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Class Information
Number: 118/723AN
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By creating electric field (e.g., gas activation, plasma, etc.) > Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) > Having antenna
Description:


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
7604709 Plasma processing apparatus Oct. 20, 2009
7588799 Metal film production apparatus Sep. 15, 2009
7567037 High frequency power supply device and plasma generator Jul. 28, 2009
7520245 Plasma processing apparatus Apr. 21, 2009
7513215 Systems and methods for the production of highly tetrahedral amorphous carbon coatings Apr. 7, 2009
7493869 Very large area/volume microwave ECR plasma and ion source Feb. 24, 2009
7430984 Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements Oct. 7, 2008
7431797 Plasma reactor with a dynamically adjustable plasma source power applicator Oct. 7, 2008
7426900 Integrated electrostatic inductive coupling for plasma processing Sep. 23, 2008
7404991 Device and control method for micro wave plasma processing Jul. 29, 2008
7404879 Ionized physical vapor deposition apparatus using helical self-resonant coil Jul. 29, 2008
7367281 Plasma antenna May. 6, 2008
7338575 Hydrocarbon dielectric heat transfer fluids for microwave plasma generators Mar. 4, 2008
7338577 Inductively coupled plasma processing apparatus having internal linear antenna for large area processing Mar. 4, 2008
7311796 Plasma processing apparatus Dec. 25, 2007
7302910 Plasma apparatus and production method thereof Dec. 4, 2007
7255062 Pseudo surface microwave produced plasma shielding system Aug. 14, 2007
7255774 Process apparatus and method for improving plasma production of an inductively coupled plasma Aug. 14, 2007
7243610 Plasma device and plasma generating method Jul. 17, 2007
7223321 Faraday shield disposed within an inductively coupled plasma etching apparatus May. 29, 2007
7156046 Plasma CVD apparatus Jan. 2, 2007
7135089 Method and apparatus for plasma processing Nov. 14, 2006
7100532 Plasma production device and method and RF driver circuit with adjustable duty cycle Sep. 5, 2006
7097782 Method of exposing a substrate to a surface microwave plasma, etching method, deposition method, surface microwave plasma generating apparatus, semiconductor substrate etching apparatus, semic Aug. 29, 2006
7088047 Inductively coupled plasma generator having low aspect ratio Aug. 8, 2006
7018506 Plasma processing apparatus Mar. 28, 2006
RE39020 Plasma process apparatus Mar. 21, 2006
6953005 Plasma processing apparatus utilizing a surface wave plasma Oct. 11, 2005
6935269 Apparatus for treating the surface with neutral particle beams Aug. 30, 2005
6899787 Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system May. 31, 2005
6893533 Plasma reactor having a symmetric parallel conductor coil antenna May. 17, 2005
6866747 Plasma processing apparatus Mar. 15, 2005
6845734 Deposition apparatuses configured for utilizing phased microwave radiation Jan. 25, 2005
6830653 Plasma processing method and apparatus Dec. 14, 2004
6793768 Plasma-assisted processing apparatus Sep. 21, 2004
6790311 Plasma reactor having RF power applicator and a dual-purpose window Sep. 14, 2004
6779482 Plasma deposition device for forming thin film Aug. 24, 2004
6756737 Plasma processing apparatus and method Jun. 29, 2004
6755935 Plasma processing apparatus Jun. 29, 2004
6719876 Internal electrode type plasma processing apparatus and plasma processing method Apr. 13, 2004
6713968 Plasma processing apparatus Mar. 30, 2004
6707253 Matching circuit and plasma processing apparatus Mar. 16, 2004
6695948 Plasma processing apparatus Feb. 24, 2004
6685798 Plasma reactor having a symmetrical parallel conductor coil antenna Feb. 3, 2004
6670741 Plasma processing apparatus with annular waveguide Dec. 30, 2003
6666923 Plasma polymerizing apparatus having an electrode with a lot of uniform edges Dec. 23, 2003
6660127 Apparatus for plasma etching at a constant etch rate Dec. 9, 2003
6653988 Parallel resonance whirl antenna Nov. 25, 2003
6652711 Inductively-coupled plasma processing system Nov. 25, 2003
6641697 Substrate processing using a member comprising an oxide of a group IIIB metal Nov. 4, 2003

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