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Class Information
Number: 118/722
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring)
Description: Apparatus wherein a means is provided to condition either the base or the coating material in a manner other than and in addition to applying the coating to the base.


Sub-classes under this class:

Class Number Class Name Patents
118/723R By creating electric field (e.g., gas activation, plasma, etc.) 782
118/724 By means to heat or cool 1,359


Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
7601619 Method and apparatus for plasma processing Oct. 13, 2009
7544957 Non-uniform ion implantation Jun. 9, 2009
7439116 Apparatus and method for forming polycrystalline silicon thin film Oct. 21, 2008
7416633 Plasma processing apparatus Aug. 26, 2008
7393416 Vapor deposition process and apparatus therefor Jul. 1, 2008
7390366 Apparatus for chemical vapor deposition Jun. 24, 2008
7384666 Method and apparatus for fabricating quantum dot functional structure, quantum dot functional structure, and optically functioning device Jun. 10, 2008
7374620 Substrate processing apparatus May. 20, 2008
7371286 Wiring repair apparatus May. 13, 2008
7282111 System and method for monitoring particles contamination in semiconductor manufacturing facilities Oct. 16, 2007
7270724 Scanning plasma reactor Sep. 18, 2007
7235153 System for removal of a spacer Jun. 26, 2007
7220462 Method and electrode assembly for non-equilibrium plasma treatment May. 22, 2007
7166167 Laser CVD device and laser CVD method Jan. 23, 2007
7097712 Apparatus for processing a semiconductor Aug. 29, 2006
7090727 Heated gas line body feedthrough for vapor and gas delivery systems and methods for employing same Aug. 15, 2006
7087119 Atomic layer deposition with point of use generated reactive gas species Aug. 8, 2006
7070659 System for filling openings in semiconductor products Jul. 4, 2006
7063748 Methods for coating particles and particles produced thereby Jun. 20, 2006
7019402 Silicon chip carrier with through-vias using laser assisted chemical vapor deposition of conductor Mar. 28, 2006
7001467 Direct-write laser transfer and processing Feb. 21, 2006
6967109 Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units Nov. 22, 2005
6946033 Heated gas distribution plate for a processing chamber Sep. 20, 2005
6926801 Laser machining method and apparatus Aug. 9, 2005
6916399 Temperature controlled window with a fluid supply system Jul. 12, 2005
6902947 Integrated method for release and passivation of MEMS structures Jun. 7, 2005
6890387 Method and device for correcting pattern film on a semiconductor substrate May. 10, 2005
6866721 Apparatus and method for photo-induced process Mar. 15, 2005
6863733 Apparatus for fabricating thin-film semiconductor device Mar. 8, 2005
6843202 Thermal processing apparatus for substrate employing photoirradiation Jan. 18, 2005
6821906 Method and apparatus for treating surface of substrate plate Nov. 23, 2004
6799531 Method for making films utilizing a pulsed laser for ion injection and deposition Oct. 5, 2004
6776847 Film formation apparatus and film formation method and cleaning method Aug. 17, 2004
6759253 Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units Jul. 6, 2004
6756074 Methods for the deposition and curing of coating compositions Jun. 29, 2004
6752900 Vacuum loadlock ultraviolet bake for plasma etch Jun. 22, 2004
6709512 Method of growing a polycrystalline silicon layer, method of growing a single crystal silicon layer and catalytic CVD apparatus Mar. 23, 2004
6689930 Method and apparatus for cleaning an exhaust line in a semiconductor processing system Feb. 10, 2004
6682602 Chemical vapor deposition systems including metal complexes with chelating O- and/or N-donor ligands Jan. 27, 2004
6680420 Apparatus for cleaning an exhaust line in a semiconductor processing system Jan. 20, 2004
6648973 Process for the treatment of a fiber Nov. 18, 2003
6648975 Method and apparatus for fabricating quantum dot functional structure, quantum dot functional structure, and optically functioning device Nov. 18, 2003
6638880 Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device Oct. 28, 2003
6610169 Semiconductor processing system and method Aug. 26, 2003
6576566 Apparatus and method for forming thin film at low temperature and high deposition rate Jun. 10, 2003
6554969 Acoustically enhanced deposition processes, and systems for performing same Apr. 29, 2003
6513451 Controlling the thickness of an organic layer in an organic light-emiting device Feb. 4, 2003
6506257 Single-substrate-processing apparatus for semiconductor process Jan. 14, 2003
6494956 System for processing a workpiece Dec. 17, 2002
6492284 Reactor for processing a workpiece using sonic energy Dec. 10, 2002

1 2 3 4 5


 
 
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