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Class Information
Number: 118/723AN
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > Having antenna
Description:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7431797 |
Plasma reactor with a dynamically adjustable plasma source power applicator |
Oct. 7, 2008 |
| 7430984 |
Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
Oct. 7, 2008 |
| 7426900 |
Integrated electrostatic inductive coupling for plasma processing |
Sep. 23, 2008 |
| 7404879 |
Ionized physical vapor deposition apparatus using helical self-resonant coil |
Jul. 29, 2008 |
| 7404991 |
Device and control method for micro wave plasma processing |
Jul. 29, 2008 |
| 7367281 |
Plasma antenna |
May. 6, 2008 |
| 7338577 |
Inductively coupled plasma processing apparatus having internal linear antenna for large area processing |
Mar. 4, 2008 |
| 7338575 |
Hydrocarbon dielectric heat transfer fluids for microwave plasma generators |
Mar. 4, 2008 |
| 7311796 |
Plasma processing apparatus |
Dec. 25, 2007 |
| 7302910 |
Plasma apparatus and production method thereof |
Dec. 4, 2007 |
| 7255062 |
Pseudo surface microwave produced plasma shielding system |
Aug. 14, 2007 |
| 7255774 |
Process apparatus and method for improving plasma production of an inductively coupled plasma |
Aug. 14, 2007 |
| 7243610 |
Plasma device and plasma generating method |
Jul. 17, 2007 |
| 7223321 |
Faraday shield disposed within an inductively coupled plasma etching apparatus |
May. 29, 2007 |
| 7156046 |
Plasma CVD apparatus |
Jan. 2, 2007 |
| 7135089 |
Method and apparatus for plasma processing |
Nov. 14, 2006 |
| 7100532 |
Plasma production device and method and RF driver circuit with adjustable duty cycle |
Sep. 5, 2006 |
| 7097782 |
Method of exposing a substrate to a surface microwave plasma, etching method, deposition method, surface microwave plasma generating apparatus, semiconductor substrate etching apparatus, semic |
Aug. 29, 2006 |
| 7088047 |
Inductively coupled plasma generator having low aspect ratio |
Aug. 8, 2006 |
| 7018506 |
Plasma processing apparatus |
Mar. 28, 2006 |
| RE39020 |
Plasma process apparatus |
Mar. 21, 2006 |
| 6953005 |
Plasma processing apparatus utilizing a surface wave plasma |
Oct. 11, 2005 |
| 6935269 |
Apparatus for treating the surface with neutral particle beams |
Aug. 30, 2005 |
| 6899787 |
Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system |
May. 31, 2005 |
| 6893533 |
Plasma reactor having a symmetric parallel conductor coil antenna |
May. 17, 2005 |
| 6866747 |
Plasma processing apparatus |
Mar. 15, 2005 |
| 6845734 |
Deposition apparatuses configured for utilizing phased microwave radiation |
Jan. 25, 2005 |
| 6830653 |
Plasma processing method and apparatus |
Dec. 14, 2004 |
| 6793768 |
Plasma-assisted processing apparatus |
Sep. 21, 2004 |
| 6790311 |
Plasma reactor having RF power applicator and a dual-purpose window |
Sep. 14, 2004 |
| 6779482 |
Plasma deposition device for forming thin film |
Aug. 24, 2004 |
| 6756737 |
Plasma processing apparatus and method |
Jun. 29, 2004 |
| 6755935 |
Plasma processing apparatus |
Jun. 29, 2004 |
| 6719876 |
Internal electrode type plasma processing apparatus and plasma processing method |
Apr. 13, 2004 |
| 6713968 |
Plasma processing apparatus |
Mar. 30, 2004 |
| 6707253 |
Matching circuit and plasma processing apparatus |
Mar. 16, 2004 |
| 6695948 |
Plasma processing apparatus |
Feb. 24, 2004 |
| 6685798 |
Plasma reactor having a symmetrical parallel conductor coil antenna |
Feb. 3, 2004 |
| 6670741 |
Plasma processing apparatus with annular waveguide |
Dec. 30, 2003 |
| 6666923 |
Plasma polymerizing apparatus having an electrode with a lot of uniform edges |
Dec. 23, 2003 |
| 6660127 |
Apparatus for plasma etching at a constant etch rate |
Dec. 9, 2003 |
| 6653988 |
Parallel resonance whirl antenna |
Nov. 25, 2003 |
| 6652711 |
Inductively-coupled plasma processing system |
Nov. 25, 2003 |
| 6641697 |
Substrate processing using a member comprising an oxide of a group IIIB metal |
Nov. 4, 2003 |
| 6622650 |
Plasma processing apparatus |
Sep. 23, 2003 |
| 6623595 |
Wavy and roughened dome in plasma processing reactor |
Sep. 23, 2003 |
| 6592710 |
Apparatus for controlling the voltage applied to an electrostatic shield used in a plasma generator |
Jul. 15, 2003 |
| 6578514 |
Modular device of tubular plasma source |
Jun. 17, 2003 |
| 6568346 |
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply |
May. 27, 2003 |
| 6551446 |
Externally excited torroidal plasma source with a gas distribution plate |
Apr. 22, 2003 |
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