| |
 |
|
Class Information
Number: 118/719
Name: Coating apparatus > Gas or vapor deposition > Multizone chamber
Description: Apparatus wherein the coating apparatus is divided into a number of distinct areas wherein different aspects of the coating treatment can be performed.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6372083 |
Method of manufacturing semiconductor device and apparatus for manufacturing the same |
Apr. 16, 2002 |
| 6364955 |
Chamber, at least for the transport of workpieces, a chamber combination, a vacuum treatment facility as well as a transport method |
Apr. 2, 2002 |
| 6365229 |
Surface treatment material deposition and recapture |
Apr. 2, 2002 |
| 6360687 |
Wafer flattening system |
Mar. 26, 2002 |
| 6361648 |
Wafer transfer station for a chemical mechanical polisher |
Mar. 26, 2002 |
| 6358377 |
Apparatus for sputter-coating glass and corresponding method |
Mar. 19, 2002 |
| 6356338 |
Semiconductor production system with an in-line subsystem |
Mar. 12, 2002 |
| 6352592 |
Free floating shield and semiconductor processing system |
Mar. 5, 2002 |
| 6352620 |
Staged aluminum deposition process for filling vias |
Mar. 5, 2002 |
| 6350319 |
Micro-environment reactor for processing a workpiece |
Feb. 26, 2002 |
| 6350321 |
UHV horizontal hot wall cluster CVD/growth design |
Feb. 26, 2002 |
| 6348417 |
Semiconductor device manufacturing apparatus and semiconductor device manufacturing method |
Feb. 19, 2002 |
| 6344084 |
Combinatorial molecular layer epitaxy device |
Feb. 5, 2002 |
| 6340405 |
Etching apparatus for manufacturing semiconductor devices |
Jan. 22, 2002 |
| 6340499 |
Method to increase gas residence time in a reactor |
Jan. 22, 2002 |
| 6338313 |
System for the plasma treatment of large area substrates |
Jan. 15, 2002 |
| 6338756 |
In-situ post epitaxial treatment process |
Jan. 15, 2002 |
| 6338778 |
Vacuum coating system with a coating chamber and at least one source chamber |
Jan. 15, 2002 |
| 6339028 |
Vacuum loadlock ultra violet bake for plasma etch |
Jan. 15, 2002 |
| 6337005 |
Depositing device employing a depositing zone and reaction zone |
Jan. 8, 2002 |
| 6335054 |
Air lock for introducing substrates to and/or removing them from a treatment chamber |
Jan. 1, 2002 |
| 6331211 |
Method and apparatus for forming low dielectric constant polymeric films |
Dec. 18, 2001 |
| 6328768 |
Semiconductor device manufacturing line |
Dec. 11, 2001 |
| 6325856 |
Vacuum treatment equipment |
Dec. 4, 2001 |
| 6321680 |
Vertical plasma enhanced process apparatus and method |
Nov. 27, 2001 |
| 6318944 |
Semiconductor fabricating apparatus, method for modifying positional displacement of a wafer in a wafer cassette within the semiconductor fabricating apparatus and method for transferring the |
Nov. 20, 2001 |
| 6318945 |
Substrate processing apparatus with vertically stacked load lock and substrate transport robot |
Nov. 20, 2001 |
| 6318948 |
Substrate transfer apparatus and substrate processing apparatus |
Nov. 20, 2001 |
| 6319326 |
Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
Nov. 20, 2001 |
| 6319327 |
MOCVD system |
Nov. 20, 2001 |
| 6319373 |
Substrate transfer apparatus of substrate processing system |
Nov. 20, 2001 |
| 6319553 |
Isolation of incompatible processes in a multi-station processing chamber |
Nov. 20, 2001 |
| 6315879 |
Modular deposition system having batch processing and serial thin film deposition |
Nov. 13, 2001 |
| 6316361 |
CVD reactor and process for producing an epitally coated semiconductor wafer |
Nov. 13, 2001 |
| 6312525 |
Modular architecture for semiconductor wafer fabrication equipment |
Nov. 6, 2001 |
| 6312526 |
Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device |
Nov. 6, 2001 |
| 6302966 |
Temperature control system for plasma processing apparatus |
Oct. 16, 2001 |
| 6299683 |
Method and apparatus for the production of SiC by means of CVD with improved gas utilization |
Oct. 9, 2001 |
| 6296735 |
Plasma treatment apparatus and method for operation same |
Oct. 2, 2001 |
| 6294026 |
Distribution plate for a reaction chamber with multiple gas inlets and separate mass flow control loops |
Sep. 25, 2001 |
| 6290824 |
Magnetic film forming system |
Sep. 18, 2001 |
| 6286452 |
Sputtering apparatus |
Sep. 11, 2001 |
| 6287386 |
Carousel wafer transfer system |
Sep. 11, 2001 |
| 6287430 |
Apparatus and method forming thin film |
Sep. 11, 2001 |
| 6287984 |
Apparatus and method for manufacturing semiconductor device |
Sep. 11, 2001 |
| 6283060 |
Plasma CVD apparatus |
Sep. 4, 2001 |
| 6279505 |
Plastic containers with an external gas barrier coating |
Aug. 28, 2001 |
| 6277199 |
Chamber design for modular manufacturing and flexible onsite servicing |
Aug. 21, 2001 |
| 6273664 |
Coupling system for the transfer of a confined planar object from a containment pod to an object processing unit |
Aug. 14, 2001 |
| 6273955 |
Film forming apparatus |
Aug. 14, 2001 |
|
|
|
