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Class Information
Number: 118/723AN
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > Having antenna
Description:


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
6622650 Plasma processing apparatus Sep. 23, 2003
6623595 Wavy and roughened dome in plasma processing reactor Sep. 23, 2003
6592710 Apparatus for controlling the voltage applied to an electrostatic shield used in a plasma generator Jul. 15, 2003
6578514 Modular device of tubular plasma source Jun. 17, 2003
6568346 Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply May. 27, 2003
6551446 Externally excited torroidal plasma source with a gas distribution plate Apr. 22, 2003
6531031 Plasma etching installation Mar. 11, 2003
6528752 Plasma processing apparatus and plasma processing method Mar. 4, 2003
6527909 Plasma processing apparatus Mar. 4, 2003
6514376 Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna Feb. 4, 2003
6500315 Method and apparatus for forming a layer on a substrate Dec. 31, 2002
6494986 Externally excited multiple torroidal plasma source Dec. 17, 2002
6481370 Plasma processsing apparatus Nov. 19, 2002
6474258 Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma Nov. 5, 2002
6470824 Semiconductor manufacturing apparatus Oct. 29, 2002
6468388 Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate Oct. 22, 2002
6463873 High density plasmas Oct. 15, 2002
6453842 Externally excited torroidal plasma source using a gas distribution plate Sep. 24, 2002
6454898 Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners Sep. 24, 2002
6447635 Plasma processing system and system using wide area planar antenna Sep. 10, 2002
6446572 Embedded plasma source for plasma density improvement Sep. 10, 2002
6440220 Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation Aug. 27, 2002
6432260 Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof Aug. 13, 2002
6422173 Apparatus and methods for actively controlling RF peak-to-peak voltage in an inductively coupled plasma etching system Jul. 23, 2002
6424091 Plasma treatment apparatus and plasma treatment method performed by use of the same apparatus Jul. 23, 2002
6413359 Plasma reactor with high selectivity and reduced damage Jul. 2, 2002
6408786 Semiconductor processing equipment having tiled ceramic liner Jun. 25, 2002
6401652 Plasma reactor inductive coil antenna with flat surface facing the plasma Jun. 11, 2002
6397775 Deposited film forming system and process Jun. 4, 2002
6392351 Inductive RF plasma source with external discharge bridge May. 21, 2002
6382129 Semiconductor wafer processor, plasma generating apparatus, magnetic field generator, and method of generating a magnetic field May. 7, 2002
6357385 Plasma device Mar. 19, 2002
6355573 Plasma processing method and apparatus Mar. 12, 2002
6352049 Plasma assisted processing chamber with separate control of species density Mar. 5, 2002
6352611 Ceramic composition for an apparatus and method for processing a substrate Mar. 5, 2002
6347602 Plasma processing apparatus Feb. 19, 2002
6346915 Plasma processing method and apparatus Feb. 12, 2002
6343565 Flat antenna having rounded slot openings and plasma processing apparatus using the flat antenna Feb. 5, 2002
6341574 Plasma processing systems Jan. 29, 2002
6339997 Plasma processing apparatus Jan. 22, 2002
6325018 Flat antenna having openings provided with conductive materials accommodated therein and plasma processing apparatus using the flat antenna Dec. 4, 2001
6322662 Plasma treatment system Nov. 27, 2001
6312556 Beat frequency modulation for plasma generation Nov. 6, 2001
6309978 Beat frequency modulation for plasma generation Oct. 30, 2001
6305316 Integrated power oscillator RF source of plasma immersion ion implantation system Oct. 23, 2001
6291939 Ion source device Sep. 18, 2001
6268700 Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil Jul. 31, 2001
6265831 Plasma processing method and apparatus with control of rf bias Jul. 24, 2001
6264812 Method and apparatus for generating a plasma Jul. 24, 2001
6262538 High density plasma tool with adjustable uniformity and stochastic electron heating for reduced gas cracking Jul. 17, 2001

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