2000 |
| 6158384 |
Plasma reactor with multiple small internal inductive antennas |
Dec. 12, 2000 |
| 6158383 |
Plasma processing method and apparatus |
Dec. 12, 2000 |
| 6153977 |
ECR type plasma generating apparatus |
Nov. 28, 2000 |
| 6152071 |
High-frequency introducing means, plasma treatment apparatus, and plasma treatment method |
Nov. 28, 2000 |
| 6150763 |
Inductively-coupled high density plasma producing apparatus and plasma processing equipment provided with the same |
Nov. 21, 2000 |
| 6132566 |
Apparatus and method for sputtering ionized material in a plasma |
Oct. 17, 2000 |
| 6126778 |
Beat frequency modulation for plasma generation |
Oct. 3, 2000 |
| 6123791 |
Ceramic composition for an apparatus and method for processing a substrate |
Sep. 26, 2000 |
| 6116187 |
Thin film forming apparatus |
Sep. 12, 2000 |
| 6114811 |
Electromagnetic high-frequency apparatus with a transmission wall having antennas |
Sep. 5, 2000 |
| 6101970 |
Plasma processing apparatus |
Aug. 15, 2000 |
| 6096160 |
Helicon wave plasma processing apparatus |
Aug. 1, 2000 |
| 6089182 |
Plasma processing apparatus |
Jul. 18, 2000 |
| 6090167 |
Method and apparatus for improving film stability of halogen-doped silicon oxide films |
Jul. 18, 2000 |
| 6087778 |
Scalable helicon wave plasma processing device with a non-cylindrical source chamber having a serpentine antenna |
Jul. 11, 2000 |
| 6080271 |
Plasma source for generating inductively coupled, plate-shaped plasma, having magnetically permeable core |
Jun. 27, 2000 |
| 6074512 |
Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
Jun. 13, 2000 |
| 6063233 |
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna |
May. 16, 2000 |
| 6055928 |
Plasma immersion ion processor for fabricating semiconductor integrated circuits |
May. 2, 2000 |
| 6040547 |
Gas discharge device |
Mar. 21, 2000 |
| 6016765 |
Plasma processing apparatus |
Jan. 25, 2000 |
| 6006694 |
Plasma reactor with a deposition shield |
Dec. 28, 1999 |
| 5976308 |
High density plasma CVD and etching reactor |
Nov. 2, 1999 |
| 5951773 |
Inductively coupled plasma chemical vapor deposition apparatus |
Sep. 14, 1999 |
| 5944902 |
Plasma source for HDP-CVD chamber |
Aug. 31, 1999 |
| 5928461 |
RF plasma source for cleaning spacecraft surfaces |
Jul. 27, 1999 |
| 5904780 |
Plasma processing apparatus |
May. 18, 1999 |
| 5891252 |
Plasma processing apparatus |
Apr. 6, 1999 |
|
|
|
